Abstract: Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires, nano-crystals and artificial atoms made using the disclosed methods.
Type:
Application
Filed:
July 13, 2007
Publication date:
January 14, 2010
Applicant:
TheTustees of the University of Pennsylvania