Abstract: A process for preparing a 3-alkoxymethylcephem compound represented by the formula (II) ##STR1## where R.sub.1 is a hydrogen atom, amino or protected amino, R.sub.3 is a hydrogen atom or carboxylic acid protective group and R.sub.4 is lower alkyl, which process is characterized in that a 3-thiomethylcephem compound represented by the formula (I) ##STR2## where R.sub.1 and R.sub.3 are as defined above and R.sub.2 is aryl which may have a substituent, is electrolytically oxidized in an electrooxidation reaction system in the presence of a lower alcohol using as a positive electrode, a material selected from the group consisting of platinum, tin, aluminum, stainless steel, nickel, lead oxide, carbon, iron oxide and titanium, to obtain the 3-alkoxymethylcephem compound.

Abstract: An object of the present invention is to provide a thermosetting resin composition which can impart high slidability and great abrasion resistance while maintaining the excellent properties of thermosetting resins such as outstanding heat resistance, high-precision moldability, long-term durability, great mechanical strength, etc. The thermosetting resin composition for a sliding member according to the present invention comprises 100 parts by weight of a thermosetting resin, 50 to 600 parts by weight of an inorganic filler and 2 to 20 parts by weight of polyolefin powder having a particle size of up to 200 .mu.m, the inorganic filler containing potassium titanate fibers in an amount of 2 to 35 parts by weight per 100 parts by weight of the thermosetting resin.

Abstract: This invention aims to provide titanate whiskers which are excellent in heat resistance, chemical resistance and reinforcing effect and are low in coefficient of thermal conductivity.The titanate whiskers of the invention are those represented by the formulaA.sup.I.sub.v A.sup.II.sub.w M.sup.II.sub.x M.sup.III.sub.y Ti.sub.8-z O.sub.16wherein A.sup.I is at least one member selected from alkali metals, A.sup.II is Ba, M.sup.II is at least one member selected from the group consisting of Mg, Co, Ni, Zn, Cu and Mn, M.sup.III is at least one member selected from the group consisting of Al, Sc, Cr, Fe and Ga, and v, w, x, y and z are real numbers which fulfill 0.5.ltoreq.2x+y.ltoreq.2.5, 2x+y=v+2w, and z=x+y.

Abstract: A resin compound for a molding die, a molding die made of the resin compound, and a molding method using the molding die are disclosed. The resin compound includes thermoplastic resin, inorganic fiber reinforcing material and inorganic particle filler, has a flexural strength of 1000 kgf/cm.sub.2 or more and a modulus of elasticity in bending of 70000 kgf/cm.sup.2 or more, and allows machining. A deflection temperature under flexural load of the compound may be 180.degree. C. or more. From this compound, it is possible to provide a core, a cavity block or the like of molding dies which can be accurately finished by machining finishing with a low cost and within a short term, have durability and allows recycling. The molding dies can be applied to various molding methods, and provide accurate molded products with a low cost.

Abstract: The invention provides a process for preparing an allenyl .beta.-lactam of formula (4), by reacting the hydroxyl group of a .beta.-lactam of formula (1) with a reactive derivative of sulfonic acid of formula (2) to convert the compound of formula (1) to a .beta.-lactam of formula (3), thereafter reacting the resulting .beta.-lactam with a basic anion exchange resin of the type having a tertiary organic base fixed to the resin and isolating the allenyl .beta.-lactam of formula (4) with stability and high purity in a high yield.The invention also provides a process for preparing an allenyl .beta.-lactam of formula (4), by reacting the hydroxyl group of a .beta.-lactam compound of formula (1) with a reactive derivative of sulfonic acid of formula (2) to convert the compound of the formula (1) to a .beta.-lactam compound of formula (3), thereafter reacting the resulting .beta.-lactam of formula (3) with a tertiary organic base to convert the compound (3) to the allenyl .beta.

Abstract: An object of the present invention is to provide a novel bisbenzotriazolylphenol compound having a UV absorving effect. The bisbenzotriazolylphenol compound of the invention is represented by the formula ##STR1## wherein A is a direct bond or represents a C.sub.1-6 alkylene group, a --C(CH.sub.3).sub.2 -- group, a --C(C.sub.2 H.sub.5)(CH.sub.3)-- group, a --O-- group or a --NH-- group, R.sup.1 and R.sup.3 are the same or different and each represent a hydrogen atom, a C.sub.1-4 alkyl group, an aryl group, a C.sub.1-4 alkoxy group or a halogen atom, and R.sup.2 and R.sup.4 are the same or different and each represent a hydroxyl group or a C.sub.1-12 straight- or branched-chain hydroxyalkyl group.

