Patents Assigned to Rigaku Industrial Corporation
  • Patent number: 7949093
    Abstract: An X-ray fluorescence spectrometer for measuring the concentration of sulfur contained in a sample (S), by irradiating the sample (S) with primary X-rays from an X-ray tube (11), monochromating fluorescent X-rays emitted from the sample (S) with a spectroscopic device, and detecting monochromated fluorescent X-rays with an X-ray detector. The spectrometer includes the X-ray tube (11) having a target with an element including chromium, an X-ray filter (13) disposed on a path of travel of X-rays between the X-ray tube (11) and the sample (S) and having a predetermined transmittance for Cr—K? line from the X-ray tube (11) and made of a material which is an element of which absorption edges do not exist between energies of S—K? line and Cr—K? line, and a proportional counter (18) having a detector gas containing a neon gas or a helium gas.
    Type: Grant
    Filed: November 24, 2006
    Date of Patent: May 24, 2011
    Assignee: Rigaku Industrial Corporation
    Inventors: Yoshiyuki Kataoka, Hisayuki Kohno, Noboru Yamashita, Makoto Doi
  • Patent number: 7848483
    Abstract: The present invention provides a multilayer structure including a substrate having formed on a surface thereof at least one period of individual layers, the period having at least two layers including a first layer which includes magnesium silicide and a second layer which includes at least one of tungsten, tantalum, cobalt, nickel, copper, iron, chromium, alloys, oxides, borides, silicides, and nitrides of these elements, silicon, carbon, silicon carbide, boron, and boron carbide. If the period includes three layers, the second layer includes one of silicon, carbon, silicon carbide, boron, and boron carbide and a third layer includes one of tungsten, tantalum, cobalt, nickel, copper, iron, chromium, and alloys, oxides, borides, silicides, and nitrides of these elements, the second layer being disposed between the first and the third layers.
    Type: Grant
    Filed: August 5, 2008
    Date of Patent: December 7, 2010
    Assignees: Rigaku Innovative Technologies, Rigaku Industrial Corporation
    Inventors: Yuriy Y. Platonov, Kazuaki Shimizu
  • Publication number: 20090116613
    Abstract: An X-ray fluorescence spectrometer for measuring the concentration of sulfur contained in a sample (S), by irradiating the sample (S) with primary X-rays from an X-ray tube (11), monochromating fluorescent X-rays emitted from the sample (S) with a spectroscopic device, and detecting monochromated fluorescent X-rays with an X-ray detector. The spectrometer includes the X-ray tube (11) having a target with an element including chromium, an X-ray filter (13) disposed on a path of travel of X-rays between the X-ray tube (11) and the sample (S) and having a predetermined transmittance for Cr—K? line from the X-ray tube (11) and made of a material which is an element of which absorption edges do not exist between energies of S—K? line and Cr—K? line, and a proportional counter (18) having a detector gas containing a neon gas or a helium gas.
    Type: Application
    Filed: November 24, 2006
    Publication date: May 7, 2009
    Applicant: RIGAKU INDUSTRIAL CORPORATION
    Inventors: Yoshiyuki Kataoka, Hisayuki Kohno, Noboru Yamashita, Makoto Doi
  • Publication number: 20090041184
    Abstract: An X-ray fluorescence spectrometer which includes a calculating device (10) operable to calculate the theoretical intensity of secondary X-rays (6), emanated from each of elements contained in a sample (13), based on the assumed composition and then to successively approximately modify and calculate the assumed composition so that the theoretical intensity and the converted and measured intensity, which have been detected by a detecting device (9) and then converted in a theoretical intensity scale, can match with each other, to thereby calculate the composition of the sample (13). The calculating device (10), when calculating the theoretical intensity, performs a simulation to determine the theoretical intensity of the secondary X-rays (6) for each of optical paths, using the size of the sample (13), and the intensity and the incident angle (?) of primary X-rays (2) impinged upon various areas of the sample surface (13a) as parameters.
