Abstract: An industrial cleaning composition comprises (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7, (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R?-(A0)n-OH wherein R? is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or—OCH2CH(CH3)—; the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6 and (c) from 5 to 50% by weight of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R?—(OCH2CH2)n—OH wherein R? is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.
Type:
Grant
Filed:
August 6, 2014
Date of Patent:
April 7, 2015
Assignee:
OTI Greentech Group AG
Inventors:
Jawahar Wakhloo, Alan Keasey, Caroline Kelly
Abstract: An industrial cleaning composition is provided that includes: (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R?—(A0)n—OH, wherein R? is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and (c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R?—(OCH2CH2)n—OH wherein R? is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.
Type:
Grant
Filed:
April 26, 2013
Date of Patent:
October 28, 2014
Assignee:
OTI Greentech Group AG
Inventors:
Jawahar Wakhloo, Alan Keasey, Caroline Kelly