Abstract: A conductive polymer composition having the resistance to moisture and heat in the coating film is provided. A conductive polymer composition comprising a solvent and a ?-conjugated conductive polymer is provided. A vinyl sulfone group-containing compound containing a vinyl sulfone group as a dopant of the conductive polymer or an additive is included and when the conductive polymer composition contains the vinyl sulfone group-containing compound as the additive, the vinyl sulfone group-containing compound contains a plurality of vinyl sulfone groups.

Abstract: Provided are a novel acrylic polymer that has moderate crosslinking reactivity and is suitable for sealant applications and a sealant using the polymer. The (meth)acrylic acid alkyl ester polymer according to the invention has a weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) method of 30,000 to 150,000 and a number average molecular weight (Mn) of less than 20,000 and has 1.1 to 3.0 methyldimethoxysilyl groups, more than 0.5 methyldimethoxysilyl groups at side chains of a molecular chain, and more than 0.5 methyldimethoxysilyl groups at molecular chain terminals, per one molecule of the polymer.

Abstract: A conductive polymer composition having the resistance to moisture and heat in the coating film is provided. A conductive polymer composition comprising a solvent and a ?-conjugated conductive polymer is provided. A vinyl sulfone group-containing compound containing a vinyl sulfone group as a dopant of the conductive polymer or an additive is included and when the conductive polymer composition contains the vinyl sulfone group-containing compound as the additive, the vinyl sulfone group-containing compound contains a plurality of vinyl sulfone groups.

Abstract: A solid electrolytic capacitor comprising an anode body having pores, a dielectric, a first conductive polymer layer and a second conductive polymer layer is provided. The dielectric is formed on a surface of the anode body. The first conductive polymer layer includes a first conductive polymer having at least one of structural units represented by the following formula (1) and the following formula (2) and is formed on the dielectric. In the formulas (1) and (2), R1 is an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an alkylene oxide group having 1 to 12 carbon atoms, an aromatic group, or a heterocyclic group, each of which optionally has a substituent, A? is a monoanion derived from a dopant and n is 2 or more and 300 or less.

Abstract: A composite pattern culture substrate which can be conveniently produced using readily available materials and can cultivate uniform spheroids with high viability. According to some embodiments of the present invention, a cell culture substrate having an adhesive portion and a non-adhesive portion is provided, wherein the adhesive portion and the non-adhesive portion have a concave-convex shape, and the contact angle of pure water on the non-adhesive portion is larger than that of the adhesive portion.

Abstract: A solid electrolytic capacitor comprising an anode body having pores, a dielectric, a first conductive polymer layer and a second conductive polymer layer is provided. The dielectric is formed on a surface of the anode body. The first conductive polymer layer includes a first conductive polymer having at least one of structural units represented by the following formula (1) and the following formula (2) and is formed on the dielectric. In the formulas (1) and (2), R1 is an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an alkylene oxide group having 1 to 12 carbon atoms, an aromatic group, or a heterocyclic group, each of which optionally has a substituent, A? is a monoanion derived from a dopant and n is 2 or more and 300 or less.

Abstract: A method for manufacturing a conductive polymer solid electrolytic capacitor comprising a conductive polymer introduction step and a solvent removal step. The conductive polymer introduction step comprises impregnating a porous material with a dispersion. The dispersion includes a conductive polymer dispersed in a non-aqueous solvent and the conductive polymer includes at least one of the structural units represented by the following formula and the following formula.

Abstract: An object of the present invention is to achieve a high polymerization ratio and high functional group introduction ratio during production of a (meth)acrylic polymer having a functional group at one end, while suppressing formation of a disulfide. According to the constitution of the present invention, a method for producing a (meth)acrylic polymer having a functional group at one end includes subjecting a (meth)acrylic monomer to a polymerization reaction, in the presence of an inert gas containing 0.01% to 6.0% by volume of oxygen, by using, as an initiating species, a compound having a functional group and a thiol group.