    Type: Application
    Filed: December 8, 2005
    Publication date: February 12, 2009
    Applicant: RIGAKU INDUSTRIAL CORPORATION
    Inventors: Naoki Kawahara, Shinya Hara
  • Patent number: 7450685
    Abstract: A scanning X-ray fluorescence spectrometer includes a quantitatively analyzing device (18) which calculates the concentration of hexavalent chrome based on the fact that the peak spectroscopic angle, at which the maximum intensity is attained in Cr—K? line (22), changes depending on the ratio of the concentration of the hexavalent chrome vs. the concentration of the intensity of the total chrome. A plurality of detecting device (23) having different resolutions as a combination of a divergence slit (11), a spectroscopic device (6), a receiving slit (20) and a detector (8) is provided such that when the change of the peak spectroscopic angle is to be detected, a detecting device (23B) having a higher resolution than that of the detecting device (23A), which is selected when the concentration or the intensity of the total chrome is to be determined, is selected.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: November 11, 2008
    Assignee: Rigaku Industrial Corporation
    Inventors: Yoshiyuki Kataoka, Hisayuki Kohno, Masatsugu Kuraoka, Takashi Shoji, Yasujiro Yamada
  • Patent number: 7356114
    Abstract: An X-ray fluorescence spectrometer includes an X-ray source 7 for irradiating a sample 1 at a predetermined incident angle ø with primary X-rays 6, and a detecting device 9 for measuring an intensity of fluorescent X-rays 8 generated from the sample at a predetermined detection angle ? and ?, wherein with two combinations of the incident angle ø and the detection angle ? and ?, in which combinations the incident angles ø and/or the detection angles ? and ? are different from each other, each intensity of the fluorescent X-rays 8 is measured and, also, the incident angle ø and the detection angle ? and ? in each of the combination are so set that with respect to a measurement depth represented by the coating weight, at which the intensity of the fluorescent X-rays 8 attains a value equal to 99% of the uppermost limit when the coating weight of a target coating to be measured is increased, respective measurement depths in the two combinations may be a value greater than the coating weight of a coating 3.
    Type: Grant
    Filed: September 13, 2006
    Date of Patent: April 8, 2008
    Assignee: Rigaku Industrial Corporation
    Inventors: Yoshiyuki Kataoka, Eiichi Furusawa, Hisayuki Kohno
  • Patent number: 7187751
    Abstract: A calculating device 10 for calculating the concentration of elements contained in a sample 13 based on the FP method is provided. The calculating device 10 is operable to assume a concentration of unmeasured elements as far as unmeasured elements, of which fluorescent X-rays are not measured, are concerned, and, also, to utilize, in place of the secondary X-rays emanating from the unmeasured elements contained in the sample, scattered X-rays of the primary X-rays at least equal in number to the number of the unmeasured elements, of which concentrations are assumed, and including scattered X-rays of different wavelengths before they are scattered from the sample.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: March 6, 2007
    Assignee: Rigaku Industrial Corporation
    Inventors: Naoki Kawahara, Shinya Hara, Makoto Doi
  • Patent number: 7016463
    Abstract: To provide a sample retainer for X-ray fluorescence analysis, which is used in pretreating a liquid sample and then in X-ray fluorescence analysis of contents of such liquid sample, can sufficiently improve the limit of detection by suppressing the background and, also, allowing the fluorescent X-rays of a high intensity to be emitted uniformly, the sample retainer 5 comprises a ring-shaped pedestal 2; a hydrophobic film 3 of a thickness smaller than 10 ?m and having a peripheral portion 3a held by the pedestal and also having a transmitting portion 3b for passage of X-rays therethrough; and a sheet-like liquid absorbent element 4 applied to the transmitting portion 3b of the hydrophobic film 3 and having a thickness within the range of 1 to 100 ?m; wherein a liquid sample 1 is adapted to be dispensed dropwise onto and dried on the liquid absorbent element 4b with contents of the liquid sample 1 consequently retained thereon.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: March 21, 2006
    Assignee: Rigaku Industrial Corporation
    Inventors: Takao Moriyama, Michiko Inoue
  • Patent number: 6937691
    Abstract: An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatus 10 for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometer 40, and a transport apparatus 50 for transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatus 50 for controlling the sample pre-treatment apparatus 10, the X-ray fluorescence spectrometer 40 and the transport apparatus 50 in a totalized fashion.
