Patents Assigned to Tsukishima Kikai Co., Ltd.
  • Patent number: 11866564
    Abstract: The present invention is a polymer substrate with a hard coat layer, which is obtained by directly laminating a polymer substrate, a base cured layer and a silicon oxide layer, wherein the base cured layer has a thickness of 1-20 ?m and contains 10-90 parts by weight of a polyfunctional acrylate and 90-10 parts by weight of inorganic oxide fine particles and/or a hydrolytic condensation product of a silicon compound or contains a hydrolytic condensation product of an organic silicon compound as a primary component, and the silicon oxide layer satisfies requirement (a1) below at a position 0.04 ?m in the thickness direction from the interface between the base cured layer and the silicon oxide layer and satisfies requirement (a3) below at the surface of the silicon oxide layer on the opposite side from the interface, Requirement (a1): when the chemical composition is represented by SiOxCyHz, x falls within the range 1.93-1.98, y falls within the range 0.04-0.15 and z falls within the range 0.10-0.50.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: January 9, 2024
    Assignees: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya Ekinaka, Tatsuichirou Kon, Hiroshi Kishimoto, Yume Takeda, Takehiro Suga, Satoshi Ogata, Masato Nakagomi
  • Patent number: 11394019
    Abstract: There are provided a method capable of producing a large amount of a carbonaceous material for a negative electrode of a non-aqueous electrolyte secondary battery from a carbon precursor impregnated with an alkali metal element or an alkali metal compound, and an apparatus for performing such production. The method for producing a carbonaceous material for a negative electrode of a non-aqueous electrolyte secondary battery includes a heat treatment step of feeding a carbon precursor containing an elemental alkali metal and/or an alkali metal compound, heating the carbon precursor in a temperature range from 1000° C. to 1500° C. in a non-oxidizing gas atmosphere to produce a carbonaceous material, and discharging the carbonaceous material; and an exhaust gas treatment step of contacting a non-oxidizing exhaust gas containing a gas and a flying carbonaceous matter evolved in the heat treatment step with water or an aqueous solution to treat the exhaust gas.
    Type: Grant
    Filed: June 6, 2019
    Date of Patent: July 19, 2022
    Assignees: KUREHA CORPORATION, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Naohiro Sonobe, Mayu Komatsu, Koji Miwa, Kokei Ueno
  • Publication number: 20210308605
    Abstract: A solid-liquid separation device of the present invention is a solid-liquid separation device, in which a filtration belt (1), a seal belt (8), and a squeezing belt (15) are wound around an outer circumference of a separation roll (7) rotated in a circumferential direction and are able to run along a rotational direction of the separation roll (7), an object (P) to be processed supplied between the filtration belt (1) and the seal belt (8) is sandwiched between the filtration belt (1) and the seal belt (8) on the outer circumference of the separation roll (7) and squeezed by the squeezing belt (15), and the object (P) to be processed is dehydrated by being ventilated by ejecting a ventilation gas toward a radially outer side of the separation roll (7) via a ventilation gas chamber (10) formed in an inner circumferential portion of the separation roll (7), in which the seal belt (8) is a woven fabric of multifilament or a woven fabric obtained by combination of multifilament and monofilament and is a thinner t
    Type: Application
    Filed: February 28, 2019
    Publication date: October 7, 2021
    Applicant: TSUKISHIMA KIKAI CO., LTD.
