Abstract: An improved method for welding and passivation forms a chromium oxide passivated film over the welded portion during the welding process. In a shielding step, a backshield gas, preferably argon, is flowed around the welding site. In a welding step, an arc gas, preferably argon with approximately 10% hydrogen and less than 1 ppm moisture content, is flowed through the welding head and a welded joint is formed, for example by high speed tungsten-inert gas (TIG) orbital welding. In the passivation step, a process gas, preferably argon with approximately 30-100 ppm of oxygen and less than 1 ppm moisture content, and preferably less than 1 ppb moisture content, is flowed over the welded portion to form a chromium oxide passivated film on the welded portion. The process gas is passed through a gas purifier prior to being flowed over the welded portion to maintain its moisture level at less than 1 ppb.
Type:
Grant
Filed:
January 5, 2001
Date of Patent:
February 11, 2003
Assignee:
Ultra Clean Technology Systems and Services Inc.
Abstract: An improved method for welding and passivation forms a chromium oxide passivated film over the welded portion during the welding process. In a shielding step, a backshield gas, preferably argon, is flowed around the welding site. In a welding step, an arc gas, preferably argon with approximately 10% hydrogen and less than 1 ppm moisture content, is flowed through the welding head and a welded joint is formed, for example by high speed tungsten-inert gas (TIG) orbital welding. In the passivation step, a process gas, preferably argon with approximately 30-100 ppm of oxygen and less than 1 ppm moisture content, and preferably less than 1 ppb moisture content, is flowed over the welded portion to form a chromium oxide passivated film on the welded portion. The process gas is passed through a gas purifier prior to being flowed over the welded portion to maintain its moisture level at less than 1 ppb.
Type:
Grant
Filed:
September 30, 1998
Date of Patent:
January 9, 2001
Assignee:
Ultra Clean Technology Systems and Services Inc.
Abstract: One aspect of the present invention provides an apparatus which permits the efficient purging of leaked process gas at the component-panel interface in an integrated gas panel system. The apparatus provides conduit structure for directing a flow of purging gas through a surface interface whereat a gas-manifold panel meets gas-manifold components. A further aspect of the invention provides a method for efficiently purging process gas which might leak out at the component-panel interface in an integrated gas panel system. The method includes the step of simultaneously directing a stream of purging gas along a pathway extending over the surface interface and along a pathway which intersects and passes through the surface interface.
Type:
Grant
Filed:
March 9, 1998
Date of Patent:
November 7, 2000
Assignee:
Ultra Clean Technology Systems & Service, Inc.
Inventors:
Bruce C. Wier, Akira Muraoka, Charles K. Lokey
Abstract: A data-driven electrochemical grinding apparatus and method produces series of finished-cut, burr-free tube sections of precisely defined lengths. The data-driven process automatically inputs desired tube lengths, tracks the cut tube sections during the process, and produces recorded output of tube and process parameters. Such tube sections are particularly suitable for use in ultrahigh purity gas cabinets used in semiconductor manufacturing equipment.
Type:
Grant
Filed:
March 6, 1998
Date of Patent:
August 29, 2000
Assignee:
Ultra Clean Technology Systems & Service, Inc.