Abstract: A sulfonium salt of specific structure has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A method producing a laminate with a semiconductor film that has a corundum crystal structure, includes the steps of mounting a substrate on a stage; heating the substrate, atomizing a raw material solution for film deposition, forming a gaseous mixture by mixing the atomized raw material solution for film deposition and carrier gas; and forming the film deposition by supplying the gaseous mixture to the substrate, wherein a surface roughness Ra of a contact surface with the substrate on the stage and the contact surface with the stage on the substrate is 0.5 ?m or less. The method produces the laminate capable of stably forming a thick film of a corundum crystal thin film (the semiconductor film having a corundum crystal structure) with excellent crystal orientation and high quality.

Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has advantages including high solvent solubility, high sensitivity, a high contrast, and improved lithography properties such as EL and LWR when processed by photolithography using high-energy radiation.

Abstract: A resist composition comprising a quencher containing a sulfonium salt composed of a C5-C20 aromatic carboxylic acid anion substituted with a halogen atom or a halogen atom-containing group and a sulfonium cation having the following formula (1).

Abstract: A method for manufacturing a low dielectric silica powder incudes heat-treating a silica powder at a temperature of 500° C. to 1500° C. to achieve 0.0005 or less of a dielectric loss tangent of the silica powder at 10 GHz, and etching a surface of the heat-treated silica powder with an etching solution. A silica powder with an extremely small dielectric loss tangent, a resin composition containing the same, and a method for manufacturing a silica powder with a low dielectric loss tangent and strong adhesion at the interface to resin are achieved.

Abstract: The present invention is an onium salt represented by the following general formula (1), where n1 represents an integer of 0 or 1; n2 represents an integer of 0 to 3; R1a represents a halogen atom or a hydrocarbyl group having 1 to 20 carbon atoms and optionally containing a heteroatom; n3 represents an integer of 0 to 3; R1b represents a hydrocarbyl group having 1 to 36 carbon atoms and optionally containing a heteroatom; n4 represents an integer of 1 or 2; and Z+ represents an onium cation. This provides a novel onium salt to be contained in a resist composition in lithography with a positive or negative resist, and the onium salt has high sensitivity and excellent resolution, can improve LWR and CDU, and can also suppress collapse of a resist pattern.

Abstract: A cosmetic includes the following component (A), the component (A): a hydrosilylated reaction product of an organohydrogen (poly)siloxane (A1) and an organo(poly)siloxane (A2), the hydrosilylated reaction product being an aromatic-group-modified crosslinked organosiloxane, and a ratio between a total number of moles of aryl groups and aralkyl groups and a number of moles of silicon atoms is 0.34 or more. This enables a highly polar oil and an ultraviolet-ray absorbent to be stably blended, and the cosmetic has a good feeling and feel of use.

Abstract: The present invention is a resist material containing: (i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).

Abstract: The present invention is a positive resist material containing a compound having two or more urethane groups and having two or more carboxy groups that are each substituted with an acid-labile group and are bonded to the urethane groups via a linking group. This provides: a positive resist material that has higher sensitivity and higher resolution than conventional positive resist materials and smaller edge roughness and CDU, and allows excellent pattern profile after exposure to light; and a patterning process.

Abstract: The present invention is an additive for water-based paint, containing a siloxane-branched polyether-modified silicone shown by an average composition formula (1) R1aR2bR3cSiO(4-a-b-c)/2 and having a weight-average molecular weight in a range of 500 to 100,000. In the formula (1), R1 represents an alkyl group, an aryl group, an aralkyl group, or an organic group shown by a general formula (2) —CmH2m—O—(C2H4O)d(C3H6O)eR4. R2 represents a group shown by a general formula (3)—CmH2m—O— (C2H4O)f(C3H6O)g—R5; each R3 represents an organosiloxane shown by the following general formula (4). R4 represents a hydrocarbon group, or an organic group shown by R6—(CO)—. R5 represents a hydrogen atom, a hydrocarbon group, or an organic group shown by R6—(CO)—. R6 represents a hydrocarbon group. The siloxane branched polyether-modified silicone satisfies expressions (I), (II).

Abstract: A positive resist material containing a compound having two or more urethane groups and having a carboxy group and a sulfonium salt or iodonium salt of a sulfonic acid, the carboxy group being substituted with an acid-labile group and being bonded to a first urethane group via a first linking group, and the sulfonium salt or iodonium salt being bonded to a second urethane group directly or via a second linking group. This provides: a positive resist material that has higher sensitivity and higher resolution than conventional positive resist materials and smaller edge roughness and CDU, and allows excellent pattern profile after exposure to light; and a patterning process.

