Patents Assigned to SIGRAY, INC.
  • Patent number: 9719947
    Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a ? phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, a means to translate the second grating G2 relative to the detector. The system may additionally comprise an antiscattering grid to reduce signals from scattered x-rays. Various configurations of dark-field and bright-field detectors are also disclosed.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: August 1, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9594036
    Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.
    Type: Grant
    Filed: March 1, 2015
    Date of Patent: March 14, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20170052128
    Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.
    Type: Application
    Filed: August 18, 2016
    Publication date: February 23, 2017
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Benjamin Donald Stripe
  • Patent number: 9570265
    Abstract: We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: February 14, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9543109
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.
    Type: Grant
    Filed: April 1, 2016
    Date of Patent: January 10, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20160351370
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
    Type: Application
    Filed: May 27, 2016
    Publication date: December 1, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, David Charles Reynolds
  • Publication number: 20160320320
    Abstract: This invention discloses a method and apparatus for x-ray techniques using structured x-ray illumination for examining material properties of an object. In particular, an object with one or more regions of interest (ROIs) having a particular shape, size, and pattern may be illuminated with an x-ray beam whose cross sectional beam profile corresponds to the shape, size and pattern of the ROIs, so that the x-rays of the beam primarily interact only with the ROIs. This allows a greater x-ray flux to be used, enhancing the signal from the ROI itself, while reducing unwanted signals from regions not in the ROI, improving signal-to-noise ratios and/or measurement throughput This may be used with a number of x-ray measurement techniques, including x-ray fluorescence (XRF), x-ray diffraction (XRD), small angle x-ray scattering (SAXS), x-ray absorption fine-structure spectroscopy (XAFS), x-ray near edge absorption spectroscopy, and x-ray emission spectroscopy.
    Type: Application
    Filed: June 5, 2016
    Publication date: November 3, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9449781
    Abstract: This disclosure presents systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: September 20, 2016
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9448190
    Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: September 20, 2016
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20160268094
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.
    Type: Application
    Filed: April 1, 2016
    Publication date: September 15, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Patent number: 9390881
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. Some embodiments of the invention comprise x-ray optical elements placed between sub-sources of x-rays. These x-ray optical elements may form images of one or more x-ray sub-sources in alignment with other x-ray sub-sources, and may enhance the linear accumulation that can be achieved.
    Type: Grant
    Filed: September 19, 2014
    Date of Patent: July 12, 2016
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20160066870
    Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a ? or ?/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.
    Type: Application
    Filed: November 17, 2015
    Publication date: March 10, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20160064175
    Abstract: Disclosed are targets for generating x-rays using electron beams and their method of fabrication. They comprise a number of microstructures fabricated from an x-ray target material arranged in close thermal contact with a substrate such that the heat is more efficiently drawn out of the x-ray target material. This allows irradiation of the x-ray generating substance with higher electron density or higher energy electrons, leading to greater x-ray brightness, without inducing damage or melting. The microstructures may comprise conventional x-ray target materials (such as tungsten) that are patterned at micron-scale dimensions on a thermally conducting substrate, such as diamond. The microstructures may have any number of geometric shapes to best generate x-rays of high brightness and efficiently disperse heat. In some embodiments, the target comprising microstructures may be incorporated into a rotating anode geometry, to enhance x-ray generation in such systems.
    Type: Application
    Filed: August 29, 2014
    Publication date: March 3, 2016
    Applicant: SIGRAY, INC.
    Inventors: Wenbing YUN, Janos KIRZ, Sylvia Jia Yun LEWIS