Patents Assigned to Park Systems Corp.
  • Patent number: 7644447
    Abstract: Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: January 5, 2010
    Assignee: Park Systems Corp.
    Inventors: Sang-il Park, Yong-Seok Kim, Jitae Kim, Sang Han Chung, Hyun-Seung Shin, Jung-Rok Lee, Euichul Hwang
  • Publication number: 20090200462
    Abstract: A scanning probe microscope tilts the scanning direction of a z-scanner by a precise amount and with high repeatability using a movable assembly that rotates the scanning direction of the z-scanner with respect to the sample plane. The movable assembly is moved along a curved guide and has grooves that engage with corresponding projections on a stationary frame to precisely position the movable assembly at predefined locations along the curved guide.
    Type: Application
    Filed: February 26, 2009
    Publication date: August 13, 2009
    Applicant: Park Systems Corp.
    Inventors: Sang-il PARK, Yong-Seok KIM, Jitae KIM, Sang Han CHUNG, Hyun-Seung SHIN, Jung-Rok LEE, Euichul HWANG
  • Patent number: 7514679
    Abstract: Provided are a scanning probe microscope (SPM) that prevents a distortion of an image caused by alignment errors of scanners and a method of measuring a sample using the same. The scanning probe microscope comprises a probe; a first scanner changing a position of the probe along a straight line; a second scanner changing a position of a sample in a plane; and an adjusting device adjusting a position of the second scanner or the first scanner so that the straight line where the position of the probe is changed using the first scanner is perpendicular to the plane in which the position of the sample is changed using the second scanner.
    Type: Grant
    Filed: November 1, 2006
    Date of Patent: April 7, 2009
    Assignee: Park Systems Corp.
    Inventors: Hyun Seung Shin, Young Doo Kim, Yong Seok Kim, Sang-il Park