Patents Assigned to Silison Genesis Corporation
  • System for the plasma treatment of large area substrates
    Patent number: 6338313
    Abstract: A cluster tool for providing plasma treatment to a substrate includes a plurality of chambers to provide plasma treatment to the substrate. At least one of the chambers performs ion implantation to the substrate. A dielectric window is provided on a surface of the chamber which performs ion implantation to the substrate. A plasma source is provided external to the chamber which performs ion implantation to the substrate. The plasma source is at a distance proximate enough to provide a plasma within the chamber.
    Type: Grant
    Filed: April 24, 1998
    Date of Patent: January 15, 2002
    Assignee: Silison Genesis Corporation
    Inventor: Chung Chan