Abstract: A superhydrophobic polymer fabrication is provided. According to one method for preparing a superhydrophobic polymer fabrication, the superhydrophobic polymer fabrication can be fabricated quickly and easily, and the superhydrophobic surface can be repeatedly imprinted using a template, so that mass production of the superhydrophobic polymer fabrication over a large area can be economically implemented.

Abstract: A surface-modified, magnetic nanoparticle has one or more multi-dentate ligands bound to a surface of a magnetic nanoparticle. The one or more multi-dentate ligands are bound to the surface of the magnetic nanoparticle through one or more dithiocarbamate groups. The one or more multi-dentate ligands may be a compound of Formula II: R2NCH2[CH2NR?CH2]m[CH2N(CS2?)CH2]q[CH2NHCH2]rCH2NR?2 ??(II) where each R, R?, and R? are independently H, a branched ethyleneimine unit, an unsubstituted or substituted alkyl, an unsubstituted or substituted alkenyl, or an unsubstituted or substituted aryl; and n is an integer from 1 to about 50.

Abstract: A superhydrophobic polymer fabrication is provided.

Abstract: Methods for producing a carbon nanotube (CNT)/metal composite cable including preparing a CNT/metal solution, dipping a metal tip into the dispersed CNT/metal solution, and withdrawing the metal tip from the dispersed CNT/metal solution while applying an electric field between the metal tip and the dispersed CNT/metal solution, and related devices and apparatus are provided.

Abstract: Techniques for making structures comprising a carbon nanotube (CNT) network and conductive polymer are provided. The conductive polymer may be in the form of a solid structure that may be thermally degraded and cooled.

Abstract: There are provided techniques for preparing an elongated nano structure. In one embodiment, an insulator may be deposited on a substrate. The insulator and the substrate may then be patterned to define one or more grooves. After a suspension, emulsion, solution or liquid mixture of nano materials is supplied on the insulator and the groove(s), a gas Jet may be applied on the insulator and cause the nano-materials to be trapped in the groove(s). Thereafter, the insulator may be removed.

Abstract: Techniques for arranging materials on a substrate are provided. In one embodiment, a system may comprise a driver for providing a rotational force, an outer body having an inner surface, and an inner body having an outer surface and disposed within the outer body in a concentric relationship therewith. The inner body may be coupled to the driver to be rotated by the rotational force. The system may further comprise a coupler attached to the outer body in order to retain a substrate, which forms at least one patterned groove therein. A fluid channel, which may be defined between the inner and outer bodies, may be filled with a fluid medium containing materials such as nano materials. When the inner body rotates via the rotational force, the materials contained in the fluid medium may be arranged in the patterned groove of the substrate.

Abstract: Nano material devices are provided. In one embodiment, a nano material device comprises a substrate, a first layer disposed on the substrate, a second layer and a third layer The first layer is configured to include a first set of electrodes at least partially parallel to each other and aligned in a first direction, and the third layer is configured to include a second set of electrodes at least partially parallel to each other and aligned in a third direction transverse to the first direction, thereby defining a plurality of intersections. The second layer is interposed between the first and third layers and configured to include an array of nano materials each element of which is configured to be disposed in each of the intersections.

Abstract: Techniques for manufacturing a 3-D structure of nano materials are provided. In one embodiment, a method of manufacturing a 3-D structure of nano materials resembling a target structure comprises providing a substrate, and for each segment, forming a mask layer, and patterning the mask layer to form one or more grooves, and filling the grooves with the nano materials. The grooves correspond to one of the horizontal segments of the 3-D structure to be assembled. The method also comprises removing the mask layers.

Abstract: Techniques for fabricating nanowires are disclosed.

Abstract: There is provided a novel array structure of nano materials. The array structure may comprise a first set of conductive electrodes, a second set of conductive electrodes and a plurality of first nano material strands protruding from the first conductive electrodes. The first nano material strands may be arranged in a coplanar relationship on a first plane. The array structure may further comprise a plurality of second nano material strands protruding from the second conductive electrodes. The second nano material strands may be arranged in a coplanar relationship on a second plane, which is substantially parallel with the first plane. At least a part of the second nano material strands may extend in a transverse relationship with respect to at least a part of the first nano material strands.

Abstract: There is provided a novel nano material cluster structure. The nano material cluster structure comprises a conductor block and a plurality of first nano material strands protruding from a surface of the conductor block. The first nano material strands extend from the conductor block in a coplanar relationship. A novel method of preparing a nano material cluster structure is also provided. The method comprises providing a layered structure having multiple layers on a substrate. The multiple layers comprise a layer having nano material strands therein. The method also comprises patterning the layered structure to define one or more recesses. The nano material strands are partially exposed through said one or more recesses. The method further comprises filling the one or more recesses with a conductive material to enclose the partially exposed nano material strands.

Abstract: Electron multipliers and techniques for manufacturing electron multipliers are provided. In one embodiment, an electron multiplier includes at least two electrodes, a plurality of electron emission tips for emitting electrons formed on one of the at least two electrodes, and at least one porous structure having a plurality of pores for multiplying the electrons emitted from the plurality of electron emission tips. The porous structure includes a metal core and a layer of insulator material coated on an outer surface of the metal core, and is disposed between the at least two electrodes.

Abstract: Nanoscale graphene structure fabrication techniques are provided. An oxide nanowire useful as a mask is formed on a graphene layer and then ion beam etching is performed. A nanoscale graphene structure is fabricated by removing a remaining oxide nanowire after the ion beam etching.

Abstract: Techniques for manufacturing a graphene structure solution and a graphene device are provided. A uniform graphene nanostructure solution is produced by applying anisotropic etching on a multi-layered graphene using an oxide nanowire as a mask. A graphene device is manufactured by dipping a substrate with a pattern of a molecule layer in a graphene nanostructure solution so that graphenes are aligned on the substrate with the pattern.

Abstract: Techniques for manufacturing cross-structures of nanostructures, such as nanowires and carbon nanotubes are provided. In one embodiment, a method for manufacturing cross-structures of nanostructures include providing a substrate, patterning a first mask layer on the substrate, adsorbing first nanostructures onto surface regions of the substrate where the first mask layer does not exist, removing the first mask layer from the substrate, patterning a second mask layer on the substrate to which the first nanostructures are adsorbed, and adsorbing second nanostructures onto the surface regions of the substrate where the second mask layer does not exist, under conditions effective to manufacture cross-structures of nanostructures on the substrate.

Abstract: A superhydrophobic polymer fabrication is provided.