Patents Assigned to Showa Shell Sekiku K.K.
  • Plasma CVD of amorphous silicon thin film
    Patent number: 5391410
    Abstract: An amorphous silicon thin film is disclosed, which is produced by plasma CVD in which hydrogen-diluted SiH.sub.4 and N.sub.2 O are supplied during chemical vapor deposition as reacting source gases for the chemical vapor deposition, wherein the degree of hydrogen dilution is from 10 to 20.
    Type: Grant
    Filed: May 28, 1993
    Date of Patent: February 21, 1995
    Assignee: Showa Shell Sekiku K.K.
    Inventors: Tetsuro Nii, Porponth Sichanugrist, Takahisa Kase