Patents Assigned to Teisan Kabushiki Kaisha
  • Patent number: 6224677
    Abstract: A CVD device A is provided which is equipped with a gas introduction part A3 having an inert gas supply part G1 for supplying a diluting inert gas and a cleaning gas supply path G2 for supplying a cleaning gas, each connected therewith, and equipped with an exhaust gas discharge part A4 for releasing an exhaust gas; an exhaust gas circulation part D1 for circulating an exhaust gas from the CVD device, a cooling part D4 for cooling down and liquefying the cleaning gas in the exhaust gas, and a recovery part 4 for recovering the cleaning gas liquefied in said cooling part D4; the diluting inert gas is composed of a gas having a boiling point lower than that of the cleaning gas; a supply part 6 for supplying a cooling inert gas having the same composition as the diluting inert gas in a liquid state, an inert gas circulation part D3 which is cooled down by heat of evaporation of the cooling inert gas, and an inert gas discharge part 7 for discharging the cooling inert gas evaporated in the inert gas circulation p
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: May 1, 2001
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Shigeyoshi Nozawa, Shinji Tomita
  • Patent number: 5958138
    Abstract: Provided is a gas recovery unit which is more efficient in its recovery and less expensive to run. The gas recovery unit comprises a CVD device, an exhaust gas recovery part and an exhaust gas purification part. The exhaust gas recovery part is constructed so as to have an inert gas reservoir part capable of accommodating liquid nitrogen, to have an exhaust gas supply part for supplying an exhaust gas to said inert gas reservoir part so that it can be brought in gasliquid contact with the liquid nitrogen, and to have a recovered and liquefied gas discharge part for discharging the recovered and liquefied gas which has been liquefied in the inert gas reservoir part.
    Type: Grant
    Filed: November 5, 1996
    Date of Patent: September 28, 1999
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Shinji Tomita, Shigeyoshi Nozawa
  • Patent number: 5921107
    Abstract: A method for producing a small amount of oxygen, related to a nitrogen generator unit, is provided. In a nitrogen rectification column which cools down and liquefies feed air after moisture and carbon dioxide contained therein are removed, thereby producing nitrogen, oxygen-rich liquid air is used as a cold source for a nitrogen condenser and the thus-obtained oxygen-rich air is then used as a heating source for a reboiler in an oxygen rectification column.
    Type: Grant
    Filed: November 22, 1996
    Date of Patent: July 13, 1999
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Takao Yamamoto
  • Patent number: 5899225
    Abstract: The present invention is intended to provide an apparatus capable of detecting an air tube-detached state when said air tube has been detached from an air-actuated valve in order that the same air-actuated valve is caused to assume a closed state. The present invention relates to an air tube connection state detecting apparatus 10 for detecting whether the fore end of an air tube 56 for supplying compressed air to an air-actuated valve 16 for a gas container 12 is connected to said air-actuated valve 16 or not. The air tube connection state detecting apparatus comprises a to-be-contacted member 82, provided at a predetermined position separate from said air-actuated valve 16, to which the fore end of said air tube 56 is to be connected; and a detection means 86 for detecting that the fore end of said air tube 56 is connected to said to-be-connected member 82.
    Type: Grant
    Filed: December 24, 1997
    Date of Patent: May 4, 1999
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Kazuo Yokogi
  • Patent number: 5892207
    Abstract: The present invention relates to a temperature regulation apparatus capable of easily regulating the temperature of a support for a substance to be treated, such as a semiconductor wafer.The temperature regulation apparatus includes a liquid nitrogen supply device for supplying liquid nitrogen into a temperature regulation space provided in the inside of a support so as to effect flashing of the liquid nitrogen. A heating device for heating the support and temperature sensors for detecting the temperature of the support are also provided. A temperature setting device sets the temperature of the support at a desired temperature and a controller controls the liquid nitrogen supply device and the heating device based on a temperature detected by the temperature sensors, so that the support reaches and is maintained at the set temperature.
    Type: Grant
    Filed: November 27, 1996
    Date of Patent: April 6, 1999
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Hideki Kawamura, Hirochika Yamamoto, Yukinobu Nishikawa
  • Patent number: 5891404
    Abstract: An exhaust gas treatment unit of the combustion type is capable of effectively carrying out the decomposing treatment of an exhaust gas while at the same time allowing the unit to be reduced in size. The exhaust gas treatment unit includes a treatment drum, a combustion air introduction tube attached at one end of the treatment drum to introduce combustion air to the inside of the treatment drum, a fuel gas introduction tube disposed inside the combustion air introduction tube to introduce fuel gas to the inside of the treatment drum, and an exhaust gas introduction tube disposed inside the fuel gas introduction tube to introduce exhaust gas to the inside of the treatment drum. A flame tube extends from an end portion of the combustion air introduction tube on the air outlet side to the vicinity of the other end of the treatment drum, and a cooling air introduction port is provided for introducing cooling air into a space between the side wall of the treatment drum and the flame tube.
