Abstract: High temperature polyimide film laminates and a process for fabricating large-area, void-free polyimide laminate structures wherein multiple-ply polyimide film laminates may be constructed without decreasing the individual film strength and wherein layers of metal foil may be laminated between polyimide film layers to yield a flexible high temperature resistant structure having capabilities for use as flexible electric circuits, in aerospace applications, and the like.
Type:
Grant
Filed:
October 24, 1984
Date of Patent:
September 24, 1985
Assignee:
The United States of America as represented by the director of the National Aeronautics and Space Administration