Patents Assigned to Sigma Laboratories of Arizona, LLC
-
Patent number: 10774219Abstract: Nano-thick flakes that are either flat, and specularly-reflective in visible light or that have microroughness intentionally controlled to disperse or interfere with visible light. Coatings and inks utilizing such flakes. Method for fabrication of such flakes in partial vacuum includes the repeated multiple times deposition of a release layer over a substrate surface and a flake layer over the release layer to form a multilayer structure further reduced to individual flakes. Reactive metal is passivated inline with the deposition of the flake layer for superior corrosion resistance. Chemically-functional materials are optionally added to the release material to transfer their functionality to the surface of flake layer to create unique functional properties on a flake surface before the multilayer structure is removed from the substrate.Type: GrantFiled: April 14, 2017Date of Patent: September 15, 2020Assignee: SIGMA LABORATORIES OF ARIZONA, LLCInventor: Angelo Yializis
-
Patent number: 9968963Abstract: A method for creating a functional coating on a substrate in vacuum from a deposited monomer material in absence of oxygen and/or radiation from a radiation source. The substrate may be preliminarily activated with inert gas to form an activated layer thereon. The method may include depositing a fluorine containing monomer having a first CF3:CF2 ratio, and forming, on the substrate, the self-assembled polymer coating that has a second CF3:CF2 ratio, where the first and second CF3:CF2 ratios are equal.Type: GrantFiled: August 31, 2015Date of Patent: May 15, 2018Assignee: SIGMA LABORATORIES OF ARIZONA, LLCInventor: Angelo Yializis
-
Patent number: 9711286Abstract: Prismatic polymer monolithic capacitor structure operating at temperatures exceeding 140° C. and including multiple interleaving radiation-cured polymer dielectric layers and metal layers. Method for fabrication of same. The geometry of structure is judiciously chosen to increase sheet resistance of metal electrodes while reducing the capacitor's equivalent series resistance. Metal electrode layers are provided with a thickened peripheral portion to increase strength of terminating connections and are passivated to increase corrosion resistance. Materials for polymer dielectric layers are devised to ensure that the capacitor's dissipation factor remains substantially unchanged across the whole range of operating temperatures, to procure glass transition temperature that is no less than the desired operating temperature, and to optimize the absorption of ambient moisture by the polymeric layers.Type: GrantFiled: March 25, 2015Date of Patent: July 18, 2017Assignee: SIGMA LABORATORIES OF ARIZONA, LLCInventor: Angelo Yializis
-
Patent number: 9637641Abstract: Nanothick flakes that are either flat and specularly-reflective in visible light or that have microroughness intentionally controlled to disperse or interfere with visible light. Coatings and inks utilizing such flakes. Method for fabrication of such flakes in partial vacuum includes the repeated multiple times deposition of a release layer over a substrate surface and a flake layer over the release layer to form a multilayer structure further reduced to individual flakes. Reactive metal is passivated inline with the deposition of the flake layer for superior corrosion resistance. Chemically-functional materials are optionally added to the release material to transfer their functionality to the surface of flake layer to create unique functional properties on a flake surface before the multilayer structure is removed from the substrate.Type: GrantFiled: March 30, 2015Date of Patent: May 2, 2017Assignee: SIGMA LABORATORIES OF ARIZONA, LLCInventor: Angelo Yializis
-
Patent number: 9558679Abstract: An organic release agent is vacuum deposited over a substrate and surface treated with a plasma or ion-beam source in a gas rich in oxygen-based functional groups to harden a very thin layer of the surface of the deposited layer in passivating environment. Aluminum is subsequently vacuum deposited onto the hardened release layer to form a very flat and specular thin film. The film is exposed to a plasma gas containing oxygen or nitrogen to passivate its surface. The resulting product is separated from the substrate, crushed to break up the film into aluminum flakes, and mixed in a solvent to separate the still extractable release layer from the aluminum flakes. The surface treatment of the release layer greatly reduces wrinkles in the flakes, improving the optical characteristics of the flakes. The passivation of the flake material virtually eliminates subsequent corrosion from exposure to moisture.Type: GrantFiled: December 5, 2014Date of Patent: January 31, 2017Assignee: Sigma Laboratories of Arizona, LLCInventors: Michael G. Mikhael, Angelo Yializis
-
