Patents Assigned to Santoku Chemical Industries Co., Ltd.
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Patent number: 7368088Abstract: An apparatus for producing a purified aqueous hydrogen peroxide solution. The apparatus includes at least one purifier tower packed with an ion exchange resin, a chelate resin or an adsorption resin for receiving a charged aqueous hydrogen peroxide solution containing impurities so as to effect contact thereof with the ion exchange resin, chelate resin or adsorption resin, thereby purifying the charged aqueous hydrogen peroxide solution, which apparatus further comprises a feed pump of given output capable of causing the charged aqueous hydrogen peroxide solution to flow to the purifier tower, a flow sensor capable of sensing a flow rate of charged aqueous hydrogen peroxide solution being fed to the purifier tower by means of the feed pump, and a flow control unit capable of controlling the output of the feed pump on the basis of a detection result of the flow sensor so as to maintain the flow of charged aqueous hydrogen peroxide solution being fed to the purifier tower at a constant rate.Type: GrantFiled: April 29, 2004Date of Patent: May 6, 2008Assignee: Santoku Chemical Industries Co., Ltd.Inventors: Fujio Tanaka, Takashi Adachi, Toshimi Suzuki, Mutsuro Noguchi, Tomoaki Kobayashi
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Patent number: 6911481Abstract: A method of regenerating an ion exchange resin, comprising the steps of packing a used ion exchange resin in a regeneration tower; and repeating at least twice a step comprising passing an aqueous solution of regenerant through the regeneration tower downward from a top part of the regeneration tower and thereafter passing ultra-pure water through the regeneration tower upward from a bottom of the regeneration tower. This method enables regenerating an ion exchange resin efficiently and homogeneously without mixing of the regenerant into ion exchange resin towers for purification.Type: GrantFiled: May 14, 2001Date of Patent: June 28, 2005Assignee: Santoku Chemical Industries Co., Ltd.Inventors: Fujio Tanaka, Takashi Adachi, Toshimi Suzuki, Mutsuro Noguchi, Tomoaki Kobayashi
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Patent number: 6896867Abstract: A process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a carbonate iron (CO32?) type or bicarbonate ion (HCO3?) type anion exchange resin, and thirdly with a H+ type cation exchange resin. Further, a process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a fluoride ion (F?) type anion exchange resin, thirdly with a carbonate ion (CO32?) type or bicarbonate ion (HCO3?) type anion exchange resin, and fourthly with a H+ type cation exchange resin.Type: GrantFiled: May 14, 2001Date of Patent: May 24, 2005Assignee: Santoku Chemical Industries Co., Ltd.Inventors: Fujio Tanaka, Ichiro Sugawara, Takashi Adachi, Kazuhisa Mine
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Patent number: 6783748Abstract: A process for producing a purified aqueous hydrogen peroxide solution, comprising passing a charged aqueous hydrogen peroxide solution containing impurities through a purifier tower packed with an ion exchange resin, a chelate resin or an adsorption resin to thereby purify the charged aqueous hydrogen peroxide solution, wherein there are provided a feed pump of given output capable of causing the charged aqueous hydrogen peroxide solution to flow to the purifier tower and further a flow sensor capable of sensing a flow rate of charged aqueous hydrogen peroxide solution being fed to the purifier tower and wherein the output of the feed pump is controlled in cooperation with the flow sensor so as to bring the charged aqueous hydrogen peroxide solution into contact with the ion exchange resin, chelate resin or adsorption resin while maintaining the flow of charged aqueous hydrogen peroxide solution at a constant rate.Type: GrantFiled: May 14, 2001Date of Patent: August 31, 2004Assignee: Santoku Chemical Industries Co., Ltd.Inventors: Fujio Tanaka, Takashi Adachi, Toshimi Suzuki, Mutsuro Noguchi, Tomoaki Kobayashi
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Patent number: 6649139Abstract: A process for producing a highly purified aqueous hydrogen peroxide solution by removing silicon oxide impurities from an aqueous hydrogen peroxide solution containing silicon oxide impurities by adding a flocculating agent and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the aqueous hydrogen peroxide solution into contact with an anion exchange resin in a fluoride ion form by at least one fluoride compound which contains 0.05% by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride.Type: GrantFiled: May 14, 2001Date of Patent: November 18, 2003Assignee: Santoku Chemical Industries Co., Ltd.Inventors: Fujio Tanaka, Takashi Adachi, Kazuhisa Mine, Kazuya Kimura
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Publication number: 20020020671Abstract: A process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a carbonate iron (CO32−) type or bicarbonate ion (HCO3−) type anion exchange resin, and thirdly with a H+ type cation exchange resin. Further, a process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a fluoride ion (F−) type anion exchange resin, thirdly with a carbonate ion (CO32−) type or bicarbonate ion (HCO3−) type anion exchange resin, and fourthly with a H+ type cation exchange resin.Type: ApplicationFiled: May 14, 2001Publication date: February 21, 2002Applicant: SANTOKU CHEMICAL INDUSTRIES CO., LTD.Inventors: Fujio Tanaka, Ichiro Sugawara, Takashi Adachi, Kazuhisa Mine
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Publication number: 20020014459Abstract: A method of regenerating an ion exchange resin, comprising the steps of packing a used ion exchange resin in a regeneration tower; and repeating at least twice a step comprising passing an aqueous solution of regenerant through the regeneration tower downward from a top part of the regeneration tower and thereafter passing ultra-pure water through the regeneration tower upward from a bottom of the regeneration tower. This method enables regenerating an ion exchange resin efficiently and homogeneously without mixing of the regenerant into ion exchange resin towers for purification.Type: ApplicationFiled: May 14, 2001Publication date: February 7, 2002Applicant: SANTOKU CHEMICAL INDUSTRIES CO., LTDInventors: Fujio Tanaka, Takashi Adachi, Toshimi Suzuki, Mutsuro Noguchi, Tomoaki Kobayashi
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Publication number: 20020015676Abstract: A process for producing a purified aqueous hydrogen peroxide solution, comprising passing a charged aqueous hydrogen peroxide solution containing impurities through a purifier tower packed with an ion exchange resin, a chelate resin or an adsorption resin to thereby purify the charged aqueous hydrogen peroxide solution, wherein there are provided a feed pump of given output capable of causing the charged aqueous hydrogen peroxide solution to flow to the purifier tower and further a flow sensor capable of sensing a flow rate of charged aqueous hydrogen peroxide solution being fed to the purifier tower and wherein the output of the feed pump is controlled in cooperation with the flow sensor so as to bring the charged aqueous hydrogen peroxide solution into contact with the ion exchange resin, chelate resin or adsorption resin while maintaining the flow of charged aqueous hydrogen peroxide solution at a constant rate.Type: ApplicationFiled: May 14, 2001Publication date: February 7, 2002Applicant: SANTOKU CHEMICAL INDUSTRIES CO., LTDInventors: Fujio Tanaka, Takashi Adachi, Toshimi Suzuki, Mutsuro Noguchi, Tomoaki Kobayashi
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Publication number: 20020012626Abstract: The present invention provides a process for producing a highly purified aqueous hydrogen peroxide solution from which silicon oxide impurities are removed to a minimum by purifying an aqueous hydrogen peroxide solution containing silicon oxide impurities.Type: ApplicationFiled: May 14, 2001Publication date: January 31, 2002Applicant: SANTOKU CHEMICAL INDUSTRIES CO., LTD.Inventors: Fujio Tanaka, Takashi Adachi, Kazuhisa Mine, Kazuya Kimura