Abstract: Processes for selectively removing sulfur-containing compounds from a gas are described herein. The processes generally include contacting a first gas including carbon dioxide and hydrogen sulfide with a scrub solution including ammonium bisulfite and ammonium sulfite in a first contact zone to produce a first contact zone effluent liquid including ammonium thiosulfate and a first contact zone overhead gas including carbon dioxide.
Type:
Grant
Filed:
May 17, 2007
Date of Patent:
June 24, 2008
Assignee:
Thiosolv, L.L.C.
Inventors:
Mark C. Anderson, Michael F. Ray, Ronald Shafer