Patents Assigned to Sen Corporation
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Publication number: 20120015507Abstract: A plasma doping apparatus for adding an impurity to a semiconductor substrate includes a chamber, a gas supply unit configured for supplying gas to the chamber, and a plasma source by which to cause the chamber to generate plasma of the supplied gas. The mixed gas containing material gas containing an impurity element to be added to the semiconductor substrate, hydrogen gas, and diluent gas for diluting the material gas is supplied to the chamber.Type: ApplicationFiled: July 15, 2011Publication date: January 19, 2012Applicants: SEN CORPORATION, SUMITOMO HEAVY INDUSTRIES, LTD.Inventors: Masaru Tanaka, Masashi Kuriyama, Hiroki Murooka
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Patent number: 8096744Abstract: Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process chamber and the vacuum intermediate chamber. Two wafer retaining arms are installed between a platen device in the vacuum process chamber and the vacuum intermediate chamber. The two wafer retaining arms are reciprocatingly movable between the corresponding load lock pedestals and the platen device while passing through the passage opening and crossing with an overpass each other at different levels. By retaining an unprocessed wafer by one of the wafer retaining arms and retaining a processed wafer by the other wafer retaining arm, transfer of the unprocessed wafer from one of the load lock pedestals to the platen device and transfer of the processed wafer from the platen device to the other load lock pedestal are performed simultaneously.Type: GrantFiled: October 21, 2005Date of Patent: January 17, 2012Assignee: Sen Corporation, An Shi and Axcelis CompanyInventors: Keiji Okada, Fumiaki Sato, Hiroaki Nakaoka
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Publication number: 20110297842Abstract: An ion beam irradiation method comprises calculating a scan voltage correction function with the maximum beam scan width depending on the measurement result of a beam current measurement device, calculating each of more than one scan voltage correction functions corresponding to each of scheduled beam scan widths depending on the calculated scan voltage correction functions while satisfying dose uniformity in the horizontal direction, measuring a mechanical Y-scan position during the ion implantation, changing the scan voltage correction function as a function of the measured mechanical Y-scan position so that the beam scan area becomes a D-shaped multistage beam scan area corresponding to an outer periphery of a half of the wafer to thereby reduce the beam scan width, and changing a mechanical Y-scan speed depending on the change of the measurement result of a side cup current measurement device to thereby keep the dose uniformity in the vertical direction.Type: ApplicationFiled: June 7, 2011Publication date: December 8, 2011Applicant: SEN CorporationInventors: Shiro NINOMIYA, Toshio Yumiyama, Yasuhiko Kimura, Tetsuya Kudo, Akihiro Ochi
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Patent number: 7982192Abstract: In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies respectively at vicinities of upstream side and downstream side of the two electrodes type deflection scanning electrode and having openings in a rectangular shape for passing a charged particle beam. Each of the shielding suppression electrode assemblies is an assembly electrode comprising one sheet of a suppression electrode and two sheets of shielding ground electrodes interposing the suppression electrode. A total of front side portions and rear side portions of the two electrodes type deflection scanning electrode is shielded by the two sheets of shielding ground electrodes.Type: GrantFiled: April 21, 2008Date of Patent: July 19, 2011Assignee: SEN CorporationInventors: Mitsukuni Tsukihara, Mitsuaki Kabasawa, Hiroshi Matsushita, Takanori Yagita, Yoshitaka Amano, Yoshito Fujii
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Publication number: 20110136329Abstract: A manufacturing method of a semiconductor device includes preparing a semiconductor substrate which is a base substrate of the semiconductor device and which is formed with a concavity and convexity part on the surface of the semiconductor substrate. The method further comprises depositing on the surface of the semiconductor substrate an impurity thin film including an impurity atom which becomes a donor or an acceptor in the semiconductor substrate and performing an ion implantation from a diagonal upper direction to the impurity thin film deposited on the concavity and convexity part of the semiconductor substrate. The method still further comprises recoiling the impurity atom from the inside of the impurity thin film to the inside of the concavity and convexity part by performing the ion implantation.Type: ApplicationFiled: December 7, 2010Publication date: June 9, 2011Applicant: SEN CorporationInventors: Michiro SUGITANI, Genshu Fuse