    Type: Grant
    Filed: September 5, 2002
    Date of Patent: August 30, 2005
    Assignee: Rigaku Industrial Corporation
    Inventors: Motoyuki Yamagami, Akihiro Ikeshita
  • Patent number: 6836533
    Abstract: There is provided a multilayered spectroscopic device effective to achieve in a short length of time the highly accurate fluorescent X-ray analysis of boron wherein the influence that may be brought about by the interfering X-rays and the background is sufficiently reduced and the strength of reflection of B-K&agr; line is sufficient. In this multilayered spectroscopic device 3, lanthanum (La), an alloy containing lanthanum as a principal component or lanthanum oxide (La2O3) is used for the reflecting layers 31 and boron is used for the spacer layers 32 and the periodic length d is chosen to be within the range of 7 to 14 nm and the film thickness ratio of the reflecting layers 31 to the spacer layers 32 is chosen to be within the range of 2/3 to 3/2. It has a total laminated film thickness t of a value sufficient to allow the strength of reflection of B-K&agr; line to be equal to or higher than 98% of a saturation value.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: December 28, 2004
    Assignee: Rigaku Industrial Corporation
    Inventor: Kazuaki Shimizu
  • Patent number: 6824746
    Abstract: The present invention is to provide an efficient and highly practical novel desulfurization device capable of executing the depth desulfurization. A high-energy beam irradiating desulfurization device for a petroleum product or a petroleum semimanufactured product, comprising a catalyst liquid-liquid contact part for contacting a metal compound solution as a catalyst and the petroleum product or the petroleum semimanufactured product, a high-energy beam irradiating part, and a sulfide collecting part for separating and collecting sulfide of the metal produced by the high-energy beam irradiation, is provided.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: November 30, 2004
    Assignee: Rigaku Industrial Corporation
    Inventors: Yasuhiro Ayukawa, Megumi Ono
  • Patent number: 6735276
    Abstract: A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus 60 after having confirmed that the pressure difference between inside and outside of the apparatus 10 (20, 30) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters 21a, 27 and 31a to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.
    Type: Grant
    Filed: September 17, 2002
    Date of Patent: May 11, 2004
    Assignee: Rigaku Industrial Corporation
    Inventors: Akihiro Ikeshita, Motoyuki Yamagami
  • Patent number: 6708121
    Abstract: An analyzing apparatus 1, such as a fluorescence X-ray analyzer, being able to analyze samples automatically, by transferring the samples into an analysis chamber, sequentially, comprising: an interruption recover device 11 for automatically turning on an electric power supply for the analyzing apparatus, when electricity is re-established after interruption thereof; and a data processing computer 2, being connected through the uninterruptible power source 3 to an electric power source, wherein, the data processing computer 2 includes function for temporality memorizing analysis information of the automatic analyzing apparatus when the interruption of electricity occurs, and function for supplying electricity to the analyzing apparatus 1 through the interruption recover device 11 and also for re-starting the analysis of the samples upon the basis of the memorized analysis information at the time when the interruption occurs, when the electricity is recovered, thereby being suitable for unmanned operation ther
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: March 16, 2004
    Assignee: Rigaku Industrial Corporation
    Inventors: Akira Arake, Hiroaki Kita, Yoshihisa Yamamoto
  • Patent number: 6700951
    Abstract: To provide an X-ray fluorescence spectrometer of a simplified structure of a type in which a sample can be transported to an irradiating position where the sample is irradiated with primary X-rays and analysis can be achieved by positioning a target area to be measured of the sample. When an r drive means 37 drives an r drive shaft 43, a transporting function of transporting the sample 3 and a positioning function of positioning the target area in an r direction are performed. Also, a&thgr; drive shaft 53 of a &thgr; drive means 38 for performing the positioning function for positioning the target area in a &thgr; direction and the r drive shaft 43 of the r drive means 37 form a dual coaxial shaft assembly.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: March 2, 2004
    Assignee: Rigaku Industrial Corporation
    Inventor: Koushi Sumii
  • Patent number: 6668038
    Abstract: Where an object to be analyzed in an X-ray fluorescence analysis is a thin film sample, the X-ray fluorescence spectrometer facilitates selection of proper secondary X-ray lines to be measured to thereby facilitate an accurate analysis. The spectrometer includes a measuring line evaluating means 23 operable to calculate for each specified secondary X-ray line to be measured, a first theoretical intensity at a specified thickness and a composition of each of layers in the thin film and a second theoretical intensity at the thickness and the composition thereof when the thickness or a concentration has been changed by a predetermined quantity, to calculate a precision of a thickness or a precision of the concentration based on the first and second theoretical intensities, and to determine applicability or inapplicability of an analysis using the specified secondary X-ray line to be measured.
