Patents Assigned to Soulbrain Sigma-Aldrich Ltd.
  • Film-forming composition and method for fabricating film by using the same
    Patent number: 9828402
    Abstract: A film-forming composition including a 3-intracyclic cyclopentadienyl precursor and dimethyethylamine is useful for Atomic Layer Deposition, and improves viscosity and volatility while maintaining unique features of metal precursors.
    Type: Grant
    Filed: September 16, 2015
    Date of Patent: November 28, 2017
    Assignees: SK Hynix Inc., SOULBRAIN SIGMA-ALDRICH, LTD
    Inventors: Ji-Won Moon, Young-Jin Son, Jeong-Yeop Lee, Jun-Soo Jang, Jae-Sun Jung, Sang-Kyung Lee, Chang-Sung Hong, Hyun-Joon Kim, Jin-Ho Shin, Dae-Hyun Kim
  • Germanium complexes with amidine derivative ligand and process for preparing the same
    Patent number: 8663736
    Abstract: Provided is a germanium complex represented by Chemical Formula 1 wherein Y1 and Y2 are independently selected from R3, NR4R5 or OR6, and R1 through R6 independently represent (Ci-C7) alkyl. The provided germanium complex with an amidine derivative ligand is thermally stable, is highly volatile, and does not include halogen components. Therefore, it may be usefully used as a precursor to produce high-quality germanium thin film or germanium-containing compound thin film by metal organic chemical vapor deposition (MOCVD) or atomic layer deposition (ALD).
    Type: Grant
    Filed: January 7, 2010
    Date of Patent: March 4, 2014
    Assignee: Soulbrain Sigma-Aldrich Ltd.
    Inventors: Jae Sun Jung, Su Hyong Yun, Minchan Kim, Sung Won Han, Yong Joo Park, Su Jung Shin, Ki Whan Sung, Sang Kyung Lee