    Type: Grant
    Filed: October 15, 1996
    Date of Patent: April 6, 1999
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Yoshihiro Ibaraki, Hidekazu Ina, Takayuki Makioka
  • Patent number: 5832746
    Abstract: An ultra-high purity nitrogen trifluoride production method comprises: pressurizing a nitrogen trifluoride feed gas, eliminating moisture and carbon dioxide from the feed gas, and cooling down the same feed gas; causing the cooled feed gas to pass through adsorption columns, and introducing it into a medium-pressure rectification column by way of a reboiler in the medium-pressure rectification column, where it is rectified in the medium-pressure rectification column; introducing the resulting gas obtained by this rectification into a middle stage of a low-pressure rectification column, where it is rectified; and taking out ultra-high purity nitrogen trifluoride obtained by virtue of this rectification from the lower part of the low-pressure rectification column.
    Type: Grant
    Filed: May 14, 1997
    Date of Patent: November 10, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Takashi Nagamura
  • Patent number: 5806340
    Abstract: A high purity nitrogen generator unit which is excellent in the energy efficiency and the recovery of high purity nitrogen gas, is provided. In a rectification column 1, feed air is separated to oxygen-rich liquid air and nitrogen gas. The oxygen-rich liquid air in its bottom is reduced in pressure by a first expansion valve 21 and sent to a composition regulation column 3. The nitrogen gas in its top is condensed in a nitrogen condenser 2, the resulting liquid nitrogen is returned as a reflux liquid to the rectification column 1 and non-condensed gas is released. After oxygen-rich waste gas in the lower part of the composition regulation column 3 is reduced in pressure by an expansion turbine 6, it is released by way of a first heat exchanger 4. Mixed gas in the top of the composition regulation column 3 is introduced for re-circulation into a first compressor 5.
    Type: Grant
    Filed: May 14, 1997
    Date of Patent: September 15, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Shinji Tomita
  • Patent number: 5803795
    Abstract: A method of treating an inner surface of a high-pressure gas vessel is disclosed. In the method, abrasive containing rust preventive is charged into the vessel made preferably of manganese steel or chrome-molybdenum steel and a wet-grinding step is carried out to obtain a maximum inner surface roughness of the vessel of 3 .mu.m or less. Thereafter, the inner surface is rinsed with an acidic rinsing solution.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: September 8, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Shigeyoshi Nozawa
  • Patent number: 5800792
    Abstract: The present invention relates to an exhaust gas treatment unit which possesses a stable treating capacity, with a reduced running cost. The exhaust gas treatment unit removes noxious gases such as monosilane contained in an exhaust gas by thermal decomposition. The exhaust gas treatment unit includes a heating drum (5) into which the exhaust gas and oxygen or air are introduced and a heating source (6) disposed on the outer periphery of the heating drum (5) so as to heat the inside of said heating drum (5). A temperature sensor (14) detects the temperature of the inside of said heating drum (5) in the vicinity of its outlet and a controller (16) controls the heating source (6) in accordance with a detected temperature value from the temperature sensor (14) so that the temperature of the inside of said heating drum (5) in the vicinity of the outlet is maintained within a predetermined temperature range.
    Type: Grant
    Filed: June 4, 1996
    Date of Patent: September 1, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Yoshihiro Ibaraki, Hidekazu Ina, Hideji Kawanaka
  • Patent number: 5783162
    Abstract: An argon recovery and purification process in which the consumption of energy is small because of simple steps, is provided. This process comprises: a first step of reacting impure argon gas with hydrogen gas (H2) so that oxygen (O2) contained in the impure argon gas is converted to water (H2O), thereby substantially removing oxygen (O2) from the impure argon gas; a second step of introducing the impure argon gas into an adsorption unit for adsorbing water (H2O) and carbon dioxide (CO2) contained in the impure argon gas, thereby substantially removing the water (H2O) and carbon dioxide (CO2) from the impure argon gas; and a third step of subjecting the impure argon gas to a low temperature liquefaction and introducing the liquefied argon into a rectification unit for removing low boiling point impurity components and high boiling point impurity components contained in the impure argon gas by purification and separation, thereby obtaining substantially pure argon gas.
