Abstract: A memory system programs memory cells connected to a selected word line by applying doses of programming and performing program-verify between doses. An efficient and low current program-verify operation includes: while scanning the results of a previous program-verify operation, ramp up voltages on the select lines for the next program-verify operation without waiting for the scan to complete and ramp up voltages on unselected word lines for the next program-verify operation following a step signal (so that voltage applied to the unselected word lines rise in steps) without waiting for the scan to complete.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, memory openings vertically extending through the alternating stack and having lateral protrusions at levels of the electrically conductive layers, and memory opening fill structures located in the memory openings. Each of the memory opening fill structures includes a vertical semiconductor channel, a dielectric material liner laterally surrounding the vertical semiconductor channel, and a vertical stack of discrete memory elements laterally surrounding the dielectric material liner and located within volumes of the lateral protrusions. Each discrete memory element includes a vertical inner sidewall and a convex or stepped outer sidewall.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, memory openings extending through the alternating stack, and memory opening fill structures located in the memory openings and containing a respective vertical semiconductor channel and a respective memory film. Each of the electrically conductive layers includes a tubular metallic liner in contact with a respective outer sidewall segment of a respective one of the memory opening fill structures, an electrically conductive barrier layer contacting the respective tubular metallic liner and two of the insulating layers, and a metallic fill material layer contacting the electrically conductive barrier layer, and not contacting the tubular metallic liner or any of the insulating layers. The memory opening fill structures are formed after performing a halogen outgassing anneal through the memory openings to reduce or eliminate the halogen outgassing damage in the layers of the memory film.

Abstract: The memory device includes a plurality of dies, and each die includes a plurality of blocks with a plurality of word lines. Some of the word lines are arranged in a plurality of exclusive OR (XOR) sets with each XOR set containing word lines in the same positions across the plurality of dies. The memory device further includes a controller that is configured to program the word lines of the blocks of at least one of the dies in a first programming direction. The controller is further configured to program the word lines of the blocks of at least one other die in a second programming direction that is opposite of the first programming direction.

Abstract: An alternating stack of insulating layers and sacrificial material layers is formed over a substrate. The sacrificial material layers include a stack of word-line-level sacrificial material layers and at least one drain-select-level sacrificial material layer. Drain-select-level openings are formed through the at least one drain-select-level sacrificial material layer, which is replaced with at least one drain-select-level electrically conductive layer. Memory openings are formed by vertically extending the drain-select-level openings through the word-line-level sacrificial material layers. Memory opening fill structures are formed within the memory openings. The word-line-level sacrificial material layers are replaced with word-line-level electrically conductive layers.

Abstract: A memory device includes a semiconductor channel, a gate electrode, and a stack located between the semiconductor channel and the gate electrode. The stack includes, from one side to another, a first ferroelectric material portion, a second ferroelectric material portion, and a gate dielectric portion that contacts the semiconductor channel.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and word-line-level electrically conductive layers located over a substrate, and a vertical layer stack located over the alternating stack, the vertical layer stack including an insulating cap layer, drain select electrodes, and a drain-select-level insulating layer. The drain select electrodes are laterally spaced apart from each other by drain-select-level isolation structures. Memory stack structures including a respective vertical semiconductor channel and a respective memory film vertically extend through the alternating stack and the vertical layer stack. Each of the vertical semiconductor channels includes a word-line-level semiconductor channel portion extending through the alternating stack, a connection channel portion contacting a top end of the word-line-level semiconductor channel, and a drain-select-level semiconductor channel portion vertically extending through the vertical layer stack.

Abstract: A field effect transistor includes at least one line trench extending downward from a top surface of a channel region which laterally surrounds or underlies the at least one line trench, a gate dielectric contacting all surfaces of the at least one line trench and including a planar gate dielectric portion that extends over an entirety of a top surface of the channel region, a gate electrode, a source region, and a drain region.

Abstract: Technology is disclosed for a non-volatile memory system that decouples dataload from program execution. A memory controller transfers data for a program operation and issues a first type of program execution command. When in a coupled mode, the die programs the data in response to the first type of program execution command. When in a decoupled mode, rather than program the data into non-volatile memory cells the die enters a wait state. Optionally, the memory controller can instruct another die to execute a memory operation while the first die is in the wait state. In response to receiving a second type of program execution command from the memory controller when in the wait state, the first die will program the data into non-volatile memory cells. The memory controller may issue the second type of program execution command in response to determining that sufficient power resources (or thermal budget) exist.

Abstract: Technology is disclosed herein in which a duration of a program pulse used to program non-volatile memory cells such as NAND may be increased responsive to a programming failure using a shorter duration program pulse. The duration of at least one program pulse may be increased for at least one group of memory cells in response to a failure to program a group using a default program pulse duration. The group that experiences the increased duration program pulse may be the same group for which the program operation failed using the shorter program pulse or may be a different group than the group for which the program operation failed using the shorter program pulse.