Abstract: A process for preparing a 3-halogenated cephem derivative represented by the formula (2), characterized by causing a halogenating reagent to act on an allenyl .beta.-lactam compound represented by the formula (1) in the presence of a cuprous salt or cupric salt to obtain the 3-halogenated cephem derivative ##STR1## wherein R.sup.1 is a hydrogen atom, amino or protected amino, R.sup.2 is a hydrogen atom, halogen atom, lower alkoxyl, lower acyl, lower alkyl, lower alkyl having at least one selected from hydroxyl and protected hydroxyl as a substituent, hydroxyl or protected hydroxyl, R.sup.3 is a hydrogen atom or carboxylic acid protecting group, R.sup.4 is an aromatic compound residue which may have a substituent or nitrogen-containing aromatic heterocyclic compound residue which may have a substituent, and n is 0 to 2 ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, X is a halogen atom.

Abstract: The present invention provides a process for producing a .beta.-lactam halide compound represented by the general formula (2) which process is characterized in that the hydroxyl group of a .beta.-lactam halide compound represented by the general formula (1) is substituted with a halogen atom or a leaving group.

Abstract: The air bag gas generating composition of this invention comprises a nitrogen-containing organic compound and at least one oxidizing agent selected from the group consisting of oxo halogen acid salts and nitrates. The invention provides an air bag gas generating composition without a high shock sensitivity and with an available burning velocity and gas output characteristics and featuring a comparatively low combustion temperature.

Abstract: A gas generating composition which is capable of significantly reducing the concentration of harmful gas components, particularly carbon monoxide, in the generated gas. Also a process for molding a gas generating composition in a suitable shape with high efficiency without a risk of explosion, fire or the like, the process being capable of producing a durable and firm molded gas generating composition.The gas generating composition of the invention contains an oxide-based catalyst comprising at least two members selected from the elements of Groups I, IV, V, VI, VII and VIII in the periodic table in addition to the nitrogen-containing organic compound and the oxygen-containing inorganic oxidizing agent both essentially incorporated in the gas generating composition.

Abstract: An object of the invention is to provide an indole-2-carboxylic acid ester derivative which shows a selectively high fungicidal effect on fungicide-resistant fungi. The indole-2-carboxylic acid ester derivative of the invention is a compound represented by the formula ##STR1## wherein R.sup.1 is a hydrogen atom, a hydroxy group, a C.sub.1-4 acyl group, a C.sub.1-4 acyloxy group, a C.sub.1-4 alkoxy group, a (C.sub.1-4 alkoxycarbonyl)oxy group, a phenoxycarbonyl group or a C.sub.1-4 alkoxycarbonyl group, R.sup.2 is a C.sub.1-4 alkyl group, R.sup.3 is a hydrogen atom, a C.sub.1-4 alkyl group, a C.sub.2-4 alkenyl group, a phenyl group, a cyano group, a carbamoyl group or the like, R.sup.4 and R.sup.5 are the same or different and each represents C.sub.1-4 alkyl group or a halogen atom.

Abstract: The present invention provides an ozonide reducing agent for use in the ozonolysis reaction of an organic compound, the ozonide reducing agent finding wide applications, and being safe and inexpensive from a commercial viewpoint and easy to treat for disposal.The ozonide reducing agent of the invention is a compound wherein sulfur has, at both ends of its molecule, a hydrocarbon residue substituted by a polar functional group.

Abstract: An object of the present invention is to provide a 1,2,4-triazole derivative which in a small amount exhibits high herbicidal activity against weeds in paddy fields, lawns or farmlands, the derivative being without injury to rice, turf grasses and crops. The 1,2,4-triazole derivative is represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and independently represent hydrogen or methyl, R.sup.3 and R.sup.4 are the same or different and independently represent halogen, lower alkyl, lower alkoxy, lower haloalkyl, lower haloalkoxy or cyano, R.sup.5 represents methyl or ethyl and X represents oxygen or sulfur.

Abstract: A pyrazole derivative represented by the formula (1) is low in toxicity and persistence and yet has an extremely high insecticidal efficacy ##STR1## wherein A is CH, N or C-halogen atom, R.sup.1 is hydrogen atom, lower alkyl, lower haloalkyl, benzyl or phenyl, R.sup.2 is lower alkyl, lower haloalkyl, lower alkenyl, lower alkynyl, benzyl or phenyl, R.sup.3 is hydrogen atom, a halogen atom lower alkyl, lower haloalkylthio, phenyl, cyano, nitro or amino, R.sup.4 is halogen atom, R.sup.5 is lower haloalkyl, R.sup.6 is hydrogen atom, lower alkyl, lower haloalkyl or benzyl, R.sup.1 and R.sup.6 being not hydrogen atoms at the same time, l is 0 or 1, m is 0 or 1 and n is a number of 0 to 2.

