Abstract: The present invention involves both an apparatus and a method for handling and holding panels and other substrates for photolithographic exposures. In one of its aspects, the present invention comprises bi-modal vacuum cup-bellows devices which automatically retract behind (below) the surface of a chuck, and to remain so retracted at all times except when it is desired to draw a panel toward the chuck. The retraction eliminates interference with movements of the panel during snubbing. In another of its aspects, the present invention comprises registration (locator) pin mechanisms that incorporate bearings. The bearings both turn and move axially, and operate to prevent the panel edges from hanging thereon. In another of its aspects, the present invention comprises a hand-off vacuum cup-bellows device that clamps onto each panel as it comes from a robotic loader. Such device incorporates a lubricious cover that prevents rolling of the cup edges and that facilitates sliding of each panel during snubbing.