Patent number: 9165717Abstract: A high surface area valve-metal capacitor electrode is formed on a moving substrate in vacuum by a continuous multilayer vapor-phase deposition process under conditions of substrate temperature and speed that produce continuously growing, uninterrupted dendritic structures. The process is carried out in an atmosphere of inert gas, preferably including He or Ar, with or without an impurity gas such as oxygen. The substrate may be a valve-metal foil or wire, a metal screen, a polymer film, an organic or inorganic fiber, or a composite material. The direction of motion of the moving substrate may be reversed during the deposition process in order to increase the porosity of the dendrites. The electrode may be passivated using an oxygen-containing plasma before exposure to air. The process may also be carried out under conditions that produce boundary-layer turbulence in order to promote the continuously growth of uninterrupted dendritic structures.Type: GrantFiled: January 30, 2013Date of Patent: October 20, 2015Assignee: SIGMA LABORATORIES OF ARIZONA, LLCInventors: Angelo Yializis, Gordon Goodyear, Vladimir Gordyienko, Marlowe Engquist
-
Patent number: 9082320Abstract: An organic release agent is vacuum deposited over a substrate and surface treated with a plasma or ion-beam source in a gas rich in oxygen-based functional groups to harden a very thin layer of the surface of the deposited layer in a passivating environment. Aluminum is subsequently vacuum deposited onto the hardened release layer to form a very flat and specular thin film. The film is exposed to a plasma gas containing oxygen or nitrogen to passivate its surface. The resulting product is separated from the substrate, crushed to brake up the film into aluminum flakes, and mixed in a solvent to separate the still extractable release layer from the aluminum flakes. The surface treatment of the release layer greatly reduces wrinkles in the flakes, improving the optical chracteristics of the flakes. The passivation of the flake material virtually eliminates subsequent corrosion from exposure to moisture.Type: GrantFiled: January 18, 2006Date of Patent: July 14, 2015Assignee: Sigma Laboratories of Arizona, LLCInventors: Michael G. Mikhael, Angelo Yializis
-
Patent number: 8840970Abstract: Functionalized multilayer structures are manufactured by a process whereby a substrate material is treated with a reactive-gas plasma to form an activated layer on the surface thereof, and then by depositing a liquid functional monomer on the activated layer to form a self-assembled functional layer. Any excess liquid monomer must be allowed to re-evaporate in order to obtain optimal functionality on the surface of the resulting structure. The deposition of the liquid layer is preferably carried out with high kinetic energy to ensure complete penetration of the monomer throughout the body of the substrate. For particular applications, prior to formation of the reactive layer the substrate may be coated with a high glass-transition temperature polymer or a metallic layer.Type: GrantFiled: January 16, 2011Date of Patent: September 23, 2014Assignee: Sigma Laboratories of Arizona, LLCInventors: Angelo Yializis, Gordon Goodyear
-
Patent number: 8815337Abstract: Polymer-based optically-variable devices (OVDs) for security applications and methods for producing the same. The uniformity of thickness of the structure of such devices is optimized by controlling previously neglected process parameters such as the temperature distribution of the deposition nozzle, the substrate and the deposition drum, their emissivities, the micro-roughness of the substrate, and the rate of monomer re-evaporation. Re-evaporation is minimized by initiating radiation-curing within two seconds of monomer deposition. A method includes equipment reducing all sources of emissivity non-homogeneities, such as surface blemishes in the surface areas exposed to the substrate to preferentially fabricate substrates with haziness less than 5% and gloss greater than 90%. Controlling, a maximum variation of thickness of the transmissive layer of an OVD ensures that no appreciable color-shift variation is visible to the naked eye.Type: GrantFiled: April 21, 2011Date of Patent: August 26, 2014Assignee: Sigma Laboratories of Arizona, LLCInventors: Angelo Yializis, Gordon Goodyear
-
Patent number: 8586173Abstract: A multilayer dielectric structure is formed by vacuum depositing two-dimensional matrices of nanoparticles embedded in polymer dielectric layers that are thicker than the effective diameter of the nanoparticles, so as to produce a void-free, structured, three-dimensional lattice of nanoparticles in a polymeric dielectric material. As a result of the continuous, repeated, and controlled deposition process, each two-dimensional matrix of nanoparticles consists of a layer of uniformly distributed particles embedded in polymer and separated from adjacent matrix layers by continuous polymer dielectric layers, thus forming a precise three-dimensional nanoparticle matrix defined by the size and density of the nanoparticles in each matrix layer and by the thickness of the polymer layers between them. The resulting structured nanodielectric exhibits very high values of dielectric constant as well as high dielectric strength.Type: GrantFiled: June 30, 2010Date of Patent: November 19, 2013Assignee: Sigma Laboratories of Arizona, LLCInventors: Angelo Yializis, Gordon Goodyear
