Patents Assigned to Taiwan Styrene Monomer Corporation
  • Patent number: 5336837
    Abstract: A process for separating p-diethylbenzene from a diethylbenzene isomers mixture by selective adsorption of p-diethylbenzene on a silicalite adsorbent is disclosed in the present invention, wherein a compressed high pressure CO.sub.2 or propane is used as a carrier for carrying a fixed amount of the diethylbenzene isomers mixture to the silicalite adsorbent bed for the selective adsorption, a first stage effluent stream containing a rich meta-diethylbenzene (m-DEB) and/or ortho-diethylbenzene (o-DEB), but having substantially no para-diethylbenzene (p-DEB) is eluted from the adsorbent bed; when p-DEB of the mixture starts to appear in the first stage effluent stream, a much higher pressurized CO.sub.2 or propane used as a desorbent is then fed into the adsorbent bed, and a second stage effluent stream conaining a rich p-DEB, but having substantially no other DEB isomers is thereby eluted from the adsorbent bed.
    Type: Grant
    Filed: March 25, 1993
    Date of Patent: August 9, 1994
    Assignee: Taiwan Styrene Monomer Corporation
    Inventors: Chung-Sung Tan, Shiaw-Tseh Chiang
  • Patent number: 5227570
    Abstract: A process for separating ethylbenzene and p-xylene from a xylene isomers mixture, additional containing m-xylene and o-xylene, by selective adsorption of ethylbenzene and p-xylene on a silicalite absorbent is disclosed in the present invention, wherein a compressed gaseous CO.sub.2 stream is used as a carrier for carrying a fixed amount of the mixture to the adsorbent bed for the selective adsorption, followed by a supercritical CO.sub.2 stream desorption of the adsorbed ethylbenzene and p-xylene from the adsorbent bed. A method for recycling the CO.sub.2 used therein is also disclosedby, which involves an isothermal and isobaric adsorption of the xylene isomer products from the effluent CO.sub.2 streams.
    Type: Grant
    Filed: December 2, 1991
    Date of Patent: July 13, 1993
    Assignee: Taiwan Styrene Monomer Corporation
    Inventor: Chung-Sung Tan
  • Patent number: 4950835
    Abstract: This invention relates to the preparation of a novel Si/HZSM-5 catalyst through vapor phase deposition of Si on the surface of HZSM-5 catalyst which is obtained by ion exchanging ZSM-5 catalyst. The source of deposition Si comes from tetraalkyl ortho-silicate (or tetra-alkoxy silane), Si(OR)4, wherein R represents the alkyl group that contains 1-4 carbon atoms. The silicon deposit will substantially not clog the pores of the catalyst.The present invention is to make use of the modified catalyst in the alkylation or disproportionation reactions in order to enhance the yield of p-dialkylbenzene as an ingredient in the final product of aryl compounds such as toluene or ethylbenzene.
    Type: Grant
    Filed: October 24, 1989
    Date of Patent: August 21, 1990
    Assignee: Taiwan Styrene Monomer Corporation
    Inventors: Ikai Wang, Biing-Jye Lee, Mei-Hwei Chen
  • Patent number: 4849386
    Abstract: This invention relates to the preparation of a novel Si/HZSM-5 catalyst through vapor phase deposition of Si on the surface of HZSM-5 catalyst which is obtained by ion exchanging ZSM-5 catalyst. The source of depositing Si comes from tetraalkyl ortho-silicate (or tetra-alkoxy silane), Si(OR)4, wherein R represents the alkyl group that contains 1-4 carbon atoms. The silicon deposit will substantially not clog the pores of the catalyst.The present invention is to make use of the modified catalyst in the alkylation or disproportionation reactions in order to enhance the yield of p-dialkylbenzene as an ingredient in the final product of aryl compounds such as toluene or ethylbenzene.
    Type: Grant
    Filed: March 27, 1987
    Date of Patent: July 18, 1989
    Assignee: Taiwan Styrene Monomer Corporation
    Inventors: I. Kai Wang, Biing-Jye Lee, M. H. Chen