    Inventors: Jun SHIMADA, Toshihiro SUGA, Takayoshi CHIN, Shinpei KURITA, Tomohiro FURUKAWA
  • Patent number: 11028284
    Abstract: The present invention provides a polymer substrate with a hardcoat layer exhibiting excellent environmental resistance and wear resistance. A polymer substrate (60) is 1-20 mm thick and a hardcoat layer (70, 80) on the surface thereof comprises: an underlayer cured layer (70) with a thickness of 1-20 ?m, and including 10-90 parts by weight of a multifunctional acrylate, and 90-10 parts by weight of inorganic oxide fine particles and/or a silicon compound hydrolytic condensate; and a silicon oxide layer (80) which is in direct contract with the underlayer cured layer, is formed by PE-CVD with an organosilicon compound as the starter material, and satisfies all of the following conditions (a)-(c): (a) the film thickness of the silicon oxide layer is 3.5-9.0 ?m; (b) the maximum indentation depth of the surface of the silicon oxide layer by nanoindentation measurement at a maximum load of 1 mN is 150 nm or less; and (c) the limit compression ratio K of the silicon oxide layer is at most 0.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: June 8, 2021
    Assignees: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya Ekinaka, Tatsuichirou Kon, Takehiro Suga, Hiroshi Kishimoto, Yume Morita, Satoshi Ogata, Masato Nakagomi
  • Publication number: 20200377682
    Abstract: The present invention is a polymer substrate with a hard coat layer, which is obtained by directly laminating a polymer substrate, a base cured layer and a silicon oxide layer, wherein the base cured layer has a thickness of 1-20 ?m and contains 10-90 parts by weight of a polyfunctional acrylate and 90-10 parts by weight of inorganic oxide fine particles and/or a hydrolytic condensation product of a silicon compound or contains a hydrolytic condensation product of an organic silicon compound as a primary component, and the silicon oxide layer satisfies requirement (a1) below at a position 0.04 ?m in the thickness direction from the interface between the base cured layer and the silicon oxide layer and satisfies requirement (a3) below at the surface of the silicon oxide layer on the opposite side from the interface, Requirement (a1): when the chemical composition is represented by SiOxCyHz, x falls within the range 1.93-1.98, y falls within the range 0.04-0.15 and z falls within the range 0.10-0.50.
    Type: Application
    Filed: March 28, 2018
    Publication date: December 3, 2020
    Applicants: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya EKINAKA, Tatsuichirou KON, Hiroshi KISHIMOTO, Yume TAKEDA, Takehiro SUGA, Satoshi OGATA, Masato NAKAGOMI
  • Patent number: 10434486
    Abstract: A method of producing particles by bringing plural dissimilar materials A and B into contact with each other includes feeding a liquid into a reactor from a first end portion of the reactor such that the liquid flows along the inner peripheral surface of the reactor and generating a vortex flow toward a second end portion in the reactor by the feed of the liquid; disposing a flow-assisting blade capable of rotating around the central axis line in the reactor and rotating the flow-assisting blade; and injecting materials to be contacted A and B into the reactor, discharging a contacted liquid from the second end portion of the reactor, and generating the particles in the contacted liquid.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: October 8, 2019
    Assignee: Tsukishima Kikai Co., Ltd.
    Inventor: Yo Doya
  • Patent number: 10371444
    Abstract: To provide a drying method for terephthalic acid and a horizontal rotary dryer allowing easy performance of mass processing of the terephthalic acid and enabling size reduction by improving drying performance of the dryer. In a method of drying terephthalic acid by using a horizontal rotary dryer, a rotating shell is rotated to make a critical speed ratio ? defined by expression 1 and expression 2 become 17 to less than 80% to dry the processing material, Vc=2.21D½??Expression 1 ?=V/Vc·100??Expression 2 wherein Vc indicates a critical speed (m/s) of the rotating shell, D indicates an inside diameter (m) of the rotating shell, ? indicates the critical speed ratio (%) of the rotating shell, and V indicates a rotation speed (m/s) of the rotating shell.
    Type: Grant
    Filed: December 9, 2015
    Date of Patent: August 6, 2019
    Assignee: TSUKISHIMA KIKAI CO., LTD.
    Inventors: Yoichi Nakata, Yuichi Ono, Satoshi Suwa, Sumito Sato
  • Patent number: 10333143
    Abstract: Liquid flow in a reaction processing vessel 10 is set to a spiral flow, a liquid A and B as an additional liquid containing an inorganic substance to be added is injected at a center-side position with respect to an inner surface of the reaction processing vessel 10 in a reaction field of the reaction processing vessel 10 so as to perform reaction processing.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: June 25, 2019
    Assignee: TSUKISHIMA KIKAI CO., LTD.
    Inventors: Yo Doya, Hidenori Goto
  • Patent number: 10279287
    Abstract: Prevention of contamination of a dried product, deformation of particles, and a change of particle size distribution. The system includes: a solid-liquid separator in which a processing material is supplied between a pair of endless separation filter cloths wound around an outer periphery of a separation roll, and is dehydrated by being squeezed therebetween and also by ventilation gas passing from a ventilation port formed in an outer peripheral surface of the separation roll; and a horizontal rotary dryer provided on a subsequent stage of the solid-liquid separator, wherein carrier gas is made to flow in a rotating shell of the dryer in a cocurrent manner in the same direction as a conveyance direction of the processing material.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: May 7, 2019
    Assignee: TSUKISHIMA KIKAI CO., LTD.