-
Publication number: 20130052419Abstract: Radiant-barrier structures include visible images that do not materially alter the emissivity and reflective quality of the barrier. The images are formed either below the reflective metallic layer or on top of the protective layer of the barrier used in commercial and residential construction applications, apparel, tents and other heat-management applications. The images may contain product and application information as well as visual effects with functional and/or decorative value. In some radiant-barrier embodiments the image-forming process enhances the radiant-barrier performance by lowering the surface emissivity.Type: ApplicationFiled: August 23, 2011Publication date: February 28, 2013Applicant: Sigma Laboratories of Arizona, LLC.Inventors: STEVEN YIALIZIS, ANGELO YIALIZIS
-
Publication number: 20120270020Abstract: A polymer-based optically-variable device for security applications has a high degree of color uniformity over the device area. The uniformity of thickness of the structure used in such devices is optimized by controlling previously neglected process parameters such as the temperature distribution of the deposition nozzle, the substrate and the deposition drum, their emissivities, the micro-roughness of the substrate, and the rate of monomer re-evaporation. Re-evaporation is minimized by initiating radiation-curing within two seconds of monomer deposition. The equipment is carefully monitored to eliminate all sources of emissivity non-homogeneities, such as surface blemishes in the surface areas exposed to the substrate. Substrates with haziness less than 5% and gloss greater than 90% are preferred. As a result, a maximum thickness variation of less than 5% over the transmissive layer of the optically variable device is found to ensure that no appreciable color-shift variation is visible to the naked eye.Type: ApplicationFiled: April 21, 2011Publication date: October 25, 2012Applicant: Sigma Laboratories of Arizona, LLC.Inventors: ANGELO YIALIZIS, Gordon Goodyear
-
Publication number: 20120184165Abstract: Functionalized multilayer structures are manufactured by a process whereby a substrate material is treated with a reactive-gas plasma to form an activated layer on the surface thereof, and then by depositing a liquid functional monomer on the activated layer to form a self-assembled functional layer. Any excess liquid monomer must be allowed to re-evaporate in order to obtain optimal functionality on the surface of the resulting structure. The deposition of the liquid layer is preferably carried out with high kinetic energy to ensure complete penetration of the monomer throughout the body of the substrate. For particular applications, prior to formation of the reactive layer the substrate may be coated with a high glass-transition temperature polymer or a metallic layer.Type: ApplicationFiled: January 16, 2011Publication date: July 19, 2012Applicant: Sigma Laboratories of Arizona, LLC.Inventors: ANGELO YIALIZIS, Gordon Goodyear
-
Publication number: 20120003449Abstract: A multilayer dielectric structure is formed by vacuum depositing two-dimensional matrices of nanoparticles embedded in polymer dielectric layers that are thicker than the effective diameter of the nanoparticles, so as to produce a void-free, structured, three-dimensional lattice of nanoparticles in a polymeric dielectric material. As a result of the continuous, repeated, and controlled deposition process, each two-dimensional matrix of nanoparticles consists of a layer of uniformly distributed particles embedded in polymer and separated from adjacent matrix layers by continuous polymer dielectric layers, thus forming a precise three-dimensional nanoparticle matrix defined by the size and density of the nanoparticles in each matrix layer and by the thickness of the polymer layers between them. The resulting structured nanodielectric exhibits very high values of dielectric constant as well as high dielectric strength.Type: ApplicationFiled: June 30, 2010Publication date: January 5, 2012Applicant: Sigma Laboratories of Arizona, LLC.Inventors: Angelo Yializis, Gordon Goodyear
-
