Abstract: Disclosed herein is a method and a reactor system for CVD surface coating. In this method, the reaction gas is supplied to the reactor chamber with any frequency and at any time intervals in succession, rising and falling in the form of a pulsed gas stream. The reversal of the gas flow direction is performed by a multipath valve located inside the reactor which can be controlled from outside by means of an adjusting shaft.
Type:
Grant
Filed:
October 5, 1998
Date of Patent:
April 4, 2000
Assignee:
Verschleiss-Schutz-Technik Keller GmbH & Co. KG