Patents Assigned to Screen Semiconductor Solutions Co., Ltd.
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Patent number: 9152054Abstract: In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.Type: GrantFiled: March 18, 2013Date of Patent: October 6, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Kazuhiro Nishimura, Akihiko Morita, Yukihiko Inagaki
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Patent number: 9064914Abstract: A substrate subjected to a pattern exposure process is transported to a flash bake unit. The flash bake unit performs a post-exposure bake process in which flashes of light are directed from flash lamps onto a surface of the substrate held on an upper surface of a cooling plate to momentarily heat the surface of the substrate, thereby causing crosslinking, deprotection or decomposition and the like of resist resin to proceed by using active species produced in a resist film by a photochemical reaction during the pattern exposure process as an acid catalyst, so that the solubility of only the exposed portion of the resist film in a developing solution is locally changed. The flash heating treatment performed by the irradiation with flashes of light requires extremely short treatment time of not greater than one second. This reduces the diffusion length of acid during the post-exposure bake process.Type: GrantFiled: September 22, 2011Date of Patent: June 23, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventor: Koji Kaneyama
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Patent number: 9063429Abstract: After a developing step, a substrate is spun at high speeds without supplying a cleaning liquid to a surface of the substrate. This causes a large centrifugal force to act on a developer on a resist film. Consequently, the developer can be removed rapidly from the surface of the substrate. As a result, development can be stopped at an expected timing. Moreover, a circuit pattern having an expected dimension can be obtained. At this time, a dissolved product is also removable with the developer from the substrate. This can avoid failure in development caused by the dissolved product. Consequently, suitably maintained quality of negative development can be achieved with a reduced usage amount of the cleaning liquid.Type: GrantFiled: December 27, 2013Date of Patent: June 23, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Tadashi Miyagi, Tsuyoshi Mitsuhashi, Takehiro Wajiki
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Patent number: 9032977Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.Type: GrantFiled: December 13, 2013Date of Patent: May 19, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Tetsuya Hamada, Takashi Taguchi
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Patent number: 9028621Abstract: A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate.Type: GrantFiled: May 26, 2011Date of Patent: May 12, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Tadashi Miyagi, Masahiko Harumoto, Sadayasu Suyama
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Patent number: 8985937Abstract: A stocker apparatus and method have openers for receiving FOUPs acting as containers each for storing a plurality of substrates, to feed and collect the substrates to/from a substrate treating apparatus main body, a transport mechanism for holding and transporting the FOUPs, and racks arranged above the openers for receiving the FOUPs. The racks include an incoming rack for receiving the FOUPs from an external transport device, an outgoing rack for delivering the FOUPs to the external transport device, and a mid-treatment storage rack for keeping an empty FOUP after the substrates are fed therefrom. The openers include a feed-only opener for feeding the substrates, and a collect-only opener for collecting the substrates.Type: GrantFiled: October 11, 2011Date of Patent: March 24, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Yoshiteru Fukutomi, Hideyuki Iwata
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Patent number: 8956695Abstract: A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.Type: GrantFiled: January 26, 2012Date of Patent: February 17, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Masahiko Harumoto, Akira Yamaguchi, Akihiro Hisai, Minoru Sugiyama, Takuya Kuroda
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Patent number: 8941809Abstract: A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes first and second inspection units. The first inspection unit inspects the state of the substrate before exposure processing, and the second inspection unit inspects the state of the substrate after exposure processing.Type: GrantFiled: December 22, 2009Date of Patent: January 27, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventor: Masashi Kanaoka
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Patent number: 8932672Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.Type: GrantFiled: November 30, 2009Date of Patent: January 13, 2015Assignee: SCREEN Semiconductor Solutions Co., Ltd.Inventors: Koji Kaneyama, Masashi Kanaoka, Tadashi Miyagi, Kazuhito Shigemori, Shuichi Yasuda, Tetsuya Hamada
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Patent number: 8894775Abstract: After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point.Type: GrantFiled: September 11, 2008Date of Patent: November 25, 2014Assignee: Screen Semiconductor Solutions Co., Ltd.Inventors: Tadashi Miyagi, Masashi Kanaoka, Kazuhito Shigemori, Shuichi Yasuda, Masakazu Sanada