Abstract: A layer system in particular for tools or machine components operated under insufficient lubrication or under dry operation conditions, is proposed, which system, starting from the base body, comprises a hard substance layer system, subsequently a metallic layer and finally a slide layer system, the last mentioned preferably made of Carbide, in particular of Tungstencarbide or Chromiumcarbide and dispersed Carbon.

Abstract: A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma discharge source generating on said workpiece holder ions with an energy of below 15 eV. The plasma discharge source can be a low-voltage plasma discharge source in which at least one cathode is arranged within a cathode chamber coupled to the vacuum recipient by a diaphragm.

Abstract: Method for sputtering from a dielectric target (9) in a vacuum chamber (2) with a high frequency gas discharge, the target (9) being mounted on a cooled metallic back plate (10) and this back plate forming an electrode (10) supplied with high frequency, includes a target thickness (Td) profiled (15) differently over the surface such that in the regions of a desired decrease of the sputtering rate the target thickness (Td) is selected to be greater than in the remaining regions.

Abstract: A pattern structure has at least two different color filter elements disposed one beside the other on a carrier substrate. Each element includes a layer of dielectric material, the layer of dielectric material residing at at least one of the filter elements on a layer of a material that is resistant to activated oxygen or activated water. The layer of resistant material has a second surface pointing toward the substrate and is made of silicon or silicon dioxide.

Abstract: A method for manufacturing a tool or machine component increases wear resistance by providing a base body made of a metal or of a hard metal and having a surface. At least a portion of the surface is vacuum coated with a hard solid layer system having at least one layer of a material selected from the group consisting of nitrides, carbides, oxides, carbonitrides, oxynitrides, and oxycarbonitrides of at least one metal. A metallic intermediate layer having the at least one metal is vacuum deposited on the hard solid layer system, and a sliding layer system is vacuum deposited on the metallic intermediate layer.

Abstract: A method for removing hard material layers from hard metal substrates by employing a layer removal solution, included introducing between the hard metal substrate and a hard material layer, an intermediate carrier layer made of a material that is differing from the material of the hard material layer and from the metal substrate. A selectively dissolving of the intermediate carrier layer follows by employing a solution such as hydrogen peroxide, through pores of the hard material layer. The removal solution, within a treatment time period, dissolves the material of the intermediate carrier layer more than the material of the hard material layer, such that the hard material layer is removed before it is dissolved as much as the intermediate carrier layer.

Abstract: A chamber for chemical vapor deposition has an inner quartz tube encompassed by a shorter outer quartz tube in which each end of the inner quartz tube is encompassed by a first flange. The first flange has a groove encircling in the longitudinal direction of the inner quartz tube, in which in each instance a front of the inner quartz tube is positioned. Between the first flange and the outside of the inner quartz tube, a seal is disposed. On the first flange in the direction toward the tube center, a second flange is disposed which has an encircling rim for fixing the front side of the shorter outer quartz tube and which is in contact on the outside of the inner quartz tube as well as on the outside of the shorter outer quartz tube. Between the second flange and the outside of the shorter outer quartz tube, a seal is disposed.

Abstract: A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.

Abstract: A layer system, in particular for tools or machine components operated under insufficient lubrication or under dry operation conditions, is proposed, which system, starting from the base body (1), comprises a hard substance layer system (2), subsequently a metallic layer (3) and finally a slide layer system (4), the last mentioned preferably made of Carbide, in particular of Tungstencarbide or Chromiumcarbide and dispersed Carbon.

Abstract: A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma discharge source generating on said workpiece holder ions with an energy of below 15 eV. The plasma discharge source can be a low-voltage plasma discharge source in which at least one cathode is arranged within a cathode chamber coupled to the vacuum recipient by a diaphragm.

Abstract: A pattern structure has at least two different color filter elements disposed one beside the other on a carrier substrate. Each element includes a layer of dielectric material, the layer of dielectric material residing at at least one of the filter elements on a layer of a material that is resistant to activated oxygen or activated water. The layer of resistant material has a second surface pointing toward the substrate and is made of silicon or silicon dioxide.

Abstract: So as to provide a wear-resistant workpiece, and especially a wear-resistant cutting tool, capable of realising stable cutting with a long life span thereof during high-efficiency cutting, there is provided between a wear-resistant layer system with at least one hard material layer of a compound containing titanium and aluminum and the surface of the base body of a hard metal or of a steel an intermediate layer of a material selected from the group of nitride, carbonitride, nitroboride, carbonitroboride of chromium, tantalum, zirconium or titanium.

Abstract: A vacuum coating installation has at least a central distribution station which can be evacuated and has a transport arrangement driven in a controlled manner essentially along a plane, for the material to be treated. One operating station for the distribution station as well as at least two processing stations for the material to be treated are provided. The three or more stations communicate by way of operating openings with the distribution station, through which openings the material to be treated can be transported from one station into the other by the transport arrangement for the material to be treated. The material to be treated is formed by individual workpiece holders of the installation, each having a plurality of workpiece supports.

Abstract: A process for the production of a color filter layer system structure on a substrate uses a structure lacquer layer which is deposited in a lift-off technique on the substrate. Lacquer layer surface regions and regions free of lacquer layer are present. Subsequently through a vacuum coating process a color filter layer system is deposited and subsequently with the lacquer layer surface regions the regions of the color filter layer system deposited thereon are removed. The deposition of the color filter layer system takes place through a plasma-enhanced coating at a temperature of maximally 150° C. The deposition takes place, for example, by sputtering or plasma-enhanced vapor deposition.

Abstract: A sputter source has at least two electrically mutually isolated stationar bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each others. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

Abstract: A vacuum treatment system has a vacuum chamber in which there is at least one part which is driven in rotation and is connected by a gear train which comprises at least two rotating transmission bodies with a motor drive unit. The rotating transmission bodies produce a relative motion in a rolling manner. For this purpose, the bodies have axes of rotation that are not aligned. The rotating transmission bodies are magnetically drive-coupled to each other, and at least one of them is located in the vacuum chamber.

Abstract: The method is characterized in that layers of sufficient quality for epitaxy are placed on workpieces, at a considerably increased deposition rate. To this end, instead of a UHV-CVD or ECR-CVD method, for example, a PECVD method is used by means of a DC plasma discharge.

Abstract: A vacuum arrangement with a vacuum disc valve. A support plate is movably guided along a wall with an opening that is closed or opened by a valve. A seal plate is provided on the support plate which is controlled and actuated through a cylinder chamber. When the support plate is moved, the seal plate is displaced in the direction of the opening and is tightly placed on the borders of said opening by actuation in the cylinder chamber. The resulting sealing forces are absorbed by the movement guides of the support plate.

Abstract: A workpiece holding device for a vacuum unit has coolable or heatable transfer plates (2) displaceable independently of one another in a baseplate (1) and each comprising a heat transfer surface (3) which is surrounded by an O-ring (4), is connected to a pipe (5) and, with a workpiece (15) which is pressed against the O-ring (4) by a holder (16), encloses a gap (20). The holder (16) can be locked to the baseplate (1). After lowering of the holder (16) into a closed position and load-free locking to the baseplate (1), the heat transfer plates (2) are pneumatically raised until in each case a stop (23, 22) becomes effective between said heat transfer plates and the holder (16) and determines the width of the gap (20). The gap (20) is then filled via the pipe (5) with a heat transfer medium, e.g. helium. After processing of the workpiece (15), the heat transfer plates (2) are lowered and the holder (16) is released again in a loadfree manner.

Abstract: A sputter source has at least two electrically mutually isolated stationar bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each others. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.