Abstract: A sour gas sweetening solution comprises an aqueous solution of a silicon-containing compound and an amine-containing compound. The silicon-containing compound is preferably maintained at a concentration less than or equal to 500 parts per million (“ppm”) more preferably less than or equal to 400 ppm, and most preferably between about 100 ppm and 300 ppm as SiO2. The silicon-containing compound can be MxSiyOz, wherein “M” is a metal and “x”, “y” and “z” are numbers greater than zero. The amine-containing compound can be selected from the group consisting of primary amines, secondary amines and tertiary amines.

Abstract: A sour gas sweetening solution comprises an aqueous solution of a silicon-containing compound and an amine-containing compound. The silicon-containing compound is preferably maintained at a concentration less than or equal to 500 parts per million (“ppm”) more preferably less than or equal to 400 ppm, and most preferably between about 100 ppm and 300 ppm as SiO2. The silicon-containing compound can be MxSiyOz, wherein “M” is a metal and “x”, “y” and “z” are numbers greater than zero. The amine-containing compound can be selected from the group consisting of primary amines, secondary amines and tertiary amines.

Abstract: A sour gas sweetening solution comprises an aqueous solution of a silicon-containing compound and an amine-containing compound. The silicon-containing compound is preferably maintained at a concentration less than or equal to 500 parts per million (“ppm”) more preferably less than or equal to 400 ppm, and most preferably between about 100 ppm and 300 ppm as SiO2. The silicon-containing compound can be MxSiyOz, wherein “M” is a metal and “x”, “y” and “z” are numbers greater than zero. The amine-containing'compound can be selected from the group consisting of primary amines, secondary amines and tertiary amines.