Abstract: A feedback system for controlling properties of a single layer or multiple layer stack is applied on a substrate by means of a vacuum coating process controlled by a plurality of process controlling means. The system includes at least one monitoring device for at least implementing at least two distinct measurement techniques for determining measurement signals at each of a plurality of locations spatially distributed over the coated substrate; at least one processing unit adapted for at least receiving the measurement signals; and a controller for at least providing actuation signals for actuating the plurality of process controlling means.
Abstract: A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/?0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/?0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.
Type:
Grant
Filed:
November 12, 2019
Date of Patent:
August 29, 2023
Assignee:
SOLERAS ADVANCED COATINGS BV
Inventors:
Ignacio Caretti Giangaspro, Wilmert Cyriel Stefaan De Bosscher, David Karel Debruyne, Guy Gobin, Freddy Fack, Hubert Eliano
Abstract: A sputtering target comprising a top coat including a composition of lithium cobalt oxide LiyCozOx. x is smaller than or equal to y+z, and the lithium cobalt oxide has an X-Ray diffraction pattern with a peak P2 at 44°±0.2° 2-theta. The X-Ray diffraction pattern is measured with an X-Ray diffractometer with CuK?1 radiation.
Type:
Grant
Filed:
December 11, 2018
Date of Patent:
January 10, 2023
Assignee:
SOLERAS ADVANCED COATINGS BV
Inventors:
Wilmert De Bosscher, Jörg Oberste Berghaus
Abstract: A power transfer system is described for transfer of electrical power to a sputter target in a sputter device. It comprises a first part comprising a contact surface positionable against a first part of an endblock of the sputter device, a second part inseparably connected to the first part and a third part, and a third part comprising a contact surface positionable against a second part of the endblock or directly against a sputter target when mounted on the endblock. At least two of the three parts are formed as one monolithic piece. One of the parts of the power transfer system is resilient such that, when mounted, the power transfer system is clamped between the first part of the endblock and the second part of the endblock or the sputter target. This part is also responsible for the transfer of electrical power.
Type:
Grant
Filed:
June 29, 2017
Date of Patent:
June 21, 2022
Assignee:
SOLERAS ADVANCED COATINGS BV
Inventors:
Ivan Van De Putte, Niek Dewilde, Koen Corteville