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Patent number: 7947129Abstract: An ion source apparatus includes a rare gas supply source supplying rare gas instead of ion source gas to a plasma chamber, means to determine time and timing for cleaning electrodes in consideration of a collecting amount of insulation layers accreting to the electrodes of an extraction electrode system. Based on the above, the ion source apparatus removes the insulation layers by sputtering with ion beam of the rare gas while adjusting extraction or accelerate voltage and supply amount of the rare gas as a setting parameter. Moreover, by adjusting the setting parameter which changes a diameter of ion beam based on the rare gas when the ion beam collides onto each electrode surface of the extraction electrode system, the beam diameter is focused within an effective range in which intension of the sputtering of the insulation layers is maximized thus evenly removing the insulation layers.Type: GrantFiled: June 4, 2004Date of Patent: May 24, 2011Assignee: SEN Corporation, an SHI and Axcelis CompanyInventors: Hirohiko Murata, Masateru Sato
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Patent number: 7851772Abstract: An ion implantation apparatus according to the invention includes a park electrode as a deflecting apparatus arranged at a section of a beam line from an outlet of a mass analysis magnet apparatus to a front side of a mass analysis slit for deflecting an ion beam in a predetermined direction of being deviated from a beam trajectory line by an operation of an electric field. When the ion beam does not satisfy a desired condition, a park voltage is applied to the park electrode, thereby, the ion beam is brought into an evacuated state by being deflected from the beam trajectory line. As a result, the ion beam cannot pass through the mass analysis slit, and therefore, the ion beam which does not arrive at a wafer to prevent the ion beam which does not satisfy the condition from being irradiated to the wafer.Type: GrantFiled: April 10, 2008Date of Patent: December 14, 2010Assignee: Sen Corporation an Shi and Axcelis CompanyInventors: Mitsukuni Tsukihara, Takanori Yagita, Hiroshi Sogabe, Toshio Yumiyama, Mitsuaki Kabasawa
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Patent number: 7791049Abstract: A beam line before incidence on a beam scanner is arranged with an injector flag Faraday cup that detects a beam current by measuring a total beam amount of an ion beam to be able to be brought in and out thereto and therefrom. When the ion beam is shut off by placing the injector flag Faraday cup on a beam trajectory line, the ion beam impinges on graphite provided at the injector flag Faraday cup. At this occasion, even when the graphite is sputtered by the ion beam, since the injector flag Faraday cup is arranged on an upstream side of the beam scanner and the ion beam is shut off by the injector flag Faraday cup, particles of the sputtered graphite do not adhere to a peripheral member of the injector flag Faraday cup.Type: GrantFiled: April 10, 2008Date of Patent: September 7, 2010Assignee: Sen Corporation an SHI and Axcelis CompanyInventors: Mitsukuni Tsukihara, Yoshito Fujii
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Patent number: 7755067Abstract: An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.Type: GrantFiled: April 10, 2008Date of Patent: July 13, 2010Assignee: SEN CorporationInventors: Mitsukuni Tsukihara, Takanori Yagita, Yoshitaka Amano, Mitsuaki Kabasawa
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Patent number: 7718980Abstract: A beam processing system is for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadrupole electromagnet and a second DC quadrupole electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively.Type: GrantFiled: May 30, 2007Date of Patent: May 18, 2010Assignee: SEN CorporationInventors: Mitsukuni Tsukihara, Mitsuaki Kabasawa
