Patents Assigned to Rayzist Photomask Inc.
  • Publication number: 20160008951
    Abstract: The present invention provides, in at least one embodiment, a memorial process in the memorial industry utilizing a novel photo resist process and novel state of the art design ordering software. The software allows the customer to create and order a design online with the family present. The software solves problems including that the conventional process requires an approval of a layout or requires a professional draftsman on site to draw the customer's design. The software also allows for barcode label tracking throughout the process. Finely detailed engravings are achieved using the photo resist engraving process in the memorial industry, where the photo resist is repositionable prior to be applied to the memorial.
    Type: Application
    Filed: July 8, 2014
    Publication date: January 14, 2016
    Applicant: RAYZIST PHOTOMASK, INC.
    Inventors: Randy Willis, Roderick Geis, Josh Willis
  • Publication number: 20150275539
    Abstract: The present invention provides, in at least one embodiment, a columbarium niche configured to store one or more urns holding a deceased's cremated remains. The columbarium niche includes an improved niche cover having a stone inlay inserted into a cut out portion of the niche cover and personalized and design engravings on the stone inlay. The stone inlay is easier to read and find due to a contrast in color and/or stone and eliminates the need for a conventional plaque on the surface of the niche cover. The personalized and design engravings on the niche cover from sandblasting or laser engraving add value due to the uniqueness, improved quality, and modern look.
    Type: Application
    Filed: April 1, 2015
    Publication date: October 1, 2015
    Applicant: Rayzist Photomask, Inc.
    Inventors: Randy Willis, Roderick Geis, Josh Willis
  • Publication number: 20150261208
    Abstract: The present invention provides, in at least one embodiment, a computer software program configured to receive information from a customer, provide one or more design template choices, and receive an order of a design of an engraved product from the customer. The design can be created by the customer as opposed to a professional artist and can allow the customer to see with confidence what the finished engraved product is going to look like prior to ordering. The computer software program includes an order tracking module which allows the customer to track the order throughout production and delivery.
    Type: Application
    Filed: March 17, 2014
    Publication date: September 17, 2015
    Applicant: Rayzist Photomask, Inc.
    Inventors: Roderick Geis, Josh Willis
  • Publication number: 20150056414
    Abstract: The present invention provides, in at least one embodiment, a film and method for engraving objects. The film includes an adhesive layer configured to allow the film to be easily repositionable on the surface of an object. For example, the film can be shifted, rotated, or moved prior to pressure being applied and before the engraving. Additionally, the photoresist layer includes microspheres comprising small pockets of air which strengthen the photoresist layer by bouncing the engraving blast away and allow the photoresist layer to advantageously be designed thinner.
    Type: Application
    Filed: August 26, 2013
    Publication date: February 26, 2015
    Applicant: Rayzist Photomask, Inc.
    Inventors: Randy Willis, Josh Willis
  • Patent number: 6235449
    Abstract: A photoresist laminate includes a substrate (such as PET film having a thickness of between about 0.002-0.003 inches) with first and second faces, a first film layer, and a second layer. The first film layer is a photoresist material (radiation sensitive) which is soluble or dispersible in water but which will harden upon sufficient exposure to radiation so as to become substantially insoluble or non-dispersible. The first film layer may be of any conventional photoresist material (e.g. having a thickness of about 0.002-0.009 inches) and is operatively disposed on the substrate first face (either directly contacting it or connected to a membrane support layer which in turn is directly connected to the substrate first face). The second layer is of a material and thickness so that it substantially prevents sticking of the first film layer to other surfaces, while not significantly interfering with the radiation sensitivity thereof.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: May 22, 2001
    Assignee: Rayzist Photomask Inc.
    Inventors: Roger Souders, Randy S. Willis
  • Patent number: 5370762
    Abstract: Photomasks used for sandblasting and sandcarving may be readily produced by the user of the photomask in a simple and relatively inexpensive manner. The user places a stencil and print positive in a manual clamping structure --between a pivoted glass cover and foam covered base and exposes them to about 60-90 seconds of ultraviolet light from a 500 watt bulb. After removing the print positive, the stencil is then placed on a support surface above a tank, and reciprocating spray heads direct 100 psi, 90 degrees F. water onto the stencil to remove uncured emulsion. A combination pump/heater within the tank recirculates tank water to the spray heads. The stencil is then hand blotted, e.g. using a lamb's wool roller, and then dried in a microwave oven at low power for about eight minutes. Then it is placed on newspaper, and hat activated liquid adhesive is placed in a pool at one end of it and manually drawn over it with a draw bar, to produce the final photomask.
    Type: Grant
    Filed: February 11, 1992
    Date of Patent: December 6, 1994
    Assignee: Rayzist Photomask, Inc.
    Inventors: Raymond L. Zukowski, Randy S. Willis
  • Patent number: 5366584
    Abstract: Uncured emulsion is effectively washed from a stencil in the production of photomasks by mounting a drum rotatable about a horizontal axis within a portable cabinet. The drum is driven by a small (e.g. variable speed 1/16 HP) electric motor and spins at about 50-100 rpm. Water is sprayed onto the stencil mounted on the drum at about 80 psi by 4-10 V-jet nozzles. Liquid running off the stencil is collected by a catch basin mounted just below the drum, and passes through a drain pipe with strainer into a heat insulated holding tank with an electric resistance heating element, and is recirculated from the tank to the spray nozzles-by a high pressure pump. The pump and motor are controlled by a timer, and after completion of the washing cycle the stencil is removed from the cabinet.
    Type: Grant
    Filed: April 6, 1993
    Date of Patent: November 22, 1994
    Assignee: Rayzist Photomask, Inc.
    Inventors: Raymond L. Zukowski, Randy S. Willis
  • Patent number: 5230127
    Abstract: A cremation urn has a front wall with human readable indicia (such as the name of a deceased human or pet) formed integrally with the front wall, the front wall actually being a component of the urn. The indicia may be relief indicia, as formed by sand blasting decorative stone such as granite or marble, or raised indicia, such as formed with a bronze casting. Side walls with grooves for receiving the front wall side edges, and edges of a common top, rear, and partial bottom piece of malleable material (e.g. brass), are held together with a number of bolts and cooperating T-nuts, with the bolt holes covered with plugs, or by hooks and turnbuckles. The bottom includes a removable plate, which allows access to the interior volume so that ashes in a bag may be readily inserted into, and removed from, the container.
    Type: Grant
    Filed: May 7, 1992
    Date of Patent: July 27, 1993
    Assignee: Rayzist Photomask, Inc.
    Inventors: Raymond L. Zukowski, Randy S. Willis
  • Patent number: RE38114
    Abstract: A photoresist laminate includes a substrate (such as PET film having a thickness of between about 0.002-0.003 inches) with first and second faces, a first film layer, and a second layer. The first film layer is a photoresist material (radiation sensitive) which is soluble or dispersible in water but which will harden upon sufficient exposure to radiation so as to become substantially insoluble or non-dispersible. The first film layer may be of any conventional photoresist material (e.g. having a thickness of about 0.002-0.009 inches) and is operatively disposed on the substrate first face (either directly connecting it or connected to a membrane support layer which in turn is directly connected to the substrate first face). The second layer is of a material and thickness so that it substantially prevents sticking of the first film layer to other surfaces, while not significantly interfering with the radiation sensitivity thereof.
    Type: Grant
    Filed: February 8, 2002
    Date of Patent: May 6, 2003
    Assignee: Rayzist Photomask, Inc.
    Inventors: Roger Souders, Randy S. Willis