Abstract: Ultra fine and nanometer powders and a method of producing same are provided, preferably refractory metal and ceramic nanopowders. When certain precursors are injected into the plasma flame in a reactor chamber, the materials are heated, melted and vaporized and the chemical reaction is induced in the vapor phase. The vapor phase is quenched rapidly to solid phase to yield the ultra pure, ultra fine and nano product. With this technique, powders have been made 20 nanometers in size in a system capable of a bulk production rate of more than 10 lbs/hr. The process is particularly applicable to tungsten, molybdenum, rhenium, tungsten carbide, molybdenum carbide and other related materials.
Type:
Grant
Filed:
October 6, 2006
Date of Patent:
November 10, 2009
Assignee:
Plasma Processes, Inc.
Inventors:
Timothy N. McKechnie, Leo V. M. Antony, Scott O'Dell, Chris Power, Terry Tabor
Abstract: Ultra fine and nanometer powders and a method of producing same are provided, preferably refractory metal and ceramic nanopowders. When certain precursors are injected into the plasma flame in a reactor chamber, the materials are heated, melted and vaporized and the chemical reaction is induced in the vapor phase. The vapor phase is quenched rapidly to solid phase to yield the ultra pure, ultra fine and nano product. With this technique, powders have been made 20 nanometers in size in a system capable of a bulk production rate of more than 10 lbs/hr. The process is particularly applicable to tungsten, molybdenum, rhenium, tungsten carbide, molybdenum carbide and other related materials.
Type:
Application
Filed:
October 6, 2006
Publication date:
August 28, 2008
Applicant:
Plasma Processes, Inc.
Inventors:
Timothy McKechnie, Leo Antony, Scott O'Dell, Chris Power, Terry Tabor
Abstract: A method for fabricating and the resulting x-ray target comprising metal deposited on an electrically-conductive base member by electrodeposition from a molten salt electrolyte is claimed. The method comprises submerging the base member in a molten salt electrolyte bath. The base member acts as a cathode and anodes of target material metals are activated by electrical circuitry to deposit a target layer onto the base member. The electrodeposition method results in an exceptionally dense and pure layer of tungsten or tungsten alloy. Target materials of tungsten, tungsten alloy, rhenium, and rhenium alloy produce good results when electrodeposited onto base members fabricated from molybdenum, molybdenum alloy, and graphite-or carbon-based composites.
Type:
Application
Filed:
March 1, 2006
Publication date:
September 6, 2007
Applicant:
Plasma Processes, Inc.
Inventors:
Timothy McKechnie, Anatoliy Shchetkovskiy, Alexander Smirnov
Abstract: A high temperature and highly corrosive resistant structure and method of fabricating the structure. In one embodiment of the present invention, vacuum plasma spray or other materials deposition techniques are used to fabricate the structure on a removable support member in the form of a gradient or composite structure that sequentially consists of a 100% ceramic interior layer, a first transition layer of ceramic/refractory metal, a layer of 100% refractory metal, a second transition layer of ceramic/refractory metal, and an outer layer of 100% ceramic material. In a second embodiment, the ceramic/refractory metal/ceramic cartridge is formed without transition layers between the ceramic and metal layers. In another embodiment of the invention the structure is fabricated on a removable support member by depositing an outer layer of ceramic material on a refractory metal. No transition layers of ceramic material/refractory metals are used.
Type:
Grant
Filed:
November 13, 1996
Date of Patent:
June 30, 1998
Assignee:
Plasma Processes, Inc.
Inventors:
Timothy N. McKechnie, Richard R. Holmes, Frank R. Zimmerman, Chris A. Power