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Patent number: 7687782Abstract: A beam deflection scanner performs reciprocating deflection scanning with an ion beam or a charged particle beam to thereby periodically change a beam trajectory and comprises a pair of scanning electrodes installed so as to be opposed to each other with the beam trajectory interposed therebetween and a pair of correction electrodes installed in a direction perpendicular to an opposing direction of the pair of scanning electrodes, with the beam trajectory interposed therebetween, and extending along a beam traveling axis. Positive and negative potentials are alternately applied to the pair of scanning electrodes, while a correction voltage is constantly applied to the pair of correction electrodes. A correction electric field produced by the pair of correction electrodes is exerted on the ion beam or the charged particle beam passing between the pair of scanning electrodes at the time of switching between the positive and negative potentials.Type: GrantFiled: May 30, 2007Date of Patent: March 30, 2010Assignee: SEN Corporation, an SHI and Axcelis CompanyInventors: Mitsukuni Tsukihara, Mitsuaki Kabasawa, Yoshitaka Amano, Hiroshi Matsushita
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Patent number: 7597531Abstract: Embodiments of the invention are directed to a method of controlling a mover device The method includes generating a moving force from a moving force generating unit to move a processing base with respect to a movable base, thereby moving the processing base with respect to a fixed base as a result of the movement of the processing base with respect to the movable base; moving the movable base on the fixed base in the opposite direction to the moving direction of the processing base by virtue of a reaction force caused by the moving force generated from the moving force generating unit to move the processing base, so that the movable base moves in the opposite direction to the moving direction of the processing base on the fixed base. The method further includes controlling the moving velocity of the processing base with respect to the fixed base.Type: GrantFiled: January 28, 2005Date of Patent: October 6, 2009Assignee: SEN Corporation, an SHI and Axcelis CompanyInventors: Keiji Okada, Michiro Sugitani, Yoshitomo Hidaka, Junichi Murakami, Fumiaki Sato, Mitsukuni Tsukihara, Suguru Hirokawa, Masamitsu Shinozuka
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Publication number: 20080258074Abstract: In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies respectively at vicinities of upstream side and downstream side of the two electrodes type deflection scanning electrode and having openings in a rectangular shape for passing a charged particle beam. Each of the shielding suppression electrode assemblies is an assembly electrode comprising one sheet of a suppression electrode and two sheets of shielding ground electrodes interposing the suppression electrode. A total of front side portions and rear side portions of the two electrodes type deflection scanning electrode is shielded by the two sheets of shielding ground electrodes.Type: ApplicationFiled: April 21, 2008Publication date: October 23, 2008Applicant: SEN Corporation, an SHI and Axcelis CompanyInventors: Mitsukuni TSUKIHARA, Mitsuaki Kabasawa, Hiroshi Matsushita, Takanori Yagita, Yoshitaka Amano, Yoshito Fujii
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Publication number: 20080251734Abstract: An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.Type: ApplicationFiled: April 10, 2008Publication date: October 16, 2008Applicant: SEN Corporation, an SHI and Axcelis CompanyInventors: Mitsukuni Tsukihara, Takanori Yagita, Yoshitaka Amano, Mitsuaki Kabasawa
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Publication number: 20080251713Abstract: An ion implantation apparatus according to the invention includes a park electrode as a deflecting apparatus arranged at a section of a beam line from an outlet of a mass analysis magnet apparatus to a front side of a mass analysis slit for deflecting an ion beam in a predetermined direction of being deviated from a beam trajectory line by an operation of an electric field. When the ion beam does not satisfy a desired condition, a park voltage is applied to the park electrode, thereby, the ion beam is brought into an evacuated state by being deflected from the beam trajectory line. As a result, the ion beam cannot pass through the mass analysis slit, and therefore, the ion beam which does not arrive at a wafer to prevent the ion beam which does not satisfy the condition from being irradiated to the wafer.Type: ApplicationFiled: April 10, 2008Publication date: October 16, 2008Applicant: SEN Corporation, an SHI and Axcelis CompanyInventors: Mitsukuni Tsukihara, Takanori Yagita, Hiroshi Sogabe, Toshio Yumiyama, Mitsuaki Kabasawa
