Patents Assigned to Scientific Systems Research Ltd.
  • Endpoint detection in the etching of dielectric layers
    Patent number: 6677246
    Abstract: In a method of manufacturing a miniature multilayer device 10 a low open area dielectric layer 18 is selectively etched through to an underlying conductive region 16 using an electrically conducting medium such as a plasma 24. The endpoint of the etch process is determined by detecting the abrupt change in capacitance across the device 10 just as the final portion of the dielectric layer is removed.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: January 13, 2004
    Assignee: Scientific Systems Research Ltd.
    Inventors: John Scanlan, Michael B. Hopkins