Abstract: A dry separation method is a dry separation method for ashing a photoresist, including a spraying and separating step of spraying sublimation particles on the photoresist and separating the photoresist. A dry separation apparatus is a dry separation apparatus for ashing a photoresist, including a nozzle for generating a high-speed particle beam that includes sublimation particles. The nozzle generates ultra-high speed uniform nanoparticles by passing therethrough a particle generation gas including carbon dioxide, and includes an expanding portion having a shape so that the cross sectional area thereof becomes wider toward a discharge side of the nozzle. The expanding portion sequentially includes a first expanding portion and a second expanding portion, and an average expansion angle of the second expanding portion is bigger than an expansion angle of the first expanding portion.

Abstract: A dry separation method is a dry separation method for ashing a photoresist, including a spraying and separating step of spraying sublimation particles on the photoresist and separating the photoresist. A dry separation apparatus is a dry separation apparatus for ashing a photoresist, including a nozzle for generating a high-speed particle beam that includes sublimation particles. The nozzle generates ultra-high speed uniform nanoparticles by passing therethrough a particle generation gas including carbon dioxide, and includes an expanding portion having a shape so that the cross sectional area thereof becomes wider toward a discharge side of the nozzle. The expanding portion sequentially includes a first expanding portion and a second expanding portion, and an average expansion angle of the second expanding portion is bigger than an expansion angle of the first expanding portion.