Abstract: The object of the present invention is to increase channel current density while a GaN-based field effect transistor operates in a normally-off mode. Provided is a semiconductor device comprising a group 3-5 compound semiconductor channel layer containing nitrogen, an electron supply layer that supplies electrons to the channel layer, a semiconductor layer that is formed on a side of the electron supply layer opposite the side facing the channel layer and that is an intrinsic or n-type group 3-5 compound semiconductor containing nitrogen, and a control electrode that is formed to contact the semiconductor layer or formed with an intermediate layer interposed between itself and the semiconductor layer.
Type:
Application
Filed:
March 18, 2009
Publication date:
May 12, 2011
Applicant:
Sumitomo Chemical Company Limite
Inventors:
Hiroyuki Sazawa, Naohiro Nishikawa, Yasuyuki Kurita, Masahiko Hata