    Inventors: Yoichi Nakata, Tomonori Watarai, Sumito Sato, Satoshi Suwa, Tomoki Homma
  • Publication number: 20190022551
    Abstract: A method of producing particles by bringing plural dissimilar materials A and B into contact with each other includes feeding a liquid into a reactor from a first end portion of the reactor such that the liquid flows along the inner peripheral surface of the reactor and generating a vortex flow toward a second end portion in the reactor by the feed of the liquid; disposing a flow-assisting blade capable of rotating around the central axis line in the reactor and rotating the flow-assisting blade; and injecting materials to be contacted A and B into the reactor, discharging a contacted liquid from the second end portion of the reactor, and generating the particles in the contacted liquid.
    Type: Application
    Filed: January 11, 2017
    Publication date: January 24, 2019
    Applicant: Tsukishima Kikai Co., Ltd.
    Inventor: Yo Doya
  • Patent number: 10088231
    Abstract: Provided is an indirectly heating rotary dryer which has achieved enhanced energy-saving performance by reducing heating tubes non-contacting with material to be dried and reducing power required for rotation even when a hold up ratio is increased. Specifically provided is an indirectly heating rotary dryer having four partition walls 16 extended respectively along an shaft center C in an inner space of a rotating shell 10 at angle intervals of 90 degrees in the vertical and horizontal directions. The four partition walls 16 partition the inner space of the rotating shell 10 at a lateral section of the rotating shell 10 into four approximately-sector-shaped small spaces K respectively extended along the shaft center C. Heating tubes 11 are aligned in the rotating shell 10 in three lines extended respectively in parallel to the shaft center C of the rotating shell 10.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: October 2, 2018
    Assignee: TSUKISHIMA KIKAI CO., LTD
    Inventors: Masaki Kataoka, Satoshi Suwa, Keisuke Matsuda
  • Publication number: 20180265731
    Abstract: The present invention provides a polymer substrate with a hardcoat layer exhibiting excellent environmental resistance and wear resistance. A polymer substrate (60) is 1-20 mm thick and a hardcoat layer (70, 80) on the surface thereof comprises: an underlayer cured layer (70) with a thickness of 1-20 ?m, and including 10-90 parts by weight of a multifunctional acrylate, and 90-10 parts by weight of inorganic oxide fine particles and/or a silicon compound hydrolytic condensate; and a silicon oxide layer (80) which is in direct contract with the underlayer cured layer, is formed by PE-CVD with an organosilicon compound as the starter material, and satisfies all of the following conditions (a)-(c): (a) the film thickness of the silicon oxide layer is 3.5-9.0 ?m; (b) the maximum indentation depth of the surface of the silicon oxide layer by nanoindentation measurement at a maximum load of 1 mN is 150 nm or less; and (c) the limit compression ratio K of the silicon oxide layer is at most 0.
    Type: Application
    Filed: September 23, 2016
    Publication date: September 20, 2018
    Applicants: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya EKINAKA, Tatsuichirou KON, Takehiro SUGA, Hiroshi KISHIMOTO, Yume MORITA, Satoshi OGATA, Masato NAKAGOMI
  • Patent number: 10006631
    Abstract: Is provided a method for starting up a pressurized fluidized bed incinerator system by which cracking of silica sand as a bed material can be prevented at low costs. By heating the silica sand as the bed material filled up in a bottom portion of a pressurized fluidized bed incinerator, a temperature of a freeboard of the incinerator is heated, and after the temperature of the freeboard is heated to 750 to 900° C., a material to be treated having a water-containing organic substance is fed to the pressurized fluidized bed incinerator.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: June 26, 2018
    Assignees: TSUKISHIMA KIKAI CO., LTD., SANKI ENGINEERING CO., LTD.
    Inventors: Takafumi Yamamoto, Kazuyoshi Terakoshi, Kunihiko Koga, Isamu Orito
  • Patent number: 10001277
    Abstract: A method for efficiently conveying impurities in a pressurized fluidized incinerator system is provided. Cleaning gas is supplied to an upper valve, and thereafter, the upper valve is driven so as to communicate an upper discharge device and a tank. The upper discharge device is driven so as to convey the impurities from the dust collector to the tank, and thereafter, the upper discharge device is stopped and the upper valve is driven so as not to communicate the upper discharge device and the tank. Thereafter, the supply of the cleaning gas to the upper valve is stopped.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: June 19, 2018
    Assignees: TSUKISHIMA KIKAI CO., LTD., SANKI ENGINEERING CO., LTD.
