Abstract: A pollution control apparatus and method reduces contaminants, such as NOx and SOx pollutants, from an effluent gas stream. The pollution control device includes a resonance chamber that ionizes the effluent gas stream. The contaminants of the effluent gas stream are destroyed in a non-thermal plasma reactor. The effluent gas is then cooled in a cooling unit to substantially place the effluent gas in a non-excited state prior to releasing the effluent gas into the environment or re-injecting the effluent gas into the source of the effluent gas. Re-association of the radical oxides into harmful pollutants is thereby substantially prevented.
Type:
Grant
Filed:
October 23, 2000
Date of Patent:
August 13, 2002
Assignee:
Pioneer Industrial Technologies, Inc.
Inventors:
Edward Domenic Bianco, Michael A. Kline