Patents Assigned to Philip A. Hunt Chemical Corporation
-
Patent number: 4650745Abstract: Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak resin, a naphthoquinone diazide sensitizer, a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm and an effective proportion of a trihydroxybenzophenone compound. Also disclosed is a method of forming a resist pattern on a substrate by employing the positive-working resist composition.Type: GrantFiled: June 26, 1986Date of Patent: March 17, 1987Assignee: Philip A. Hunt Chemical CorporationInventor: James N. Eilbeck
-
Patent number: 4617252Abstract: Disclosed are antireflective layers for use in the manufacture of semi-conductor devices, methods and solutions for making such antireflective layers, and the use of such antireflective layers to absorb light in ultraviolet photolithography. The antireflective layers that are utilized comprise a polyphenylquinoxaline.Type: GrantFiled: June 12, 1984Date of Patent: October 14, 1986Assignee: Philip A. Hunt Chemical CorporationInventors: William F. Cordes, III, Alfred T. Jeffries, III
-
Patent number: 4587196Abstract: Cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range for use in fast positive photoresist compositions together with one or more sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation and developed in alkaline solution, yielding a relief pattern of resist on substrate useful for a number of applications.Type: GrantFiled: October 31, 1984Date of Patent: May 6, 1986Assignee: Philip A. Hunt Chemical CorporationInventor: Medhat A. Toukhy
-
Patent number: 4565776Abstract: Oxidation inhibiting amounts of alkylated diphenyl oxide disulfonates are incorporated into photographic color developers containing primary aromatic amino color developing agents to increase clarity and inhibit the formation of tar-like precipitates in these developers. Typical disulfonates include sodium dodecyl diphenyl ether disulfonate, sodium decyl diphenyl ether disulfonate, sodium cetyl diphenyl ether disulfonate, monocetyl diphenyl ether disulfonate, dicetyl diphenyl ether disulfonate and mixtures thereof. The use of disulfonates of this type substantially eliminates the need for cosolvents such as alkanolamines to inhibit the formation of tar-like particles in the developers.Type: GrantFiled: April 29, 1985Date of Patent: January 21, 1986Assignee: Philip A. Hunt Chemical CorporationInventors: Hongzoon Kim, Thomas E. Salamy
-
Patent number: 4529682Abstract: Cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range for use in fast positive photoresist compositions together with one or more sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation and developed in alkaline solution, yielding a relief pattern of resist on substrate useful for a number of applications.Type: GrantFiled: August 2, 1982Date of Patent: July 16, 1985Assignee: Philip A. Hunt Chemical CorporationInventor: Medhat A. Toukhy
-
Patent number: 4377631Abstract: Fast positive photoresist compositions employing cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range and one or more of a selected group of naphthoquinone diazide sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation even in the deep ultra-violet range and developed in alkaline solution, yielding a high-resolution relief pattern of resist on substrate useful for a number of applications.Type: GrantFiled: June 22, 1981Date of Patent: March 22, 1983Assignee: Philip A. Hunt Chemical CorporationInventors: Medhat A. Toukhy, Leo Klawansky
-
Patent number: 4060447Abstract: An improvement in an etching process in which the etched product, the surface of which is covered with a film of aqueous etching liquid containing ions of the material etched, is rinsed with an aqueous liquid and the resulting liquid, now containing said ions in dilute concentration, is passed through an ion exchanger to selectively remove the ions from the rinse liquid which thereupon can be reused or discharged, without ecological damage, from the ion exchanger. The ion exchanger when laden with such ions is regenerated by passage therethrough of at least a portion of an etcher make-up aqueous replenishing solution which contains a zero or low concentration of said ions. The resulting replenishing solution portion, now containing a small concentration of these ions, is passed to the etcher, e.g., to the etcher sump.Type: GrantFiled: March 29, 1976Date of Patent: November 29, 1977Assignee: Philip A. Hunt Chemical CorporationInventor: Warren A. Nelson
-
Patent number: 4032379Abstract: A one-step powderless high-speed process for producing photoengraved letter-press printing and pattern plates from magnesium and alloys thereof by etching such plates in a machine that directs against a surface of the plate droplets of an etching liquid comprising an aqueous solution of a strong inorganic acid and adjuvants.Type: GrantFiled: October 31, 1975Date of Patent: June 28, 1977Assignee: Philip A. Hunt Chemical CorporationInventors: David L. Czirr, Harry Kroll
-
Patent number: 3991226Abstract: A hybrid liquid toner composed of a mixture of two different types of liquid toner. One type is a liquid toner that includes a complex amphipathic molecule of which at least a fixer and a dispersant are polymeric moieties and which additionally includes a charge director and optionally includes a color agent, all of these being carried by a volatile organic solvent of high electrical resistivity. The other type of liquid toner is one that includes a fixer and a dispersant as separate chemical entities and further includes a charge director, a pigment type color agent and a carrier solvent such as mentioned above. The two toners can be mixed in a very wide range of proportions and when so mixed have several advantages which makes the hybrid toner particularly useful in connection with preparation of lithographic masters and microfiche reproductions by electrostatography as well as useful as an all purpose liquid toner.Type: GrantFiled: January 14, 1974Date of Patent: November 9, 1976Assignee: Philip A. Hunt Chemical CorporationInventor: George E. Kosel
-
Patent number: 3990980Abstract: A hybrid liquid toner composed of a mixture of two different types of liquid toner. One type is a liquid toner that includes a complex amphipathic molecule of which at least a fixer and a dispersant are polymeric moieties and which additionally includes a charge director and optionally includes a color agent, all of these being carried by a volatile organic solvent of high electrical resistivity. The other type of liquid toner is one that includes a fixer and a dispersant as separate chemical entities and further includes a charge director, a pigment type color agent and a carrier solvent such as mentioned above. The two toners can be mixed in a very wide range of proportions and when so mixed have several advantages which makes the hybrid toner particularly useful in connection with preparation of lithographic masters and microfiche reproductions by electrostatography as well as useful as an all purpose liquid toner.Type: GrantFiled: September 12, 1974Date of Patent: November 9, 1976Assignee: Philip A. Hunt Chemical CorporationInventor: George E. Kosel
-
Patent number: 3935118Abstract: A one-step powderless high-speed process for producing photoengraved letter-press printing and pattern plates from magnesium and alloys thereof by etching such plates in a machine that directs against a surface of the plate droplets of an etching liquid comprising an aqueous solution of a strong inorganic acid and adjuvants.Type: GrantFiled: February 11, 1974Date of Patent: January 27, 1976Assignee: Philip A. Hunt Chemical CorporationInventors: David L. Czirr, Harry Kroll
-
Patent number: D243842Type: GrantFiled: October 20, 1975Date of Patent: March 29, 1977Assignee: Philip A. Hunt Chemical CorporationInventors: Burke Leon, Victor Johansen, Peter Rose, Gary Rolih