Abstract: Methods of manufacturing electrochromic windows are described. An electrochromic device is fabricated to substantially cover a glass sheet, for example float glass, and a cutting pattern is defined based on one or more low-defectivity areas in the device from which one or more electrochromic panes are cut. Laser scribes and/or bus bars may be added prior to cutting the panes or after. Edge deletion can also be performed prior to or after cutting the electrochromic panes from the glass sheet. Insulated glass units (IGUs) are fabricated from the electrochromic panes and optionally one or more of the panes of the IGU are strengthened.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: An all-solid-state electrochromic device comprises a transparent base material, and an electrochromic multilayer-stack structure formed on the transparent base material. The electrochromic multilayer-stack structure comprises a first transparent-conductive film formed on the transparent base material, an ion-storage layer formed on the first transparent-conductive film, a solid-electrolyte layer formed on the ion-storage layer, and an electrochromic layer formed on the solid-electrolyte layer. The electrochromic layer comprises a reflection-controllable electrochromic layer. In one exemplary embodiment, the electrochromic layer comprises a reflection-controllable layer that comprises at least one of antimony and an antimony-based alloy. A second transparent-conductive film can be formed on the reflection-controllable layer, or between the reflection-controllable layer and the solid-electrolyte layer.

Abstract: Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

Abstract: Electrochromic windows powered by wireless power transmission are described, particularly, the combination of low-defectivity, highly-reliable solid state electrochromic windows with wireless power transmission. Wireless power transmission networks which incorporate electrochromic windows are described.

Abstract: A multi-cell electrochromic device comprises a plurality of solid-state electrochromic cells that are arranged in an optical alignment. Each electrochromic cell is separated from an adjacent electrochromic cell in the optical alignment by a transparent conductive layer that is shared by the two adjacent electrochromic cells.

Abstract: Varying the optical absorption of an electrochromic device in situ allows optimal control over the depth and quality of laser patterning lines when patterning electrochromic devices. Accordingly, an electrochromic device comprises a target conductive layer, an absorbing electrochromic layer formed below the target layer, and an electrolyte layer formed below the absorbing electrochromic layer. The absorbing electrochromic layer is placed in a darkened state, and the target layer is laser ablated using a wavelength that is minimally absorbed in the target layer and a fluence level that does not ablate layers of the electrochromic device that are below the absorbing electrochromic layer. The absorbing electrochromic layer is placed in the darkened state by applying a predetermined control voltage to the electrochromic device, forming the electrochromic device by dark-state deposition, or forming an electrochromic device that is in its darkened state in an equilibrium state.

Abstract: An electrochromic device includes a first conductive layer, a single-layer or dual-layer ion conductor layer, and a second conductive layer. The layers are deposited using PVD, CVD, PECVD, atomic layer deposition, pulsed laser deposition, plating, or sol-gel techniques.

Abstract: Prior electrochromic devices frequently suffer from poor reliability and poor performance. Some of the difficulties result from inappropriate design and construction of the devices. In order to improve device reliability two layers of an electrochromic device, the counter electrode layer and the electrochromic layer, can each be fabricated to include defined amounts of lithium. Further, the electrochromic device may be subjected to a multistep thermochemical conditioning operation to improve performance. Additionally, careful choice of the materials and morphology of some components of the electrochromic device provides improvements in performance and reliability. In some devices, all layers of the device are entirely solid and inorganic.

Abstract: Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

Abstract: One exemplary embodiment of an electrochromic thin-film material comprises a metal-chalcogen compound; and/or a mixture or solid solution of one or more metal-rich metal-chalcogen compounds and/or lithium. One or more of the metals comprise Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Sb, or Bi, or combinations thereof; and one or more of the chalcogens comprise O, S, Se, or Te, or combinations thereof.

Abstract: One exemplary embodiment of an electrochromic device comprises a single cavity Fabry-Pérot filter in which the metal conductive layers forming the cavity are sandwiched by conductive dielectric layers. Another exemplary embodiment of an electrochromic device comprises a dual-cavity Fabry-Pérot filter.

Abstract: A window assembly comprises a first conductive material layer, an electrochromic stack, a second conductive material layer and a seal. The first conductive material layer is formed on a substrate and comprises at least two zones electrically isolated from each other. The electrochromic stack is formed on a first selected zone of the first conductive material layer to overlap an edge of a second selected zone of the first conductive material layer. The second conductive material layer is formed on the electrochromic stack to overlap an edge of the second selected zone. A first bus bar is formed on the second selected zone to be within a sealed volume of the window assembly. A second bus bar is formed on the first selected zone to be outside the seal volume of the window assembly. The seal defines the sealed volume of the window assembly and seals the window assembly.

Abstract: An electrochromic switching device comprises a counter electrode, an active electrode and an electrolyte layer disposed between the counter electrode and the active electrode. The active electrode comprises at least one of an oxide, a nitride, an oxynitrides, a partial oxide, a partial nitride and a partial oxynitride of at least one of Sb, Bi, Si, Ge, Sn, Te, N, P, As, Ga, In, Al, C, Pb and I. Upon application of a current to the electrochromic switching device, a compound comprising at least one of the alkali and the alkaline earth metal ion and an element of the active electrode is formed as part of the active electrode.

Abstract: One exemplary embodiment of an electrochromic device comprises a tantalum-nitride ion-blocking layer formed between a transparent conductive layer and an electrochromic layer. Another exemplary embodiment of an electrochromic device comprises a tantalum-nitride ion-blocking layer formed between a transparent conductive layer and a counter electrode. Yet another exemplary embodiment of an electrochromic device comprises a type-2 ion-blocking layer formed on a transparent conductive layer as an ion diffusion barrier overlayer. Still another exemplary embodiment of an electrochromic device comprises a transparent conductive layer formed from tantalum nitride.

Abstract: One exemplary embodiment of an electrochromic thin-film material comprises an alloy of antimony and one or more base metals; and/or an alloy of antimony, one or more base metals, and lithium; and/or an alloy of antimony, one or more base metals, lithium, and one or more noble metals. Another exemplary embodiment of an electrochromic thin-film material comprises a multilayer stack, the multilayer stack comprising at least one layer comprising one of antimony, antimony-lithium alloy, antimony-one or more base metals alloy, antimony-one or more base metals-lithium alloy, antimony-one or more base metals-one or more noble metals alloy, and antimony-one or more base metals-one or more noble metals-lithium alloy; and at least one alternating layer comprising one of a base metal and a base-metal alloy. One or more of the base metals comprise Co, Mn, Ni, Fe, Zn, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Cd, Mg, Al, Ga, In, Sn, Pb, and Bi, and alloys thereof.