    Type: Grant
    Filed: August 30, 1996
    Date of Patent: July 21, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Shinji Tomita, Takashi Nagamura, Takao Yamamoto
  • Patent number: 5778698
    Abstract: A unit capable of simultaneously producing nitrogen of ultra high purity and liquid oxygen of ultra high purity, is provided. The inside of the first rectification column 6 is demarcated to an upper rectifying part 12, and upper-stage middle rectifying part 13, a lower-stage middle rectifying part 14 and a lower rectifying part 15. To the upper part 11 above the upper rectifying part 12 is connected a nitrogen condenser 8. A second rectification column 7 is demarcated to an upper rectifying part 22 and a lower rectifying part 23, and has a reboiler 25 provided under its lower rectifying part 22. Ultra high purity liquid nitrogen is recovered from between the upper rectifying part 12 and upper-stage middle rectifying part 13 of the first rectification column 6, and ultra high purity liquid oxygen is recovered from below the lower rectifying part 23 of the second rectification column 7.
    Type: Grant
    Filed: November 22, 1996
    Date of Patent: July 14, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Takao Yamamoto
  • Patent number: 5743112
    Abstract: A unit capable of simultaneously producing liquid nitrogen of ultra high purity and liquid oxygen of ultra high purity, is provided. The inside of a first rectification column 6 is demarcated to an upper rectifying part 12, a middle rectifying part 13 and a lower rectifying part 14. To the upper part 11 above the upper rectifying part 12 is connected a nitrogen condenser 8. A second rectification column 7 has a reboiler 24 provided under its rectifying part 22. Ultra high purity liquid nitrogen is recovered from between the upper rectifying part 12 and middle rectifying part 22 of the second rectification column 7, where it is brought in countercurrent contact with gas evaporated by the reboiler 24 provided below the rectifying part 22 so that lower boiling point components are separated therefrom. Thus, ultra high purity liquid oxygen is recovered from below the rectifying part 22 of the second rectification column 7.
    Type: Grant
    Filed: November 4, 1996
    Date of Patent: April 28, 1998
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Takao Yamamoto, Shinji Tomita, Ryo Den
  • Patent number: 5685169
    Abstract: A method and apparatus for preparing high purity hydrogen bromide, wherein a starting hydrogen bromide which contains impurities having low boiling points is supplied to an intermediate space. While the gas phase of the starting hydrogen bromide is allowed to ascend through an upper rectifying section, it is brought into contact with a first reflux solution flowing in the reverse direction. The uncondensed gas stored in an upper space is cooled and partly condensed. The condensed liquid is allowed to flow down through an upper rectifying section as the first reflux solution. The liquid-phase of the starting hydrogen bromide is mixed with the first reflux solution in the intermediate space and serves as a second reflux solution. The liquid stored in a lower space is heated and partly evaporated. The liquid stored in the lower space is supplied outside as high purity hydrogen bromide. The uncondensed gas stored in the upper space is discharged outside.
    Type: Grant
    Filed: May 6, 1996
    Date of Patent: November 11, 1997
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Takashi Nagamura, Shinji Tomita
  • Patent number: 5682761
    Abstract: Ultra-high purity nitrogen is generated by removing, from feed air, carbon dioxide, moisture and catalyst poisons of an oxidation catalyst contained therein by a decarbonating drier (4). The feed air is then introduced into a low-pressure rectification column (6), where it is roughly rectified to further remove the carbon dioxide, moisture and catalyst poison. Then raw nitrogen gas obtained in the low-pressure rectification column (6) is introduced into an oxidation column (8) so that carbon monoxide in the raw nitrogen gas is converted to carbon dioxide and hydrogen also contained therein to water. Thereafter the raw nitrogen gas is introduced into an adsorption column (10) so that carbon dioxide and water are removed by adsorption to provide feed raw nitrogen gas, which is fed into an intermediate-pressure rectification column (11), where it is rectified.
    Type: Grant
    Filed: July 19, 1996
    Date of Patent: November 4, 1997
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Takashi Nagamura, Takao Yamamoto, Shinji Tomita
  • Patent number: 5638699
    Abstract: A high purity nitrogen gas generator is provided which can be rapidly returned to a stable state when boil-off gas is generated in a liquid nitrogen storage tank 10. The high purity nitrogen gas generator includes a liquid nitrogen storage tank 10, a rectification column 7, a liquid nitrogen introduction pipe P15 for supplying liquid nitrogen from the liquid nitrogen storage tank to the rectification column, an inverted U-type pipe P13 whose upper end is positioned at a height in the vicinity of the top portion of said liquid nitrogen storage tank connected to the bottom portion of said liquid nitrogen storage tank 10, said liquid nitrogen storage tank 10 and said liquid nitrogen introduction pipe P15 being connected with each other by way of said inverted U-type pipe, the upper end of the inverted U-type pipe and the top portion of said liquid nitrogen storage tank are connected with each other by means of a pipe P17 and a control valve V3 provided on the way of said pipe P17.
