Abstract: An industrial robot safety device and method for use in wet stations. A shutdown circuit is operative to deactivate the robot in response to operation of any one of two switches. Each switch responds to variations in tension that are beyond acceptable limits of an associated tensionable element, such as ropes or cables. The tensionable elements are respectively mounted on the left and right side of the robot in the paths of its travel.

Abstract: A megasonic cleaning system utilizes a transducer positioned outside of a cleaning tank to transmit acoustical energy into the cleaning tank. A liquid layer is used to couple the acoustical energy from the transducer to the cleaning tank. An acoustical impedance matching layer, having an acoustical impedance in between that of the transducer and the cleaning fluid, is used to match the impedance of the transducer to that of the cleaning fluid. In one embodiment, the system utilizes at least two transducer arrays and power is switched back and forth between the two arrays. When one array is not being powered, it can be used to listen to the other array.

Abstract: High temperature ceramic nut of aluminum oxide for use in coupling a flared tube to a flare fitting.

Abstract: A chemical processing system for generating ultra-pure chemicals near the site of use. The system includes in series a supply of chemical or the site of use which may be a tank or drum and may be a point of use for semiconductor manufacturing, a concentrate sensor, a pump, a filter, a reactor vessel, and an optional heat exchanger, all connected by Kel-F tubing. Sources of pure filtered gas connect to the reactor vessel. An ozone generator can likewise connect to the reactor vessel. An optional isolation coil can likewise connect between the gas source and the reactor vessel.

Abstract: Megasonic cleaning system for use in cleaning of electronic or other items such as semiconductor wafers or semiconductor substrates in a wafer carrier. Formed piezoelectric transducers are bonded to a tubular envelope at a low temperature and are excited at a first frequency or a second higher frequency for cleaning of items in a cleaning tank. A novel sealing assembly accommodates tubular envelopes of varying diameters.

Abstract: A process for etching oxide films on the semiconductor, or other substrates, in a sealed photochemical reactor. Anhydrous hydrogen fluoride (AHF) gas, or other halogen containing gases, and alcohol vapor carried by an inert gas, such as nitrogen, are passed over the oxides to be etched. The UV radiation shines through a window, which passes the UV radiation onto the oxides while the gases are flowing, and enhances and controls etching of the oxides. The UV window is impervious to the etch process gases. The etch rates are modified, providing for improved oxide etching characteristics.

Abstract: A cluster tool module for dry process cleaning of substrates. A substrate process reactor body assembly includes a gas inlet and gas outlet on opposing sides of a ceramic reactor body. A linear xenon flash lamp in a light bar provides a UV source for uniform distribution over a substrate by use of a light filter. Infrared heating is also provided by a plurality of infrared lamps in the light box. A moisturizer is provided for safe introduction of water vapor into the gas flow.

Abstract: Low profile self-draining wafer carrier holder for gripping and carriage of semiconductor wafer carriers through robotically, automated or manual processing equipment. Opposing members extend horizontally from a central base with gripping fingers at outer extremities to grip wafer carriers for automatic processing. A handle member extends vertically from the central base member, and includes a handle member for accommodation by robotic end effectors. Beveled and angled surfaces in a preferred one-piece construction aid in accelerated fluid chemical runoff. An alternative embodiment includes a high temperature wafer carrier holder with a sloped handle and internal quartz structural rods to prevent warping of the holder.

Abstract: Low profile self-draining wafer carrier holder for gripping and carriage of semiconductor wafer carriers through robotically, automated or manual processing equipment. Opposing members extend horizontally from a central base with gripping fingers at outer extremities to grip wafer carriers for automatic processing. A handle member extends vertically from the central base member, and includes a handle member for accommodation by robotic end effectors. Beveled and angled surfaces in a preferred one-piece construction aid in accelerated fluid chemical runoff.

Abstract: A gas diffusion system for evenly distributing injected gas in a bath including a diffusion sparger plate for spreading and distributing the gas. Gas moves horizontally under the plate, and is relayed upward through a set of gas passages in the plate.