Abstract: A method and apparatus for producing an optically effective system of layers on a substrate, such as a lens for use in an optical device. A plasma supported sputter deposition process is employed which, for the purpose of reducing damage to the rear side (1b) first applies a protective layer (2) to the rear side and then applies a system of layers (3) on the front side (1a) of the substrate (1). The apparatus includes an evacuable sputter chamber and a substrate holder (5) with receiving elements (6) for the substrates, and the receiving elements are mounted to permit rotation about two mutually perpendicular axes.

Abstract: A method and apparatus for producing an optically effective system of layers on a substrate, such as a lens for use in an optical device. A plasma supported sputter deposition process is employed which, for the purpose of reducing damage to the rear side (1b) first applies a protective layer (2) to the rear side and then applies a system of layers (3) on the front side (1a) of the substrate (1). The apparatus includes an evacuable sputter chamber and a substrate holder (5) with receiving elements (6) for the substrates, and the receiving elements are mounted to permit rotation about two mutually perpendicular axes.

Abstract: A plasma source comprises a thermionic emitter (2) heated by an induction coil (7), which also provides radiofrequency energy within an electrically insulated cylindrical former (1). A cylindrical anode (10) is concentric with emitter (2) and axially displaced therefrom, generating a potential difference between anode (10) and emitter (2). The potential difference between anode (2) and ground and axial magnetic fields causes the plasma to be extracted from the source. Emitter (2) is held at negative potential via a conductive support (5). Process gas is introduced near emitter (2) and a secondary gas injected in the anode space. Radiofrequency excitation of emitter (2) generates electrons via thermionic and field effects, resulting in efficient plasma generation. Both electron generation effects contribute to a broad energy spectrum of electrons, providing effective neutralization of the plasma.

Abstract: The cathode electrode for plasma sources of a vacuum coating device, preferably for the application of coating layers on optical substrates, consists at least partially of a material with preferably as wide a band gap as possible of at least 3 eV between its energy bands. In this case, the wide band gap material of the cathode electrode doped for an optimal primary and secondary electron emission and can consist of diamond doped with nitrogen (N) or sulfur (S) or diamond with a codoping of boron (B) and nitrogen (N) or N-doped crystalline 6H—SiC and 4H—SiC (silicon carbide), or GaN, AIN and AIGaInN alloys doped with Zn, Si or Zn+Si, as well as BN, CN, BCN and other n-doped nitrides, borides and oxides. As the band gap between two allowed bands increases, the emission of primary and secondary electrons rises significantly given a suitable energy supply.

Abstract: A system for treating goods, in particular for coating optical substrates, under a vacuum, within a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, includes a device for calibrating the gas pressure in the receiver for a respective operating cycle. The calibrating device has a calibration pressure vessel (2) having a volume (v) lower than the volume (V) of the receiver (1) and is connected in terms of flow with an inert gas source and the receiver (1) via actuatable valve fittings (3, 4), wherein the receiver (1) and calibration pressure vessel (2) are each linked via a pressure gage (5 or 6) with a computer (7), which controls the valve fittings (3, 4) for introducing the gas into the calibration pressure vessel (2) or receiver (1) by way of a downstream controller (8).

Abstract: An assembly for a vaporizer for a vacuum coating system includes a crucible having a cavity; a liner accommodated in the cavity for receiving a material to be vaporized; and a spacer arrangement disposed between the inner wall of the crucible and the outer wall of the liner. The spacer arrangement which is disposed about the outer wall of the liner, centers the liner at a set distance from the inner crucible wall.

Abstract: The cathode electrode for plasma sources of a vacuum coating device, preferably for the application of coating layers on optical substrates, consists at least partially of a material with preferably as wide a band gap as possible of at least 3 eV between its energy bands. In this case, the wide band gap material of the cathode electrode doped for an optimal primary and secondary electron emission and can consist of diamond doped with nitrogen (N) or sulfur (S) or diamond with a codoping of boron (B) and nitrogen (N) or N-doped crystalline 6H—SiC and 4H—SiC (silicon carbide), or GaN, AlN and AlGaInN alloys doped with Zn, Si or Zn+Si, as well as BN, CN, BCN and other n-doped nitrides, borides and oxides.

Abstract: A vacuum coating apparatus includes a carrier accommodating substrates to be coated; and an evaporation source vertically spaced from the carrier and emitting a vapor stream onto the substrates mounted on the carrier. The carrier includes at least two radially adjoining segments each accommodating at least one substrate to be coated and a hinge interconnecting adjoining segments for allowing a tilting motion of the segments to either side relative to one another up to a predetermined angle.