Abstract: Disclosed is a multiple longitudinal flow cell channel electromagnetic radiation absorption or fluorescence monitoring system wherein a source of electromagnetic radiation is positioned to input electromagnetic radiation to each of the longitudinal flow cell channels, and wherein a single low cost, low drift, preferably linear and sensitized to UV, array detector system is positioned to directly simultaneously monitor electromagnetic radiation from at least two of the longitudinal flow cell channels, at different locations thereupon.
Abstract: Disclosed is a spectrometer system with unique wavelength resolution improving relative positioning of diffraction grating and detector. Also disclosed is a modified evolving windowed factor analysis based method of detecting semiconductor etch end points which is particularly well suited for use in real time monitoring and process control. Use of wavelength group selecting mask filters is also disclosed.
Type:
Grant
Filed:
May 25, 1999
Date of Patent:
April 30, 2002
Assignee:
SD Acquisition Inc.
Inventors:
Wayne A. Branagh, Robert C. Fry, Juan C. Ivaldi, Jason A. Rivers, Michael R. Dyas, Robert M. Brown, Jr.