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: December 23, 2003
    Assignee: Rigaku Industrial Corporation
    Inventors: Yoshiyuki Kataoka, Yasujiro Yamada
  • Patent number: 6647090
    Abstract: To provide an X-ray fluorescence spectrometer capable of providing a stable fluorescent X-ray intensity regardless of the presence of irregularities or the like on a surface of a sample to be analyzed, the X-ray fluorescence spectrometer includes an X-ray source 1 including a primary X-ray limiting diaphragm 3. An aperture 3a of the primary X-ray limiting diaphragm 3 is of a shape effective to allow change in intensity of fluorescent X-rays 7 measured by a detector 8 to be not higher than 1% in the event that a height of the sample surface 5a relative to the X-ray source 1 and the detector 8 changes 1 mm at maximum.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: November 11, 2003
    Assignee: Rigaku Industrial Corporation
    Inventors: Naoki Kawahara, Kouichi Aoyagi, Yasujiro Yamada
  • Patent number: 6611577
    Abstract: In order to render the value of the fluorescent X-ray strength Ia2 of a standard sample 2 multiplied by the ratio PF1/PF2 between respective grading coefficients of standard samples 1 and 2 to approach the value of the fluorescent X-ray strength Ia1 of the standard sample 1, specific glancing angles øa* and øb* are determined. The abundance of a substance of interest is determined from fluorescent X-ray strengths Ia3 and Ib3 of a sample to be measured that is irradiated at the determined specific glancing angles øa* and øb*, to thereby provide an accurate determination of the abundance of the substance of interest.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: August 26, 2003
    Assignee: Rigaku Industrial Corporation
    Inventor: Motoyuki Yamagami
  • Publication number: 20030118148
    Abstract: Where an object to be analyzed in an X-ray fluorescence analysis is a thin film sample, the X-ray fluorescence spectrometer facilitates selection of proper secondary X-ray lines to be measured to thereby facilitate an accurate analysis. The spectrometer includes a measuring line evaluating means 23 operable to calculate for each specified secondary X-ray line to be measured, a first theoretical intensity at a specified thickness and a composition of each of layers in the thin film and a second theoretical intensity at the thickness and the composition thereof when the thickness or a concentration has been changed by a predetermined quantity, to calculate a precision of a thickness or a precision of the concentration based on the first and second theoretical intensities, and to determine applicability or inapplicability of an analysis using the specified secondary X-ray line to be measured.
    Type: Application
    Filed: December 10, 2001
    Publication date: June 26, 2003
    Applicant: RIGAKU INDUSTRIAL CORPORATION
    Inventors: Yoshiyuki Kataoka, Yasujiro Yamada
  • Patent number: 6457862
    Abstract: An analyzer system to ease sample handling having a sample exchanger with an analyzer apparatus, a sample table, and a transfer unit for taking the sample from the table into the analyzer apparatus. The sample table includes a base and a tray for holding the samples supported so they tray can be pulled out in front of the base. With this, it is possible for an operator to handle the samples easily, in particular samples located deep on the table usually difficult to handle. The operator may pull out the tray in the front direction from the base, without having to stand. The tray may be separately carried to a computer controller of the analyzer apparatus, thereby enabling input of sample data while mounting or installing the samples onto the tray to prevent erroneous inputting.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: October 1, 2002
    Assignee: Rigaku Industrial Corporation
    Inventors: Koushi Sumii, Kiyotaka Kasai
  • Patent number: 6438200
    Abstract: An analyzing apparatus,comprising: a single main body (1); a single main computer (2), being connected to the main body directly, and enabling analysis operations by the main body; and sub-computers (4, 5) being connected to the main computer (2) through a network (3), wherein real-time display about progress of analysis and/or reference to results of analysis are available, as well as off-line operation thereof, on either one of the sub-computers (4, 5) through which the operation is not made for the analysis.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: August 20, 2002
    Assignee: Rigaku Industrial Corporation
    Inventor: Hiroaki Kita