Publication number: 20110262699Abstract: A multilayer radiant-barrier structure is formed on one or both sides of a substrate that can be attached to an insulating layer to produce a reflective insulating material. The metallized layer is protected from environmental degradation without interfering with flammability properties that are critical for radiant and reflective insulation materials used in housing applications. The metal layer is modified to insulate enclosures without blocking cellular communications and the protective functional layer in modified to minimize emissivity, create a hydrophobic and/or oleophobic surface, and/or prevent mold, fungi and bacteria growth. Solutions are provided to solve occupational-hazard problems associated with the use of these materials in enclosures that include power wires.Type: ApplicationFiled: July 3, 2011Publication date: October 27, 2011Applicant: Sigma Laboratories of Arizona, LLC.Inventors: Angelo Yializis, Gordon Goodyear, Steven Yializis
-
Patent number: 7807232Abstract: In a continuous in-vacuum process for the manufacture of a film metallized with aluminum, the aluminum layer is exposed to a passivating agent, inline, immediately after deposition and prior to rewinding of the film onto a take-up roller. Passivation is carried out by plasma treatment in an oxidizing atmosphere (oxygen, nitrogen or others). The resulting product exhibits no peel-off problems during unwinding of the take-up roller and greatly improved corrosion resistance.Type: GrantFiled: October 25, 2006Date of Patent: October 5, 2010Assignee: Sigma Laboratories of Arizona, LLCInventors: Angelo Yializis, Michael Mikhael
-
Patent number: 7781034Abstract: A composite multi-layer barrier is produced by first vapor depositing a barrier under vacuum over a substrate and then depositing an additional barrier at atmospheric pressure in a preferably thermoplastic layer. The resulting multi-layer barrier is used to coat an article in a lamination process wherein the thermoplastic layer is fused onto itself and the surface of the article. The vacuum-deposited barrier may include of a first leveling polymer layer followed by an inorganic barrier material sputtered over the leveling layer and of an additional polymeric layer flash evaporated, deposited, and cured under vacuum. The thermoplastic polymeric layer is then deposited by extrusion, drawdown or roll coating at atmospheric pressure. The resulting multi-layer barrier may be stacked using the thermoplastic layer as bonding agent. Nano-particles may be included in the thermoplastic layer to improve barrier properties. A desiccant material may also be included or added as a separate layer.Type: GrantFiled: May 4, 2004Date of Patent: August 24, 2010Assignee: Sigma Laboratories of Arizona, LLCInventors: Angelo Yializis, Michael G. Mikhael
-
Patent number: 7754106Abstract: A release agent is flash evaporated and deposited onto a support substrate under conventional vapor-deposition conditions and a conductive metal oxide, such as ITO, is subsequently sputtered or deposited by reactive electron beam onto the resulting release layer in the same process chamber to form a very thin film of conductive material. The resulting multilayer product is separated from the support substrate, crushed to brake up the metal-oxide film into flakes, and heated or mixed in a solvent to separate the soluble release layer from the metallic flakes. Thus, by judiciously controlling the deposition of the ITO on the release layer, transparent flakes may be obtained with the desired optical and physical characteristics.Type: GrantFiled: June 7, 2006Date of Patent: July 13, 2010Assignee: Sigma Laboratories of Arizona, LLCInventors: Michael G. Mikhael, Angelo Yializis
-
Publication number: 20100062176Abstract: The boundary layer of a substrate is exposed to a low-energy inert-gas atmospheric plasma that disrupts the layer's bonds, thereby permitting the removal of most oxygen from the surface of the substrate. The substrate is then passed through an exhaust section to remove the disrupted boundary layer prior to conventional plasma treatment. The subsequent plasma treatment is carried out in conventional manner in a substantially oxygen-free environment. As a result of the invention, the high surface-energy levels provided by plasma treatment are more lasting and plasma applications requiring a substantially oxygen-free environment are more efficient.Type: ApplicationFiled: September 9, 2008Publication date: March 11, 2010Applicant: SIGMA LABORATORIES OF ARIZONA, LLCInventors: Xin Dai, Richard Ellwanger, Angelo Yializis
-
Patent number: 7557019Abstract: A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54,56) separated by a dielectric material (64), and a precursor material is introduced into the treatment space to coat a substrate film or web (14) by vapor deposition or atomized spraying at atmospheric pressure. The deposited precursor exposed to an electromagnetic field (AC, DC, or plasma) and then it is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Additional plasma post-treatment may be used to enhance the properties of the resulting coated products.Type: GrantFiled: December 5, 2006Date of Patent: July 7, 2009Assignee: Sigma Laboratories of Arizona, LLCInventors: Michael G. Mikhael, Angelo Yializis, Richard E. Ellwanger