Abstract: A photo-curable resin composition is provided that is capable of forming a resin layer having solvent resistance and capable of easily forming a releasing layer on the resin layer. According to the present invention, a photo-curable resin composition comprising a silicone oligomer having an alkoxy group bonded to a silicon atom and a (meth)acrylate compound is provided.

Abstract: A method of manufacturing a structure for suppressing in-mask curing corrosion while minimizing influence on shape stability of a fine pattern to be transferred to a resin layer. A method of manufacturing a structure is provided including: lamination forming, forming a lamination including, on a transparent substrate, a resin layer of an imprinting photo curable resin composition containing a photopolymerizable monomer and 0.1 parts or more respectively of a photo initiator and a polymerization inhibitor based on 100 parts of the monomer; covering, pressing a fine pattern of a mold on the resin layer and covering the lamination with a shading mask to cause a part of a region where the mold is pressed on to be exposed; curing the resin layer in the exposed region by radiating curing light to the resin layer; and repeating steps by moving the mold to an uncured area.

Abstract: An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %).

Abstract: Provided is a polymer having exceptional solubility in hydrophilic polar solvents and stability in solvents.

Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.

Abstract: Provided is a method to produce resin particles having a uniform particle size by a suspension polymerization method, and to provide a method for simply producing resin particles having high dispersibility into an organic binder or an organic solvent, wherein a resin particle assemblage comprises a resin particle assemblage in which an ester moiety constituting a sorbitan fatty acid ester having no polyoxyalkylene group is buried in the resin particles, and a large number of sorbitan moieties bonded with the ester moiety exist on a surface of resin particles, and a coefficient of variation (CV value) of a mean particle diameter of the resin particles forming the resin particle assemblage is in the range of 30% or less.

Abstract: A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10?4 to 4.0×10?2.

Abstract: A method for manufacturing an imprint mold which can prevent accumulation of the transferring resin at the joining portion of the film mold is provided. A method for manufacturing an imprint mold, including a winding step to wind a resin film mold onto a cylindrical transferring roll, the resin film mold being provided with a reverse pattern of a desired fine concave-convex pattern and the resin film mold being wound onto the transferring roll so that a gap without the reverse pattern is provided at a butting portion of both ends of the resin film mold; a resin filling step to fill a resin composition into the gap; and a pattern forming step to form a pattern substantially the same as the reverse pattern onto the resin composition, is provided.

Abstract: A polarizing plate is provided that is capable of transmitting a different polarization component for each region provided in the surface of the polarizing plate. The polarizing plate includes: a transparent substrate; a transparent resin layer formed on the transparent substrate and having a concave-convex pattern; and a polarization layer formed on the transparent resin layer. The transparent resin layer has a plurality of concave-convex regions with the concave-convex pattern extending in a different direction in each region, the directions in the concave-convex regions being different from each other.

Abstract: A method for manufacturing an imprint mold which can prevent accumulation of the transferring resin onto the transferring roll is provided. A method for manufacturing an imprint mold, including: a resin coating step to coat a photo-curing resin composition or a thermosetting resin composition onto a pattern transferring mold having a fine concave-convex pattern; and a transferring step to transfer the resin composition throughout the entire circumference of a cylindrical transferring roll and cure the resin composition so that a reverse pattern of the concave-convex pattern is formed throughout the entire circumference of the cylindrical transferring roll, is provided.

Abstract: An anti-reflection sheet includes a transparent substrate; and a resin layer formed on a surface of a transparent substrate. The resin layer includes a first surface that faces the surface of the transparent substrate; a second surface that faces away from the surface of the transparent substrate; and a plurality of projections arranged on the second surface of the resin layer so as to form a projection layer. Each of the plurality of projections has a cross section that includes an entire center axis perpendicular to the surface of the transparent substrate. Each of the plurality of projections has a cross section that is in a shape of quadratic function. An arranged pitch of each of the plurality of projections is not more than half of a wavelength of incident light. An aspect ratio of each of the plurality of projections is 1 or less. A difference between a refractive index n1 of the transparent substrate and a refractive index n2 of the resin layer satisfies the following expression: |n1?n2|?0.05.

Abstract: A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10?4 to 4.0×10?2.