Abstract: A semiconductor wafer includes pairs of semiconductor dies having test pads which are electrically coupled to each other to enable testing of pairs of semiconductor dies together at the same time. In this way, even wafers having large numbers of semiconductor dies can be tested with a semiconductor test assembly in a single touch-down test process.

Abstract: A rotatable transmission electron microscope (TEM) grid holder includes first and second legs orthogonally positioned with respect to each other. Each clamp holder leg is configured to be received within a hole in a main stage supporting the rotatable TEM grid holder. When the first leg of the clamp holder is affixed within the main stage, the sample has a first orientation with respect to the FIB, and when second leg of the clamp holder is affixed within the main stage, the sample has a second orientation with respect to the FIB, rotated 90° relative to the first orientation. The sample may be rotated back and forth between the first and second orientations multiple times as needed to produce a sample which may be clearly imaged by the TEM system, substantially free of curtaining effects.

Abstract: During a read operation for memory cells connected a selected word line, a memory system adjusts the overdrive voltage applied to word lines adjacent the selected word line in order to compensate for margin degradation between the erased data state and the lowest programmed data state.

Abstract: A semiconductor wafer includes pairs of semiconductor dies having test pads which are electrically coupled to each other to enable testing of pairs of semiconductor dies together at the same time. In this way, even wafers having large numbers of semiconductor dies can be tested with a semiconductor test assembly in a single touch-down test process.

Abstract: Technology is disclosed herein for a memory system that balances peak Icc with programming speed. A memory system applies voltages to respective word lines during a verify operation that balances peak Icc with programming speed. The voltages for which the ramp rate is controlled include a read pass voltage applied to unselected word lines and a spike voltage applied to the selected word line at the beginning of the verify. The ramp rate of the voltages is slow enough to keep the peak Icc during verify to a target peak Icc regardless of which word line is selected for verify. However, the ramp rate of the voltages to the word lines during verify is fast enough to make use of the target peak Icc in order achieve faster programming. Therefore, the impact on programming time is minimized while staying within the allowed peak Icc.

Abstract: A plurality of memory programming the memory cells to at least one programmed data state in a plurality of program-verify iterations. In each iteration, after a programming pulse, a sensing operation is conducted to compare the threshold voltages of the memory cells to a low verify voltage associated with a first programmed data state and to a high very voltage associated with the first programmed data state. The sensing operation includes discharging a sense node through a bit line coupled to one of the memory cells and monitoring a discharge time of the sense node. At least one aspect of the sensing operation is temperature dependent so that a voltage gap between the high and low verify voltages is generally constant across a range of temperatures.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, memory openings vertically extending through each layer of the alternating stack; memory opening fill structures located in the memory openings, and a perforated wall structure including lateral openings at levels of the insulating layers.

Abstract: A semiconductor structure includes at least one set of vertical field effect transistors embedded within dielectric material layers overlying a substrate. Each vertical field effect transistor includes a bottom electrode, a metal oxide semiconductor vertical transistor channel, a cylindrical gate dielectric, and a top electrode. A three-dimensional NAND memory array can be provided over the first field effect transistors, and can be electrically connected to the vertical field effect transistors via metal interconnect structures. Alternatively, a three-dimensional NAND memory array can be formed on another substrate, which can be bonded to the substrate via metal-to-metal bonding. The vertical field effect transistors can be employed as switches for bit lines, word lines, or other components of the three-dimensional NAND memory array.

Abstract: A memory apparatus and method of operation are provided. The apparatus includes memory cells connected to word lines including at least one edge word line and other data word lines. The memory cells are arranged in strings and are configured to retain a threshold voltage corresponding to data states. The strings are organized in rows and a control means is coupled to the word lines and the strings and identifies the at least one edge word line. The control means programs the memory cells of the strings in particular ones of the rows and associated with the at least one edge word line to have an altered distribution of the threshold voltage for one or more of the data states compared to the memory cells of the strings not in particular ones of the rows and not associated with the at least one edge word line during a program operation.

Abstract: Adaptive and dynamic control of the duration of a pre-program pulse based on a number of planes selected for the pre-program operation is disclosed. A value for a pre-program time increment parameter may be selected based on the number of planes for which the pre-program operation will be performed or determined based on a predefined association with the number of planes. A pre-program voltage pulse may then be applied for a duration that is equal to a default duration for a single-plane pre-program operation incremented by the time increment parameter value. This approach solves the technical problem of Vt downshift for multi-plane pre-program operations, and thus, ensures that the success rate of secure erase operations does not diminish as the number of planes increases. This, in turn, allows for pre-program operations to be consistently performed on a multi-plane basis, which produces the technical effect of improved system performance.