Patents Assigned to Stichting Voor Fundamenteel Onderzoek der Materie
-
Patent number: 10551330Abstract: In one aspect, a cathodoluminescence (CL) spectroscopic tomography device includes a sample stage to support a sample. An electron beam source scans an electron beam over the sample to yield light emission by the sample. A reflective element directs the light emission by the sample to a light detector. A controller controls operation of the sample stage, the electron beam source, and the light detector. In one aspect, a CL spectroscopic tomography device includes an electron beam source which directs an electron beam at an object to yield an emission by the object. A detector detects the emission. A controller receives information from the detector related to the detected emission. The controller derives a two-dimensional (2D) CL map from the information related to the detected emission, and derives a three-dimensional (3D) CL tomogram from the 2D CL map.Type: GrantFiled: April 22, 2015Date of Patent: February 4, 2020Assignees: THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY, STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIEInventors: Ashwin C. Atre, Jennifer A. Dionne, Benjamin Brenny, Toon Coenen, Albert Polman
-
Publication number: 20170269482Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.Type: ApplicationFiled: March 8, 2017Publication date: September 21, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Dirk Ewoud Boonzajer Flaes, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
-
Publication number: 20170176879Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.Type: ApplicationFiled: December 16, 2016Publication date: June 22, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Kjeld Sijbrand Eduard EIKEMA
-
Publication number: 20160061750Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814?) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.Type: ApplicationFiled: August 27, 2015Publication date: March 3, 2016Applicants: Vrije Universiteit Amsterdam, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Simon Gijsbert Josephus MATHIJSSEN, Nitesh PANDEY, Stefan Michiel WITTE, Kjeld EIKEMA
-
Publication number: 20130199673Abstract: The invention is directed to a process to prepare metal nanoparticles or metal oxide nanoparticles by applying a cathodic potential as an alternating current (ac) voltage to a solid starting metal object which solid metal object is in contact with a liquid electrolyte comprising a stabilising cation. The invention is also directed to the use of the nanoparticles as a catalyst.Type: ApplicationFiled: July 14, 2011Publication date: August 8, 2013Applicants: STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE, UNIVERSITEIT LEIDENInventors: Alexei Yanson, Marcus Koper, Paramaconi Rodriguez, Nuria Garcia-Araez
-
Publication number: 20090227870Abstract: The invention relates to a method and system for determining a parameter representing an acoustic property of a material. The method comprises: generating an acoustic pressure wave in said material originating from a localized position; placing a plurality of acoustic receivers (6, 7) at mutually differing distances from the acoustic source (3); transforming a plurality of measured acoustic signals to represent field values in a common computational point; computing a signal representing a measure of overlap between said transformed plurality of acoustic signals as a function of said numerical estimates of said acoustic property parameter and deriving said acoustic property parameter from said overlap signal. Since the invention uses acoustic sources that are well localized in the material, the velocity calculations are simple and the geometry of the acoustic receivers in relation to the acoustic source can be exactly taken into account.Type: ApplicationFiled: August 31, 2004Publication date: September 10, 2009Applicant: STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIEInventors: Roy Gerardus Maria Kolkman, Antonius Gerardus Johannes Maria van Leeuwen, Wiendelt Steenbergen
-
Patent number: 6463312Abstract: Microdialysis device (10), comprising at least a probe (1) provided with an inlet (2) and an outlet (3) for bringing a perfusion fluid into contact with a bodily fluid in a part of a living organism and causing constituents from this fluid to be taken up by this perfusion fluid, whereby the perfusion fluid is enriched to dialysate, wherein the outlet (3) is integrally received in a silicon chip (5) and debouches in a first fluid channel (6) formed in this silicon chip (5) and wherein further at least one analysis means, for instance an ISFET (17, 18), for analysing constituents of the bodily fluid taken up by the perfusion fluid is integrally received in the silicon chip (5) in a manner such that dialysate flowing from the outlet (3) comes into contact with said analysis means in the first fluid channel (6), and wherein the silicon chip (5) is further optionally provided with pumping means (50) or dosing means.Type: GrantFiled: September 12, 2000Date of Patent: October 8, 2002Assignee: Stichting Voor Fundamenteel Onderzoek der MaterieInventors: Piet Bergveld, Sebastian Bohm, Wouter Olthuis
-
Patent number: 6049079Abstract: Streak camera whereof the pulse converter for converting a photon pulse for detecting into an electron stream comprises a gaseous medium. A streak camera for a photon pulse in the far-infrared region is provided with a laser source to bring particles in the medium into a Rydberg state, in a streak camera for an X-ray pulse the medium contains particles for bringing into an Auger state, and additional deflection plates are provided for separating a primary electron stream from a secondary electron stream.Type: GrantFiled: October 20, 1997Date of Patent: April 11, 2000Assignee: Stichting Voor Fundamenteel Onderzoek Der MaterieInventors: Lambertus Dominicus Noordam, Marcelis Dominicus Lankhuijzen
-
Patent number: 4307351Abstract: A gas laser for emitting ultraviolet laser light with a wave length of 248-249 nm, the gas mixture in the resonance chamber containing krypton, fluor or a fluor compound, and argon in such quantities that at room temperature the partial argon pressure exceeds 0.5 bar and the partial pressure of krypton and fluor or the fluor compound is smaller than 0.2 bar. The gas mixture in the resonance chamber also contains neon in such a quantity that its partial pressure at room temperature is at least equal to that of the argon.Type: GrantFiled: November 9, 1979Date of Patent: December 22, 1981Assignee: Stichting voor Fundamenteel Onderzoek der MaterieInventors: Gijsbert L. Oomen, Wilhelmus J. Witteman
-
Patent number: 4207540Abstract: A gas laser system having a laser tube with two parallel rectangular flat electrodes, and a metal plate positioned between the parallel edges of the electrodes coupled to an electronic circuit for inducing the ionization of the gas in the gas laser tube preceding the discharge of the gas.Type: GrantFiled: February 9, 1978Date of Patent: June 10, 1980Assignee: Stichting voor Fundamenteel Onderzoek der MaterieInventor: Gerardus J. Ernst
-
Patent number: 4185255Abstract: A high power pulsed laser set-up comprising a laser-tube and a generator, screened at least transversely from the environment, by a housing that forms a conductor for one of the electrodes of the tube.Type: GrantFiled: May 23, 1977Date of Patent: January 22, 1980Assignee: Stichting Voor Fundamenteel Onderzoek der MaterieInventors: Wilhelmus J. Witteman, Bernard J. Reits