Patents Assigned to Sulzer Metaplas GmbH
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Patent number: 9082595Abstract: A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.Type: GrantFiled: March 14, 2007Date of Patent: July 14, 2015Assignee: SULZER METAPLAS GMBHInventors: Erik Dekempeneer, Wilmert De Bosscher, Pascal Verheyen
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Publication number: 20150008118Abstract: Method for the coating of a substrate (S) in a process chamber (3), in which a gas atmosphere is set up and maintained in the process chamber (3) and an anode (6, 61) and a cylindrical vaporization cathode (2, 21, 22) formed as a target (2, 21, 22) are provided in the process chamber (3). The cylindrical vaporization cathode (2, 21, 22) includes the target material (200, 201, 202) and the target material (200, 201, 202) of the cylindrical cathode (2, 21, 22) is transferred into a vapor phase by means of an electrical source of energy (7, 71, 72).Type: ApplicationFiled: September 26, 2014Publication date: January 8, 2015Applicant: SULZER METAPLAS GMBHInventors: Joerg VETTER, Georg ERKENS
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Publication number: 20140238852Abstract: Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (?1) with respect to a first pivot axis.Type: ApplicationFiled: February 24, 2014Publication date: August 28, 2014Applicant: SULZER METAPLAS GMBHInventors: Joerg VETTER, Stefan ESSER, Jurgen MUELLER, Georg ERKENS
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Publication number: 20140174920Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.Type: ApplicationFiled: January 24, 2014Publication date: June 26, 2014Applicant: SULZER METAPLAS GMBHInventors: Joerg VETTER, Stefan ESSER, Juergen MUELLER, Georg ERKENS
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Patent number: 8518553Abstract: The invention relates to a layered structure comprising a first intermediate layer, said first intermediate layer comprising at least one element of group IVB, group VB or group VIB; a second intermediate layer deposited on top of said first intermediate layer, said second intermediate layer comprising a diamond-like nanocomposite composition; a diamond-like carbon layer deposited on top of said second intermediate layer. The invention further relates to the use of a substrate coated with such a layered structure for high shear and/or high impact applications and to a method to cover a substrate with such a layered structure.Type: GrantFiled: November 30, 2004Date of Patent: August 27, 2013Assignee: Sulzer Metaplas GmbHInventors: Chandra Venkatraman, Keith Majeroni, Daniel Kester
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Patent number: 8492008Abstract: The invention relates to a cutting tool for the machining of wood or a wood-based material, in particular a wood composite material, or a plastic, wherein a layer system for the formation of a surface coating is present on a surface of a cutting edge of the cutting tool. An outermost surface layer of the layer system is formed from a composition of the form [Cr1-xOx]zXaCbNc with 0.05<x<0.75 and 0<z?1, 0?a<1, 0?b<1, 0?c<1 and z+a+b+c=1 and X being an element from the group of the chemical elements consisting of Si, B, Al, Mn, Fe, Co, Ni, Cu, Sc, Y, La, Th, the elements of the group of the lanthanides and the elements of the group IIa of the periodic system of the elements. The invention further relates to a method for the manufacture of a workpiece.Type: GrantFiled: September 12, 2008Date of Patent: July 23, 2013Assignee: Sulzer Metaplas GmbHInventor: Jorg Vetter
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Patent number: 8470456Abstract: The invention relates to a layer system for the formation of a surface layer on a surface of a substrate, in particular on the surface of a tool, wherein the layer system includes at least one first hard layer of the composition (MoSipAYq)?(NrCsOt)? with (o+p+q)=?, (r+s+t)=?, and (?+?)=100, wherein 40???60 and wherein M is at least one metal of the group of the chemical elements consisting of Al and the elements of the secondary groups IVb, Vb, VIb of the periodic system of elements. In accordance with the invention the component AY is at least one element of the group of the chemical elements consisting of Mn, Fe, Co, Ni, Cu and the elements of the secondary group IIIB and the elements of the main group IA, IIA and IIIA and the elements of the group of the lanthanoids of the periodic system of chemical elements, with AY preferably additionally containing boron.Type: GrantFiled: June 24, 2008Date of Patent: June 25, 2013Assignee: Sulzer Metaplas GmbHInventors: Jörg Vetter, Georg Erkens
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Patent number: 8309234Abstract: The invention provides a multilayer film-coated member having sufficient heat resistance and abrasion resistance and capable of exhibiting an effect of preventing adhesion even in cutting work of steel materials that may readily cause adhesion to cutting tools, and therefore capable of prolonging tools, and provides a method for producing it. The multilayer film-coated member is fabricated by coating the surface of a substrate with at least two hard coating films having different compositions, in which the first composition hard coating film of the outermost layer of the hard coating films represented by SiaBbNcCdOe with a+b+c+d+e=1, 0.1?a?0.5, 0.01?b?0.2, 0.05?c?0.6, 0.1?d?0.7 and 0<e?0.Type: GrantFiled: July 29, 2009Date of Patent: November 13, 2012Assignee: Sulzer Metaplas GmbHInventor: Jörg Vetter
