Abstract: The film-forming apparatus includes a gas introduction tube for introducing an inert gas into a vacuum chamber, a vapor source and a target, and forms thin film by depositing sputtered particles and evaporated particles on the surface of a substrate, the sputtered particles being liberated by sputtering the target using ion energy of plasma generated around the target while the evaporated particles being obtained by evaporating a vapor source by heating and ionizing evaporated components using the plasma.

Abstract: The dry etching device according to the present invention comprises a vacuum chamber connected to a vacuum source, a gas supply unit including a gas supply source and a number of gas supply pipes for leading a gas from the gas supply source to an inside of the vacuum chamber, and a number of electrical discharge electrodes, respectively arranged inside the vacuum chamber, for changing the gas led to the inside of the vacuum chamber into a plasma, active ions or both of the plasma and the active ions, wherein the electrical discharge electrode has a number of circular or polygonal ring shaped permanent magnets detachably interfitted into a shaft at regular intervals via each insulator in a magnetizing direction of the each permanent magnet, and aligned so that each magnet pole of the permanent magnets adjacent to each other may be equal to that of the adjacent permanent magnet.

Abstract: An electrode substrate for liquid crystal display devices is constructed with a resin substrate 4, a cured coating 3, a cured coating 2 and an ITO film 6 laminated in that order. The resin substrate 4 comprises a transparent resin which is a copolymer containing not less than 20% by weight of maleimide type monomer units, having a crosslinked structure and having a glass transition temperature of not lower than 160.degree. C. and not higher than 200.degree. C., and has a thickness of 0.1 to 0.8 mm. The cured coating 3 is a cured coating comprising a polyvinyl alcohol crosslinked with an epoxysilane represented by the formula R.sup.1 SiX.sub.3 wherein R.sup.1 is an organic group of 1 to 10 carbon atoms having a glycidyl group and X is a hydrolyzable group. The cured coating 2 is a siloxane type cured coating containing fine silica particles. The ITO film 6 is an ITO film having a grainy surface with grains of a diameter of not larger than 500 nm, formed at a substrate temperature of not higher than 100.degree.

Abstract: A color filter is formed on one surface of one of a pair of light-transmitting substrates and an organic overcoat film for smoothing is formed on the color filter. In addition, a metallic or silicon nitride film such as SiNx and a metallic or silicon oxide film such as SiOx are formed thereon in this order before forming the ITC film. The formation of the metallic or silicon nitride film and the metallic or silicon oxide film enhances the adhesion of the ITC film.