Patents Assigned to UION Co., Ltd.
  • Patent number: 8097217
    Abstract: The present invention relates to an atmospheric pressure plasma generating apparatus using an induction electrode. In particular, one or more upper metal electrodes are disposed on the upper side and an induction electrode and an induction electrode antenna are disposed opposite to the upper electrodes, so that a high-density plasma is generated at low applied voltage. Further, base electrodes are used to preclude interference between the upper electrodes. Thus, lots of the upper electrodes can be constructed at a narrow space, the uniformity of intensity of a generated plasma can be secured, the source of a plasma can be provided by the upper electrodes, and the intensity of a plasma can be increased. In addition, a lower electrode is disposed on the lower side in order to extend the length of a generated plasma.
    Type: Grant
    Filed: July 6, 2007
    Date of Patent: January 17, 2012
    Assignee: Uion Co., Ltd
    Inventor: Seok Kyun Song
  • Patent number: 7453191
    Abstract: The present invention relates, in general, to an induction concentration remote atmospheric pressure plasma generating apparatus, and more particularly, to an induction concentration remote atmospheric pressure plasma generating apparatus in which induction electrodes, discharge electrodes and a ground electrode are used, so that a plasma can be generated in a plasma cell including several metal discharge electrodes by using one power supply device while not generating arc between the metal electrodes, and a high-density plasma is generated at local regions due to a discharge between the metal electrodes and is thus spouted to the surface of a sample by means of the pressure of a working gas. Thus, a plasma is not generated in unnecessary regions.
    Type: Grant
    Filed: July 6, 2007
    Date of Patent: November 18, 2008
    Assignee: UION Co., Ltd.
    Inventor: Seok Kyun Song