Abstract: There are provided a method for producing a transfer structure, in which detachment between a transfer-receiving material and a matrix can be easily achieved without destroying the fine pattern, the transfer pattern of the matrix is satisfactorily transferred to the transfer-receiving material, and the durability of the matrix is maintained for a long time during repeated transfer; and a matrix for use in the method. A film of a silane coupling agent represented by the following formula (I) is formed on a surface of a matrix having a transfer pattern formed on the surface thereof, a transfer-receiving material is applied thereon to transfer the pattern on the surface of the matrix, and the transfer-receiving material is detached from the matrix to obtain a transfer structure formed of the transfer-receiving material.
Type:
Grant
Filed:
September 7, 2009
Date of Patent:
October 21, 2014
Assignee:
Tokyo University of Science Educational Foundation Administrative Org.
Abstract: A spheroid composite includes: a substrate including a cell-adhesive porous base material and plural hydrophilic regions and hydrophobic regions that are disposed on the porous base material and formed by curing a photosensitive composition, wherein the photosensitive composition includes a branched polyalkylene glycol derivative having three or more polyalkylene glycol groups, each having a polymerizable substituent at a terminal thereof, and a tri- or higher-valent linking group that binds to the polyalkylene glycol groups; and spheroids formed in the hydrophobic regions on the substrate, the plural spheroids having a uniform size. A spheroid-containing hydrogel, which includes a hydrogel and two or more spheroids having a uniform size with a diameter of from 70 ?m to 400 ?m that are disposed in the hydrogel in such a manner that the two or more spheroids do not contact each other, can favorably maintain the function of the plural spheroids contained within the hydrogel.
Type:
Application
Filed:
September 8, 2009
Publication date:
January 19, 2012
Applicant:
TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION ADMINISTRATIVE ORG.
Abstract: A process for producing a 3-dimensional mold, including irradiating a resist layer of a processing object having the resist layer made of an organopolysiloxane on a substrate with an electron beam, and developing, by thermal desorption treatment, the resist layer after the irradiation with an electron beam to form protrusions and depressions in the resist layer; a process for producing a microfabrication product by using the 3-dimensional mold; a process for producing a micropattern molding by using the 3-dimensional mold or the microfabrication product; and a 3-dimensional mold, a microfabrication product and a micropattern molding which are finely formed by these production processes, as well as an optical device.
Type:
Application
Filed:
September 8, 2006
Publication date:
July 9, 2009
Applicant:
TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION ADMINISTRATIVE ORG.