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Patent number: 8309235Abstract: A multilayer film-coated member is fabricated by coating the surface of a substrate with at least two hard coating films having different compositions, wherein the first composition hard film of the outermost layer is represented by SiaBbNcCdOe with a+b+c+d+e=1, 0.1?a?0.5, 0.01?b?0.2, 0.05?c?0.6, 0.1?d ?0.7 and 0<e?0.2, the second composition hard coating film having at least two selected from Al. Ti, Cr, Ni, Ce. Mg, Nb, W, Si, V, Zr and Mo and N and at least one selected from B, C, O and S and the oxygen content of the film at least 25 nm from the interface of the first composition hard coating film that is in contact with the underlying layer toward the surface of the first composition hard coating film is limited to a range of less than 3.5 atm. %.Type: GrantFiled: July 29, 2009Date of Patent: November 13, 2012Assignee: Sulzer Metaplas GmbHInventor: Jörg Vetter
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Patent number: 8119261Abstract: The invention relates to a layer system for the formation of a surface layer on a surface of a substrate, in particular on the surface of a tool, wherein the layer system includes at least one first hard layer of the composition (AlaMgbCrcMedBeAXmSik)?(NuCvOw)? with (a+b+c+d+e+m+k)=?, (u+v+w)=?, and (?+?)=100, wherein 40???60 and wherein Me is at least one element of the group of the chemical elements consisting of: the secondary groups IVb, Vb and VIb of the periodic system of the chemical elements. The component AX is at least one element of the group of the chemical elements consisting of: the elements of the main group Ia and the elements Be, Ca, Sr, Ba and the elements of the secondary groups VIIb, VIIIb, Ib, IIb, IIIb and the elements of the group of the lanthanoids, of the periodic system of the elements, wherein 0.004?m<60, and preferably 0.01?m<50. In accordance with the invention 0.4?a?58 and 0.04?b?12 and 18?c?42.Type: GrantFiled: June 24, 2008Date of Patent: February 21, 2012Assignee: Sulzer Metaplas GmbHInventor: Jörg Vetter
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Patent number: 8101273Abstract: The invention relates to a coating comprising a number of layered structures, each such layered structure comprising—a first layer comprising a diamond like nanocomposite layer, said first layer comprising carbon, hydrogen, oxygen and silicon; a second layer comprising a diamond like carbon layer. The number of layered structure is higher than 4 and is preferably between 10 and 100. The invention further relates to a method to deposit such a coating.Type: GrantFiled: May 24, 2006Date of Patent: January 24, 2012Assignee: Sulzer Metaplas GmbHInventors: Jean-Marie Jacquet, Wim Pappaert, Marc Sercu, Koen Vanhollebeke
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Patent number: 8033550Abstract: A piston ring (22) is covered at least partially with a layered structure (30). The layered structure (30) comprises: —a first intermediate layer (32) comprising at least one element of group IVB, group VB or group VIB; —a second intermediate layer (34) deposited on top of the first intermediate layer (32) and comprising a diamond-like nanocomposite composition; —a diamond-like carbon layer (36) deposited on top of the second intermediate layer (34).Type: GrantFiled: March 1, 2006Date of Patent: October 11, 2011Assignee: Sulzer Metaplas GmbHInventors: Jean-Marie Jacquet, Frederick G. Wietig
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Patent number: 7947372Abstract: The invention relates to a metal substrate coated at least partially with a layered structure. The layered structure comprises an intermediate layer deposited on the metal substrate and an amorphous carbon layer deposited on the intermediate layer. The amorphous carbon layer has a Young's modulus lower than 200 GPa. The intermediate layer comprises a tetrahedral carbon layer having a Young's modulus higher than 200 GPa. The invention further relates to a method to reduce the wear on a counterbody of a metal substrate coated with a tetrahedral carbon coating.Type: GrantFiled: July 13, 2006Date of Patent: May 24, 2011Assignee: Sulzer Metaplas GmbHInventor: Erik Dekempeneer
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Patent number: 7935426Abstract: The invention relates to a layer arrangement (1) for the formation of a coating on a surface (2) of a substrate (3), in particular on the surface (2) of a tool (3), wherein the layer arrangement comprises at least one hard layer (4, 5, 6, 7, 8) having the composition SiaBbMecNuCvOw with a,b>0 and 33 at %>c ?0, preferably 25 at %>c?0, in particular 10 at %>c?0 and u,v,w?0, and Me being a metal. Furthermore, the invention relates to a coating method for depositing a layer arrangement (1), as well as to a substrate (3), in particular a tool (3) or a wearing part (3) having a layer arrangement (1) according to the invention.Type: GrantFiled: October 13, 2006Date of Patent: May 3, 2011Assignee: Sulzer Metaplas GmbHInventor: Joerg Vetter
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Publication number: 20100213055Abstract: The invention relates to a vacuum arc vaporisation source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporisation material (31) as a cathode (32) for the production of an arc discharge on an vaporisation surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporisation surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporisation surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporisation surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporisation chamber (10) with an arc vaporisation source (1).Type: ApplicationFiled: March 11, 2008Publication date: August 26, 2010Applicant: Sulzer Metaplas GmbHInventor: Jörg Vetter