    Inventors: Takamitsu Kanno, Kazuyoshi Terakoshi, Takafumi Yamamoto, Kunihiko Koga, Tomokazu Suyama, Isamu Orito
  • Patent number: 9982552
    Abstract: A pressurized incineration facility (100, 200) includes: a pressurized incinerator (1) which incinerates a processing object (P) under a pressure increased by compressed air (A); a turbocharger (5) which produces the compressed air by being rotationally driven by combustion exhaust gas (G) of the pressurized incinerator; and a seal device (5i) which jets seal gas (S) to a rear surface (5a1) of a turbine impeller (5a) of the turbocharger.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: May 29, 2018
    Assignees: TSUKISHIMA KIKAI CO., LTD., SANKI ENGINEERING CO., LTD.
    Inventors: Ken Nakano, Yutaka Hirata, Yuki Asaoka, Kazuyoshi Terakoshi, Toshiki Kobayashi, Takafumi Yamamoto, Takamitsu Kanno, Kunihiko Koga, Tomokazu Suyama
  • Patent number: 9933156
    Abstract: Pressurized fluidized furnace equipment includes a fluidized bed furnace (1) that pressurizes combustion air (B) and combusts a material to be treated (A) while fluidizing the same; an air preheater (3) that exchanges heat between a combustion exhaust gas (C) discharged from the fluidized bed furnace (1) and the combustion air (B); a dust collector (4) that removes dust from the combustion exhaust gas (C); and first and second superchargers (5, 6) to which the combustion exhaust gas (C), having undergone the heat exchange in the air preheater (3) and the dust removal in the dust collector (4), is supplied to generate compressed air (D, E). The first compressed air (D) generated in the first supercharger (5) is supplied as the combustion air (B) to the fluidized bed furnace (1) by way of the air preheater (3), and the second compressed air (E) generated in the second supercharger (6) is made to have a higher pressure than that of the first compressed air (D).
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: April 3, 2018
    Assignee: Tsukishima Kikai Co., Ltd.
    Inventors: Toshiki Kobayashi, Takafumi Yamamoto, Kazuyoshi Terakoshi
  • Patent number: 9897376
    Abstract: To provide a drying method for processing material and a horizontal rotary dryer allowing easy performance of mass processing of the processing material and enabling size reduction by improving drying performance of the dryer.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: February 20, 2018
    Assignee: TSUKISHIMA KIKAI CO., LTD
    Inventors: Yoichi Nakata, Sumito Sato, Satoshi Suwa, Tomonori Watarai
  • Patent number: 9758630
    Abstract: The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance. A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 ?m to 20 ?m, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 ?m to 9.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: September 12, 2017
    Assignees: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuichirou Kon, Tatsuya Ekinaka, Hiroshi Kishimoto, Yume Morita, Takehiro Suga, Satoshi Ogata, Masato Nakagomi
  • Patent number: 9683779
    Abstract: Provided is an indirectly heated rotary dryer which has achieved enhanced energy-saving performance by reducing heating tubes non-contacting with material to be dried and reducing power required for rotation even when a hold up ratio is increased. Specifically provided is an indirectly heated rotary dryer having four partition walls extended respectively along a shaft center in an inner space of a rotating shell at angle intervals of 90 degrees in the vertical and horizontal directions. The four partition walls partition the inner space of the rotating shell at a lateral section of the rotating shell into four approximately-sector-shaped small spaces respectively extended along the shaft center. Heating tubes are aligned in the rotating shell in three lines extended respectively in parallel to the shaft center of the rotating shell.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: June 20, 2017
    Assignee: TSUKISHIMA KIKAI CO., LTD
    Inventors: Masaki Kataoka, Satoshi Suwa, Keisuke Matsuda
  • Publication number: 20170107345
    Abstract: The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance. A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 ?m to 20 ?m, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 ?m to 9.
    Type: Application
    Filed: March 27, 2015
    Publication date: April 20, 2017
    Applicants: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuichirou KON, Tatsuya EKINAKA, Hiroshi KISHIMOTO, Yume MORITA, Takehiro SUGA, Satoshi OGATA, Masato NAKAGOMI