Abstract: An object of the present invention is to provide a novel compound which is suitably usable as a photochromic material.The compound of the present invention is a salt of a spiropyran compound and an acidic compound, the spiropyran compound being represented by the formula ##STR1## wherein R.sup.1 means a C.sub.1 to C.sub.20 alkyl group, an aralkyl group, a hydroxyethyl group, an acryloxyethyl group or a methacryloxyethyl group, R.sup.2 to R.sup.7 each mean a hydrogen atom, a C.sub.1 to C.sub.6 alkyl group or the like, R.sup.8 means a hydrogen atom, a vinyl group, a group --CH.sub.2 OR.sup.9 or a group --CH.sub.2 OCOC(R.sup.10).dbd.CH.sub.2 (wherein R.sup.9 means a hydrogen atom or a C.sub.1 to C.sub.4 alkyl group and R.sup.10 means a hydrogen atom or a methyl group), and X means an oxygen atom or a sulfur atom.

Abstract: The present invention provides a cephem compound having a high antimicrobial activity against various pathogenic bacteria.The cephem compound of the invention is represented by the formula ##STR1## wherein Q represents CH or N, R.sup.1 represents a carboxylate or the like, R.sup.2 represents a hydrogen atom, and R represents ##STR2## wherein R.sup.3 represents a group --(CH.sub.2).sub.m --Y (wherein m is an integer of 1 to 5, and Y represents a quaternary ammonium group) or the like, n is an integer of 0 to 4, B.sup.- represents an anion, f is 0 or 1 when R.sup.1 represents a carboxylate, and 2 when R.sup.1 represents a carboxyl group, and the ring C represents a 5-membered heterocyclic group of not more than 4 nitrogen atoms, which may be substituted by a lower alkyl group.

Abstract: A process for preparing a 2-isocephem derivative characterized in that a thioacetic acid derivative which itself is basic or a mixture of a base and a thioacetic acid derivative is caused to act on a 2-azetidinyl-3,4-dihalogeno-2-butenoic acid compound represented by the general formula (1) in a water-containing organic solvent to obtain a 3-halomethyl-2-isocephem derivative represented by the general formula (2), and a process for preparing a 2-oxaisocephem derivative characterized in that a base is caused to act on a 2-azetidinyl-3,4-dihalogeno-2-butenoic acid compound represented by the general formula (1) in a water-containing organic solvent to obtain a 3-halomethyl-2-oxaisocephem derivative represented by the general formula (3) ##STR1## wherein R.sup.1 is a hydrogen atom, amino or protected amino, R.sup.2 is a hydrogen atom or lower alkoxyl, R.sup.1 and R.sup.2, when taken together, form a cyclic amino protecting group, R.sup.

Abstract: This invention has for its object to provide a matrix which finds application as a plant culture medium which is light-weight, possessed of large moisture and fertilizer holding capacities, easy to dispose of after use, and benign to the environment or a microorganism-immobilizing support capable of immobilizing a large population of microorganisms with remarkably improved long-term viability and providing for markedly improved colonization and growth rates. The matrix of this invention is composed predominantly of polysaccharide and lignin and has an internal pore structure.

Abstract: An object of the invention is to provide a process for preparing a 3-substituted cephem compound from an allenyl-.beta.-lactam compound which can be easily produced from an inexpensive penicillin compound by a simple reaction procedure.The process of the invention comprises reacting an allenyl-.beta.-lactam compound with an organohalogen compound in the presence of a metal having a standard oxidation-reduction potential of -0.3 (V/SCE) or less in an amount at least equimolar with the allenyl-.beta.-lactam compound and 0.0001 to 0.5 mole, per mole of the allenyl-.beta.-lactam compound, of a metal compound having a higher standard oxidation-reduction potential than said metal.

Abstract: The present invention provides a process for preparing a cephem compound represented by the general formula (3) characterized in that an allenyl-.beta.-lactam compound represented by the general formula (1) is reacted with an organotin compound represented by the general formula (2) in the presence of a monovalent copper salt ##STR1## wherein R.sup.1 is a hydrogen atom, halogen atom, amino or protected amino, R.sup.2 is a hydrogen atom, halogen atom, lower alkoxyl, lower acyl, lower alkyl, lower alkyl having hydroxyl or protected hydroxyl as a substituent, hydroxyl or protected hydroxyl, or R.sup.1 and R.sup.2 form=0 when taken together, R.sup.3 is a hydrogen atom or carboxylic acid protecting group, R.sup.4 is aryl, aryl having a substituent, nitrogen-containing aromatic heterocyclic group or nitrogen-containing aromatic heterocyclic group having a substituent, and m is 0 or 2,(R.sup.5).sub.n --Sn(R.sup.6).sub.4--n (2)wherein R.sup.