Abstract: A process is disclosed for converting hydrogen chloride (HCl) to molecular chlorine (Cl.sub.2) and molecular hydrogen (H.sub.2), and more particularly to such process conducted in a plasma environment.
Type:
Grant
Filed:
February 20, 1997
Date of Patent:
August 10, 1999
Assignees:
E. I. du Pont de Nemours and Company, Plasma Plus
Abstract: A method for making metastable compounds of Me metal, argon and hydrogen, comprising the steps of generating a high frequency plasma discharge in a flow of hydrogen-argon gas mixture, the plasma discharge having a higher temperature plasma generating active region and producing a flow of plasma downstream of the plasma discharge; establishing a zone of substantially zero axial flow of the mixture within the active region of the plasma discharge relative to the flow of plasma immediately downstream of the generating means; introducing finely powdered Me metal into or near the zone and within the active region at a rate conducive to evaporation of the metal in the plasma discharge; rapidly cooling the reaction products resulting from interaction of the Me metal with the plasma to precipitate a solid component; and passivating the surface of the solid component.
Abstract: Efficiency of low pressure gas plasma processes is increased by addition of small quantities of water vapor to the primary gas constituting the plasma. Treated fabrics and polymer films show decreased wetting angle and increased capillary absorption, which beneficially affects the material's susceptibility to dyeing and impregnation.
Type:
Grant
Filed:
April 6, 1992
Date of Patent:
September 6, 1994
Assignee:
Plasma Plus
Inventors:
Georgy Z. Paskalov, Svetlana A. Krapivina, Alexander K. Filippov
Abstract: An improved method for imparting water and oil repellent surface properties to fabrics or paper includes pretreatment in a low pressure oxygen plasma in the presence of water vapor followed by plasma polymerization of methane in a high frequency glow discharge carried out in the same treatment chamber. The resultant polymer film formed on the material surface resists separation from the treated material even after prolonged immersion in water. The method is characterized by use of low cost and readily available starting monomer, by use of a single treatment unit for all stages of the process, reduced energy requirements and treatment time, and improved results over conventional processes.
Type:
Grant
Filed:
April 6, 1992
Date of Patent:
July 12, 1994
Assignee:
Plasma Plus
Inventors:
Georgy Z. Paskalov, Svetlana A. Krapivina, Alexander K. Filippov
Abstract: Crop yields are improved by treatment of the plant seeds in a low temperature plasma discharge generated between spaced apart electrodes connected to a source of high frequency electrical power.
Type:
Grant
Filed:
October 13, 1992
Date of Patent:
January 25, 1994
Assignee:
Plasma Plus
Inventors:
Svetlana A. Krapivina, Alexander K. Filippov, Tatiana N. Levitskaya, Andrei Bakhvalov
Abstract: Archival materials including paper manuscripts are preserved by a thin protective polymer film applied to the surface of the item by plasma polymerization of an organic monomer gas in a high frequency glow discharge. The polymer film protects the item against humidity and prevents widening of stroke lines due to ink spreading on the document. Microorganism growth is stopped by pretreatment of the document in a monoatomic gas plasma.
Type:
Grant
Filed:
April 6, 1992
Date of Patent:
November 16, 1993
Assignee:
Plasma Plus
Inventors:
Svetlana A. Krapivina, Georgy Z. Paskalov, Alexander K. Filippov