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Publication number: 20080251737Abstract: A beam line before incidence on a beam scanner is arranged with an injector flag Faraday cup that detects a beam current by measuring a total beam amount of an ion beam to be able to be brought in and out thereto and therefrom. When the ion beam is shut off by placing the injector flag Faraday cup on a beam trajectory line, the ion beam impinges on graphite provided at the injector flag Faraday cup. At this occasion, even when the graphite is sputtered by the ion beam, since the injector flag Faraday cup is arranged on an upstream side of the beam scanner and the ion beam is shut off by the injector flag Faraday cup, particles of the sputtered graphite do not adhere to a peripheral member of the injector flag Faraday cup.Type: ApplicationFiled: April 10, 2008Publication date: October 16, 2008Applicant: SEN Corporation, An SHI and Axcelis CompanyInventors: Mitsukuni TSUKIHARA, Yoshito Fujii
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Patent number: 7429743Abstract: The present invention is a method to enhance accuracy of irradiation with beam for an irradiation system with a beam. The irradiation system comprises a beam generation source, a mass analysis device, a beam transformer, a scanner which swings the beam reciprocally with high speed, a beam parallelizing device, an acceleration/deceleration device, an energy filtering device, and beam monitors. The beam transformer comprises a vertically focusing synchronized quadrupole electromagnet syQD and a horizontally focusing synchronized quadrupole electromagnet syQF. Consequently, it is possible to correct at least one of a deviation in beam divergence angle and a deviation in beam size within a range between a center trajectory and an outer trajectory after swinging of the beam by the scanner.Type: GrantFiled: August 12, 2005Date of Patent: September 30, 2008Assignee: SEN CorporationInventors: Mitsuaki Kabasawa, Mitsukuni Tsukihara
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Patent number: 7423276Abstract: In an irradiation system with an ion beam/charged particle beam, an ion beam/charged particle beam is deflected by an energy filter for the energy analysis and then a wafer irradiated with the beam. The energy filter controls the spread of magnetic field distribution caused by a deflection magnet, cancels a leakage magnetic field in the longitudinal direction, and bends the ion beam/charged particle beam at a uniform angle at any positions overall in scanning-deflection area.Type: GrantFiled: August 12, 2005Date of Patent: September 9, 2008Assignee: Sen Corporation, An Shi and Axcelis CompanyInventor: Takanori Yagita
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Patent number: 7411709Abstract: A beam processing system comprises a rotary disk mounted thereon with processing objects, a controller for controlling a reciprocating drive mechanism, and a beam width measuring unit for measuring a beam width of a processing beam. The controller sets an inner and an outer overscan position depending on a measured value of the beam width. The controller, based on the number of rotation of the rotary disk per unit time, a scan speed and the number of reciprocating scan times, a reversal start timing of the rotary disk at at least one of the inner and the outer overscan positions, and the measured value, controls the reciprocating drive mechanism so as to ensure an overlap region between a last and a current processing beam irradiation region on each of the processing objects, the overlap region overlapping at least half of the last processing beam irradiation region.Type: GrantFiled: June 1, 2007Date of Patent: August 12, 2008Assignee: Sen CorporationInventors: Takanori Yagita, Hisaki Izutani, Mitsukuni Tsukihara, Takashi Kuroda
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Patent number: 7361892Abstract: A method to increase low-energy beam current according to this invention is applied to an irradiation system with ion beam comprising a beam generation source, a mass analysis device, a beam transformer, a deflector for scanning, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device. The beam transformer comprises a vertically focusing DC quadrupole electromagnet QD and a longitudinally focusing DC quadrupole electromagnet QF. The beam transformer transforms a beam having a circular cross-section or an elliptical or oval cross-section to the beam has an elliptical or oval cross-section that is long in the scan direction in all the region of a beam line after deflection for scanning.Type: GrantFiled: August 12, 2005Date of Patent: April 22, 2008Assignee: Sen Corporation, An Shi and Axcelis CompanyInventors: Mitsuaki Kabasawa, Mitsukuni Tsukihara