Abstract: A method for coating workpieces includes the following steps: charging a coating chamber with the workpieces to be coated; closing and evacuating the coating chamber to a predetermined process pressure, starting a coating source, which comprises a target as a material source, whereby particles are accelerated from the surface of the target toward substrates, characterized in that until the target has been conditioned a shield is provided between the target surface and the substrate, wherein meanwhile the substrates to be coated are at least partially subjected to a pretreatment.

Abstract: A workpiece having a coating which has at least one TiB2 layer, characterized in that the TiB2 layers have a texture, in the XRD-spectrum, which leads to significant peaks which display a pronounced (002) orientation. The invention also relates to a method for producing said type of workpiece with a coating.

Abstract: A device for cooling a target, having a component that includes a cooling duct and having an additional thermally conductive plate that is detachably fastened to the cooling side of the component, the cooling side being the side on which the cooling duct exerts its cooling action, characterized in that between the additional thermally conductive plate and the cooling side of the component, a first self-adhesive carbon film is provided, which is extensively and self-adhesively glued to the one side of the additional thermally conductive plate that faces the cooling side.

Abstract: A method for performing reactive sputtering processes while maintaining the sputtering characteristic at: the target as well as the deposition rate constant, or at least in an acceptable range for the industrial production context, independent of the target age.

Abstract: A system for the radiation treatment of substrates, which comprises, in a chamber above the substrate holders for fitting substrates to be treated, at least one radiation source, and wherein the chamber comprises means for maintaining a gas flow in the chamber with at least one gas inlet and at least one gas outlet, characterized in that the at least one gas inlet is disposed in the region of the substrate holders in such a way that gas flowing in through the at least one gas inlet first flows around the substrate holders prior to leaving the chamber again, either directly and/or after flowing around the at least one radiation source, through the gas outlet.

Abstract: A holder for securing at least one rod-shaped substrate body having a variable cross-section along the substrate body has a substrate body region BQ1 comprising a surface to be treated. The holder comprises at least one perforated wall as the front wall, the wall having at least one opening, and also comprises a support element and a retaining element. The support element is constructed and/or secured in the opening in such a way that at least part of the substrate body can be arranged longitudinally and obliquely in the support element and the retaining element is constructed and/or secured in the opening in such a way that the retaining element can retain the substrate body at a point between the region BQ1 and the remainder of the substrate body such that the region BQ1 protrudes from the holder through the opening.

Abstract: The invention relates to a vacuum arc source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporization material (31) as a cathode (32) for the production of an arc discharge on an vaporization surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporization surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporization surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporization surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporization chamber (10) with an arc vaporization source (1).

Abstract: A jet-black coating that resists wear; first, at least one DLC layer with a high degree of hardness is applied to a component and then a gradient layer, whose density decreases in the direction toward the surface, is applied to this DLC layer. By means of the refraction index progression that this produces in the gradient layer, the gradient layer functions as a reflection-reducing layer.

Abstract: A workpiece carrier comprises a base with an upper part rotatable about a vertical axis and a lower part connected to the upper part at a distance by bolts. Workpiece holders each comprise a sleeve of elastically deformable material like rubber surrounding a duct where the shaft of a workpiece can be inserted, the sleeve being accommodated in a recess on the base. The vertical position of the sleeve which extends through holes in the upper part and lower part of the base, respectively, is fixed by a stop formed between a recessed rim surrounding the hole in the lower part and a downward-facing projecting rim of the sleeve. The shaft can be fixed by swivelling a lever about one of the bolts into an active position where a compressing surface of the same compresses the sleeve such that the shaft is jammed and released by swivelling the lever back into an inactive position where the compressing surface is not in contact with the sleeve.