Abstract: The present invention is a paint additive containing a siloxane-branched polyether-modified silicone shown by an average composition formula (1) R1aR2bR3cSiO(4-a-b-c)/2 and having a weight-average molecular weight in a range of 500 to 100,000. In the formula (1), R1 represents an alkyl group, an aryl group, an aralkyl group, or an organic group shown by a general formula (2) —CmH2m—O—(C2H4O)d(C3H6O)eR4. R2 represents a group shown by a general formula (3) —CmH2m—O—(C2H4O)f(C3H6O)g—R5; each R3 represents an organosiloxane shown by the following general formula (4). R4 represents a hydrocarbon group, or an organic group shown by R6—(CO)—. R5 represents a hydrogen atom, a hydrocarbon group, or an organic group shown by R6—(CO)—. R6 represents a hydrocarbon group. Thus, the present invention provides a paint additive and a paint composition with small environmental load and imparting excellent antifouling performance.

Abstract: Provided are a photocatalyst transfer film allowing a uniform and highly transparent photocatalyst layer to be transferred to the surfaces of various transfer base materials; and a production method thereof. The photocatalyst transfer film has, on a biaxially oriented polypropylene film, a photocatalyst layer containing a titanium oxide particle-containing photocatalyst, a silicon compound and a surfactant. The production method of the photocatalyst transfer film includes applying a photocatalyst coating liquid to a biaxially oriented polypropylene film; and performing drying. The photocatalyst coating liquid contains a titanium oxide particle-containing photocatalyst, a silicon compound, a surfactant and an aqueous dispersion medium.

Abstract: A laminate contains a crystal substrate; a middle layer formed on a main surface of the crystal substrate, the middle layer comprising a mixture of an amorphous region in an amorphous phase and a crystal region in a crystal phase having a corundum structure mainly made of a first metal oxide; and a crystal layer formed on the middle layer and having a corundum structure mainly made of a second metal oxide, wherein the crystal region is an epitaxially grown layer from a crystal plane of the crystal substrate.

Abstract: This surface treatment agent can form a water repellent/oil repellent layer having particularly excellent wear durability, weather resistance, and alkali resistance, and contains a fluorinated coating agent composition containing: (A) one or more selected from hydroxy group- or hydrolyzable group-containing silanes and siloxanes modified with a fluorooxyalkylene group-containing polymer, and partial (hydrolyzed) condensates thereof, and (B) a fluorooxyalkylene group-containing polymer-modified polysilazane formed of silazane units modified with a fluorooxyalkylene group-containing polymer, wherein the number-average molecular weight of fluorooxyalkylene group-containing polymer residues in the component (A) is 1,500-10,000, the number-average molecular weight of fluorooxyalkylene group-containing polymer residues in the silazane units modified with the fluorooxyalkylene group-containing polymer in the component (B) is 500-6,000, and the mixed mass ratio between the component (A) and the component (B) is 10:90

Abstract: A photocurable composition including the following components (A) to (D), (A) a monomer having one (meth)acryloyl structure, (B) a crosslinking agent having two or more (meth)acryloyl structures, (C) an inorganic ultraviolet-blocking agent having a 50% volume cumulative particle size of 1 to 50 nm, and (D) a photopolymerization initiator in an amount of 0.05 to 1 part by weight, relative to total 100 parts by weight of components (A) and (B), wherein a part or all of component (A) is a hydrophilic monomer, and a content of the hydrophilic monomer is 70% by weight or more, relative to the total weight of components (A) and (B).

Abstract: A negative electrode material containing a negative electrode active material particle which includes a silicon compound particle containing a silicon compound (SiOx: 0.5?x?1.6). The silicon compound particle contains at least one or more of Li2SiO3 and Li4SiO4, and the negative electrode material further contains at least one of a metal compound particle containing a metal compound and an aggregate of the metal compound particle. The negative electrode material is capable of stabilizing a slurry prepared in production of a negative electrode for a secondary battery, and improving initial charge-discharge characteristics and cycle characteristics when it is used as a negative electrode active material for a secondary battery.

Abstract: The present invention is to provide a pellicle characterized by including a pellicle film and a pellicle frame, in which the pellicle film is stretched on the pellicle frame, and the pellicle film is an annealed pellicle film, and to provide a method for producing a pellicle by stretching a pellicle film on a pellicle frame, including the step of annealing the pellicle film alone before stretching the pellicle film on the pellicle frame, annealing the pellicle after stretching the pellicle film on the pellicle frame, or annealing the pellicle film alone and the pellicle both before and after stretching the pellicle film on the pellicle frame.