Patents Assigned to Silicon Wireless Corporation
  • Patent number: 6545316
    Abstract: MOSFET embodiments of the present invention provide highly linear transfer characteristics (e.g., Id v. Vg) and can be used effectively in linear power amplifiers. These linear transfer characteristics are provided by a MOSFET having a channel that operates in a linear mode and a drift region that simultaneously supports large voltages and operates in a current saturation mode. A relatively highly doped transition region is preferably provided between the channel region and the drift region. Upon depletion, this transition region provides a potential barrier that supports separate and simultaneous linear and current saturation modes.
    Type: Grant
    Filed: June 23, 2000
    Date of Patent: April 8, 2003
    Assignee: Silicon Wireless Corporation
    Inventor: Bantval Jayant Baliga
  • Patent number: 6525372
    Abstract: Vertical power devices include a semiconductor substrate having a first surface thereon and a drift region of first conductivity type therein. A quad arrangement of trenches are provided that extend into the first surface of the semiconductor substrate and define a drift region mesa therebetween. A base region of second conductivity type is included. The base region extends into the drift region and forms a first P-N rectifying junction therewith. A source region of first conductivity type is provided that extends into the base region and forms a second P-N rectifying junction therewith. A quad arrangement of insulated electrodes is provided in the quad arrangement of trenches. An insulated gate is provided on the drift region mesa. A source electrode is also provided that extends on the first surface. The source electrode is electrically connected to the source and base regions and to the quad arrangement of insulated electrodes.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: February 25, 2003
    Assignee: Silicon Wireless Corporation
    Inventor: Bantval Jayant Baliga