    Type: Grant
    Filed: July 24, 1996
    Date of Patent: June 17, 1997
    Assignee: Teisan Kabushiki Kaisha
    Inventors: Takao Yamamoto, Shingo Koizumi
  • Patent number: 5623960
    Abstract: The present invention relates to a solenoid-operated valve for a thermally insulated piping having a thermally insulated outer periphery suitable for transporting low-temperature fluid, high-temperature fluid or the like and relates also to an attachment construction for the valve.Conventionally, with this type of solenoid-operated valve for a thermally insulated piping, since it is necessary to to increase a magnetic flux density of the solenoid coil by increasing the number of turns of the oil or the electric current to be applied thereto, there has been the problem of high production costs and running costs.In the case of the solenoid-operated valve for a thermally insulated piping according to the present invention, inside a heat-insulating layer (6) surrounding flow passages (7, 20, 21, 26, 33) in the form of a pipe, there is provided a fixed core (23) constituting a magnetic circuit between a solenoid coil (17) and a movable coil (18).
    Type: Grant
    Filed: May 23, 1995
    Date of Patent: April 29, 1997
    Assignees: Teisan Kabushiki Kaisha, L'Air Liquide, Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude
    Inventors: Hideki Kawamura, Yoji Mori, Minoru Ueta
  • Patent number: 5470390
    Abstract: A first MFC 10 and a second MFC 10A are disposed respectively on a silane gas feed line 5 and an inert gas or other dilution gas feed line 19 for feeding a gas for semiconductors such as silane gas or an inert gas or other dilution gas to a mixing chamber 13. A buffer tank 21 is provided which restrains or relieves the pressure energy of the mixed gas coming from the mixing chamber 13 and supplies the same mixed gas to each of a plurality of semiconductor manufacturing units 4 separately. The first MFC 10 and second MFC 10A are actuated to open or close on the basis of an increase or decrease in the pressure value of the mixed gas stored in the buffer tank 21, thereby stopping or starting the feed of the silane gas and the inert gas or other dilution gas again.
    Type: Grant
    Filed: May 2, 1994
    Date of Patent: November 28, 1995
    Assignees: Teisan Kabushiki Kaisha, L'Air Liquide Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Georges Claude
    Inventors: Yukinobu Nishikawa, Yoshinori Hashizume, Takako Kimura
  • Patent number: 5468937
    Abstract: A pipe impurity removing apparatus and process is provided, in which moisture adhered on the inner peripheral surface of a supply line can be surely removed, regardless of the pre- or post-completion of a piping execution, and the reduction of its working time can be aimed at. The inner peripheral surface of a pipe 30 which constitutes a supply line 3 for a semiconductor manufacturing unit, is coated or surface-modified with chromium oxide 6 which is a dielectric. A purge gas is caused to flow through the pipe 30 from the upperstream side to the downstream side, and an impurity remover 7 is engaged with the pipe 30 and high-frequency induction heating is applied thereto to heat the chromium oxide 6, whereby moisture adsorbed on the chromium oxide 6 is exhausted and removed together with the purge gas indicated by an arrowmark from the inside of the pipe 30 to the atmosphere.
    Type: Grant
    Filed: April 5, 1994
    Date of Patent: November 21, 1995
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Kazuo Yokogi
  • Patent number: 5447285
    Abstract: The invention relates to safety device for a cylinder valve automatic switching unit, wherein said valve is automatically closed when some abnormality such as down of an air pressure takes place. A first air-operated selector valve 8 is installed which causes air flowing out of a reservoir tank 10 to flow into a second supply line 3 when air pressure is reduced, whereby a cylinder valve automatic switching unit 1 in the opening situation is caused to make a closing motion for closing a cylinder valve in the opened situation. And, a second air-operated selector valve 9 is further installed which discharges air flowing out of a first supply line 2 to the atmosphere when the air pressure is reduced.
    Type: Grant
    Filed: March 21, 1994
    Date of Patent: September 5, 1995
    Assignee: Teisan Kabushiki Kaisha
    Inventor: Kazuo Yokogi