Abstract: In an embodiment, a current sensor unit includes: a rectification module, to convert an AC current to a pulsed DC current; a conversion module containing an energy storage element, to store energy based upon the pulsed DC current during a charging mode and to generate a power supply current based upon a voltage of the energy storage element; a mode switching module, bypassed by the conversion module during operation in the charging mode, and bypassing the conversion module during operation in an energy release mode; a current sensor module, to detect a pulsed DC current flowing back from the conversion module or mode switching module; a control module, to acquire electrical energy from the power supply current, determine that operation is in the charging mode or energy release mode based upon the voltage of the energy storage element, and acquire a detection value provided by the current sensor module.
Abstract: A sputtering deposition wherein high aspect ratio apertures are coated with conductive films exhibiting low bulk resistivity, low impurity concentrations, and regular morphologies. A collimator is used having an aspect ratio that approximates the aspect ratio of the apertures. The resulting film thickness at the bottom of the aperture is at least 2.times. what can be achieved using conventional sputtering methods. The amount of material deposited at the bottom of the apertures can be further enhanced by elevating the temperature of the substrate (e.g. 450.degree. C.) during the deposition process.
Type:
Grant
Filed:
December 22, 1993
Date of Patent:
June 25, 1996
Assignees:
International Business Machines Corporation, Siemens Aktlengesellschaft
Inventors:
James G. Ryan, David C. Strippe, Bernd M. Vollmer