Patents Assigned to ONVECTOR LLC
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Patent number: 11548799Abstract: A water treatment system includes a water inlet that intakes water to be treated, a high voltage (HV) electrode having a porous metal surface area in a range of between 0.1 cm2 and 5 cm2 in fluid communication with the water, such that the water flows through the porous metal surface area of the HV electrode, a ground electrode disposed across a gap from the HV electrode, in fluid communication with the water, a high voltage power supply electrically connected to the HV electrode for generating spark plasma or pulsed electric fields having a rise time equal to or less than 60 nanoseconds (ns) and an amplitude greater than or equal to 30 kV/cm across the gap, thereby producing treated water, and a water outlet that discharges the treated water.Type: GrantFiled: May 11, 2020Date of Patent: January 10, 2023Assignee: Onvector LLCInventor: Daniel J. Cho
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Patent number: 11279633Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.Type: GrantFiled: January 28, 2019Date of Patent: March 22, 2022Assignee: Onvector LLCInventors: Jun Kang, Daniel J. Cho, HyoungSup Kim
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Patent number: 11124431Abstract: A water treatment system includes an adsorption column including granular activated carbon (GAC) that adsorbs contaminants from untreated water onto the GAC, thereby producing treated water, a first electrode disposed at a proximal side of the adsorption column, with a gap between the first electrode and the GAC, a second electrode disposed at a distal side of the adsorption column, a drain outlet in fluid communication with the adsorption column for draining water out of the adsorption column, a gas inlet in fluid communication with the adsorption column for injecting a displacement gas into the adsorption column, a high voltage power supply electrically connected to one of the first electrode and the second electrode for generating a plasma discharge within the GAC, thereby regenerating the GAC within the adsorption column, and a gas outlet in fluid communication with the adsorption column for venting waste gas produced by the plasma discharge.Type: GrantFiled: November 27, 2019Date of Patent: September 21, 2021Assignee: Onvector LLCInventor: Daniel J. Cho
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Patent number: 10941062Abstract: A system for the plasma treatment of a liquid is described. The system includes a storage chamber containing a liquid and a head-space, a gas source connected to a sparger positioned within the liquid, a pair of electrodes positioned within the liquid and substantially above the sparger, a microbubble generator positioned within the liquid, and a conduit between the head-space and the microbubble generator, such that gas from the head space can travel through the conduit to the microbubble generator. Also described is a method of plasma treating a liquid.Type: GrantFiled: November 15, 2018Date of Patent: March 9, 2021Assignee: Onvector LLCInventor: Jun Kang
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Publication number: 20200361797Abstract: A water treatment system includes a water inlet that intakes water to be treated, a high voltage (HV) electrode having a porous metal surface area in a range of between 0.1 cm2 and 5 cm2 in fluid communication with the water, such that the water flows through the porous metal surface area of the HV electrode, a ground electrode disposed across a gap from the HV electrode, in fluid communication with the water, a high voltage power supply electrically connected to the HV electrode for generating spark plasma or pulsed electric fields having a rise time equal to or less than 60 nanoseconds (ns) and an amplitude greater than or equal to 30 kV/cm across the gap, thereby producing treated water, and a water outlet that discharges the treated water.Type: ApplicationFiled: May 11, 2020Publication date: November 19, 2020Applicant: ONVECTOR LLCInventor: Daniel J. Cho
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Patent number: 10793447Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.Type: GrantFiled: September 15, 2015Date of Patent: October 6, 2020Assignee: Energy Onvector, LLCInventor: Jun Kang
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Publication number: 20200171409Abstract: A water treatment system includes an adsorption column including granular activated carbon (GAC) that adsorbs contaminants from untreated water onto the GAC, thereby producing treated water, a first electrode disposed at a proximal side of the adsorption column, with a gap between the first electrode and the GAC, a second electrode disposed at a distal side of the adsorption column, a drain outlet in fluid communication with the adsorption column for draining water out of the adsorption column, a gas inlet in fluid communication with the adsorption column for injecting a displacement gas into the adsorption column, a high voltage power supply electrically connected to one of the first electrode and the second electrode for generating a plasma discharge within the GAC, thereby regenerating the GAC within the adsorption column, and a gas outlet in fluid communication with the adsorption column for venting waste gas produced by the plasma discharge.Type: ApplicationFiled: November 27, 2019Publication date: June 4, 2020Applicant: ONVECTOR LLCInventor: Daniel J. Cho
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Patent number: 9845250Abstract: A system and method for stretching the discharge of plasma in a liquid utilizes in certain embodiments a first, second and third electrode within a liquid holding container, a gas injection conduit for introducing a gas such as air or oxygen into the container, and a power supply electrically coupled to at least the second and third electrodes. In certain embodiments, a seed plasma generated by a first and second electrode is stretched, and a larger plasma is generated by a first and third electrode. In certain embodiments, a fourth electrode can be used to further stretch the plasma. An increase in gas introduction flow rate can also be utilized to facilitate the stretching of plasma.Type: GrantFiled: April 28, 2015Date of Patent: December 19, 2017Assignee: ENERGY ONVECTOR, LLCInventor: Jun Kang