Patents Assigned to VERSTILL DISTILLATION SYSTEMS LTD
  • Patent number: 11833456
    Abstract: A method of batch distilling including providing a first substrate that upon distillation releases vapour having deleterious sulfur compounds, providing an inert still, adding the first substrate to the still, installing at least one first reactive article in the still and subsequently performing a first distillation run on the first substrate, such that the installed at least one first reactive article has a first exposed area that is exposed to the distillate, and collecting a first desired fraction from the first run. The distillation during the collection of the first desired fraction is performed at a rate of less than 5 L/(hr*m2) of collected first fraction per first exposed area. Compatible still and kit are also provided.
    Type: Grant
    Filed: August 29, 2021
    Date of Patent: December 5, 2023
    Assignee: VERSTILL DISTILLATION SYSTEMS, LTD.
    Inventor: Matan Edvy
  • Publication number: 20210402318
    Abstract: A method of batch distilling including providing a first substrate that upon distillation releases vapour having deleterious sulfur compounds, providing an inert still, adding the first substrate to the still, installing at least one first reactive article in the still and subsequently performing a first distillation run on the first substrate, such that the installed at least one first reactive article has a first exposed area that is exposed to the distillate, and collecting a first desired fraction from the first run. The distillation during the collection of the first desired fraction is performed at a rate of less than 5 L/(hr*m2) of collected first fraction per first exposed area. Compatible still and kit are also provided.
    Type: Application
    Filed: August 29, 2021
    Publication date: December 30, 2021
    Applicant: VERSTILL DISTILLATION SYSTEMS, LTD.
    Inventor: Matan EDVY
  • Patent number: 11130072
    Abstract: A method of batch distilling including providing a first substrate that upon distillation releases vapour having deleterious sulfur compounds, providing an inert still, adding the first substrate to the still, installing at least one first reactive article in the still and subsequently performing a first distillation run on the first substrate, such that the installed at least one first reactive article has a first exposed area that is exposed to the distillate, and collecting a first desired fraction from the first run. The distillation during the collection of the first desired fraction is performed at a rate of less than 5 L/(hr*m2) of collected first fraction per first exposed area. Compatible still and kit are also provided.
    Type: Grant
    Filed: December 24, 2018
    Date of Patent: September 28, 2021
    Assignee: VERSTILL DISTILLATION SYSTEMS, LTD.
    Inventor: Matan Edvy
  • Publication number: 20210246403
    Abstract: An improved method of maturation of an unaged or partially aged distilled spirit, the method comprising: exposing the spirit to at least one catalytic material consisting of a group selected from: iron oxide nanoparticles, alumina-supported Fe(II) complexes, Pd/C, multiwalled carbon nanotubes, carbon xerogels, carbon based solid acid catalysts, SO42?/TiO2/?-Al2O3, an element selected from the group consisting of: columns 4-12 transition metals except for Fe, column 13 boron group, Si, and mixtures thereof; wherein throughout the exposing, the spirit is not being distilled, and the exposing is allowed until level of at least one maturation congener in the spirit attains predetermined desired congener level/s in the spirit.
    Type: Application
    Filed: June 18, 2019
    Publication date: August 12, 2021
    Applicant: VERSTILL DISTILLATION SYSTEMS LTD
    Inventors: Yechiel Ben Zvi, Matan Edvy, Ido Maor